Inventor · disambiguated record
Hiroyuki Hiraoka
Also filed as: HIRAOKA HIROYUKI
19 granted patents·1 pending application·527 citations·filing 1975–2005
96Inventor score
Top patents by PatentIndex Score
20 records- 0196US4999280ASpray silylation of photoresist imagesIBM·Filed 1989·Granted Mar 12, 1991·100 cites·9 claims
- 0294US4507331ADry process for forming positive tone micro patternsIBM·Filed 1983·Granted Mar 26, 1985·102 cites·7 claims
- 0393US4119688AElectro-lithography methodIBM·Filed 1977·Granted Oct 10, 1978·74 cites·8 claims
- 0482US7511206B2Carbon nanotubes and method of manufacturing same, electron emission source, and displayFUTABA DENSHI KOGYO KK·Filed 2005·Granted Mar 31, 2009·8 cites·10 claims
- 0580US3964908APositive resists containing dimethylglutarimide unitsIBM·Filed 1975·Granted Jun 22, 1976·23 cites·10 claims
- 0676US5684065ASurface-modified fluorine-containing resin molded articleDAIKIN IND LTD·Filed 1995·Granted Nov 4, 1997·32 cites·5 claims
- 0776US4464460AProcess for making an imaged oxygen-reactive ion etch barrierIBM·Filed 1983·Granted Aug 7, 1984·27 cites·8 claims
- 0873US6312769B1Liquid crystal alignment layer, production method for the same, and liquid crystal display device comprising the sameJSR CORP·Filed 1998·Granted Nov 6, 2001·32 cites·13 claims
- 0971US5368681AMethod for the deposition of diamond on a substrateUNIV HONG KONG SCIENCE & TECHN·Filed 1993·Granted Nov 29, 1994·30 cites·10 claims
- 1070US4770974AMicrolithographic resist containing poly(1,1-dialkylsilazane)IBM·Filed 1987·Granted Sep 13, 1988·19 cites·6 claims
- 1158US4690838AProcess for enhancing the resistance of a resist image to reactive ion etching and to thermal flowIBM·Filed 1986·Granted Sep 1, 1987·12 cites·9 claims
- 1257US4389482AProcess for forming photoresists with strong resistance to reactive ion etching and high sensitivity to mid- and deep UV-lightIBM·Filed 1981·Granted Jun 21, 1983·16 cites·5 claims
- 1356US4875124AThin film magnetic heads with thermally crosslinked insulationIBM·Filed 1988·Granted Oct 17, 1989·10 cites·6 claims
- 1455US4004043ANitrated polymers as positive resistsIBM·Filed 1975·Granted Jan 18, 1977·11 cites·8 claims
- 1548US4460436ADeposition of polymer films by means of ion beamsIBM·Filed 1983·Granted Jul 17, 1984·13 cites·6 claims
- 1642US5270151ASpin on oxygen reactive ion etch barrierIBM·Filed 1992·Granted Dec 14, 1993·6 cites·6 claims
- 1739US2003108478A1Carbon nanotubes and method of manufacturing same, electron emission source, and displayINTERNAT CT FOR MATERIALS RES·Filed 2002·Application pending·0 cites
- 1837US4379826APositive electron beam resists of ortho chloro substituted phenol or cresol condensed with formaldehydeIBM·Filed 1981·Granted Apr 12, 1983·5 cites·3 claims
- 1934US4482427AProcess for forming via holes having sloped wallsIBM·Filed 1984·Granted Nov 13, 1984·5 cites·6 claims
- 2031US4452665APolymeric halocarbons as plasma etch barriersIBM·Filed 1983·Granted Jun 5, 1984·2 cites·5 claims
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