Inventor · disambiguated record
Nobuo Ishii
Also filed as: ISHII NOBUO
67 granted patents·16 pending applications·4,037 citations·filing 1987–2012
99Inventor score
Top patents by PatentIndex Score
83 records- 0199US7243610B2Plasma device and plasma generating methodTOKYO ELECTRON LTD·Filed 2002·Granted Jul 17, 2007·226 cites·20 claims
- 0299US6433298B1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Aug 13, 2002·428 cites·6 claims
- 0398US6528752B1Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2000·Granted Mar 4, 2003·388 cites·1 claims
- 0498US5571366APlasma processing apparatusTOKYO ELECTRON LTD·Filed 1994·Granted Nov 5, 1996·502 cites·21 claims
- 0597US5698036APlasma processing apparatusTOKYO ELECTRON LTD·Filed 1996·Granted Dec 16, 1997·502 cites·24 claims
- 0697US5529657APlasma processing apparatusTOKYO ELECTRON LTD·Filed 1994·Granted Jun 25, 1996·335 cites·15 claims
- 0795US6347602B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Feb 19, 2002·68 cites·4 claims
- 0895US5685942APlasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 1995·Granted Nov 11, 1997·107 cites·11 claims
- 0994US6311638B1Plasma processing method and apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Nov 6, 2001·73 cites·16 claims
- 1092US5851298ASusceptor structure for mounting processing object thereonTOKYO ELECTRON LTD·Filed 1997·Granted Dec 22, 1998·132 cites·16 claims
- 1191US6622650B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Sep 23, 2003·34 cites·5 claims
- 1290US5874706AMicrowave plasma processing apparatus using a hybrid microwave having two different modes of oscillation or branched microwaves forming a concentric electric fieldTOKYO ELECTRON LTD·Filed 1997·Granted Feb 23, 1999·77 cites·22 claims
- 1390US5314541AReduced pressure processing system and reduced pressure processing methodTOKYO ELECTRON LTD·Filed 1992·Granted May 24, 1994·127 cites·9 claims
- 1489US5795429APlasma processing apparatusTOKYO ELECTRON LTD·Filed 1996·Granted Aug 18, 1998·82 cites·5 claims
- 1588US5683537APlasma processing apparatusTOKYO ELECTRON LTD·Filed 1994·Granted Nov 4, 1997·98 cites·16 claims
- 1688US5342472APlasma processing apparatusTOKYO ELECTRON LTD·Filed 1992·Granted Aug 30, 1994·118 cites·15 claims
- 1786US6847003B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2001·Granted Jan 25, 2005·22 cites·17 claims
- 1886US6646224B2Plasma-assisted processing system and plasma-assisted processing methodTOKYO ELECTRON LTD·Filed 2003·Granted Nov 11, 2003·21 cites·3 claims
- 1986US4749912AIon-producing apparatusRIKAGAKU KENKYUSHO·Filed 1987·Granted Jun 7, 1988·40 cites·13 claims
- 2085US5637961AConcentric rings with different RF energies applied theretoTOKYO ELECTRON LTD·Filed 1995·Granted Jun 10, 1997·77 cites·10 claims
- 2184US7632379B2Plasma source and plasma processing apparatusGOTO TOSHIO·Filed 2004·Granted Dec 15, 2009·35 cites·12 claims
- 2284US6350347B1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Feb 26, 2002·14 cites·12 claims
- 2383US6796268B2Microwave plasma processing systemTOKYO ELECTRON LTD·Filed 2001·Granted Sep 28, 2004·19 cites·18 claims
- 2482US6910440B2Apparatus for plasma processingNIHON KOSHUHA CO LTD·Filed 2001·Granted Jun 28, 2005·16 cites·20 claims
- 2582US6322662B1Plasma treatment systemTOKYO ELECTRON LTD·Filed 2000·Granted Nov 27, 2001·19 cites·6 claims
- 2681US5455082AReduced pressure processing system and reduced pressure processing methodTOKYO ELECTRON LTD·Filed 1994·Granted Oct 3, 1995·69 cites·8 claims
- 2780US5173641APlasma generating apparatusTOKYO ELECTRON LTD·Filed 1991·Granted Dec 22, 1992·35 cites·15 claims
- 2879US7416330B2Method and apparatus for measuring temperature of substrateITO MASAFUMI·Filed 2005·Granted Aug 26, 2008·8 cites·8 claims
- 2979US6136139APlasma processing apparatusTOKYO ELECTRON LTD·Filed 1999·Granted Oct 24, 2000·22 cites·15 claims
- 3078US5374327APlasma processing methodTOKYO ELECTRON LTD·Filed 1993·Granted Dec 20, 1994·48 cites·18 claims
- 3177US6501082B1Plasma deposition apparatus and method with controllerTOKYO ELECTRON LTD·Filed 2000·Granted Dec 31, 2002·13 cites·16 claims
- 3276US6823816B2Plasma processing systemTOKYO ELECTRON LTD·Filed 2003·Granted Nov 30, 2004·10 cites·4 claims
- 3375US6713968B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2001·Granted Mar 30, 2004·11 cites·19 claims
- 3475US5783492APlasma processing method, plasma processing apparatus, and plasma generating apparatusTOKYO ELECTRON LTD·Filed 1995·Granted Jul 21, 1998·50 cites·10 claims
- 3574US6657151B2Plasma processing deviceTOKYO ELECTRON LTD·Filed 2001·Granted Dec 2, 2003·10 cites·22 claims
- 3672US6527909B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2001·Granted Mar 4, 2003·8 cites·18 claims
- 3770US7305934B2Plasma treatment apparatus and plasma generation methodTOKYO ELECTRON LTD·Filed 2002·Granted Dec 11, 2007·8 cites·12 claims
- 3868US6953908B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2003·Granted Oct 11, 2005·11 cites·8 claims
- 3968US6431114B1Method and apparatus for plasma processingTOKYO ELECTRON LTD·Filed 2000·Granted Aug 13, 2002·8 cites·6 claims
- 4063US7296533B2Radial antenna and plasma device using itTOKYO ELECTRON LTD·Filed 2001·Granted Nov 20, 2007·5 cites·8 claims
- 4162US6911617B2Plasma device and plasma generating methodTOKYO ELECTRON LTD·Filed 2002·Granted Jun 28, 2005·4 cites·6 claims
- 4262US6404134B2Plasma processing systemTOKYO ELECTRON LTD·Filed 2001·Granted Jun 11, 2002·4 cites·4 claims
- 4362US6136140APlasma processing apparatusTOKYO ELECTRON LTD·Filed 1999·Granted Oct 24, 2000·15 cites·23 claims
- 4462US5701228AStage system or deviceTOKYO ELECTRON LTD·Filed 1996·Granted Dec 23, 1997·26 cites·22 claims
- 4561US6670741B2Plasma processing apparatus with annular waveguideTOKYO ELECTRON LTD·Filed 2001·Granted Dec 30, 2003·4 cites·14 claims
- 4658US7395779B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2001·Granted Jul 8, 2008·6 cites·17 claims
- 4757US7186314B2Plasma processor and plasma processing methodNIHON KOSHUHA CO LTD·Filed 2004·Granted Mar 6, 2007·5 cites·17 claims
- 4855US7807019B2Radial antenna and plasma processing apparatus comprising the sameTOKYO ELECTRON LTD·Filed 2001·Granted Oct 5, 2010·4 cites·10 claims
- 4955US6695948B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2003·Granted Feb 24, 2004·2 cites·4 claims
- 5054US8858877B2Sputtering target materialISHIFUKU METAL IND·Filed 2012·Granted Oct 14, 2014·0 cites·2 claims
Showing the top 50 of 83 patent records by PatentIndex Score.
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