Inventor · disambiguated record
Martin Kutzner
Also filed as: KUTZNER MARTIN
13 granted patents·3 pending applications·98 citations·filing 1987–2023
91Inventor score
Files withDENTSPLY SIRONA INC7LEYBOLD MATERIALS GMBH4DENTSPLY INT INC2DEGUDENT GMBH1HERAEUS GMBH W C1
Top patents by PatentIndex Score
16 records- 0190US10485640B2Method for producing a blank, blank and a dental restorationDENTSPLY SIRONA INC·Filed 2016·Granted Nov 26, 2019·8 cites·11 claims
- 0289US10441391B2Method to manufacture a colored blank, and blankDENTSPLY SIRONA INC·Filed 2017·Granted Oct 15, 2019·9 cites·48 claims
- 0387US11090142B2Method for producing a blank and dental restorationDENTSPLY SIRONA INC·Filed 2016·Granted Aug 17, 2021·6 cites·11 claims
- 0487US10327874B2Support body for a blankDENTSPLY INT INC·Filed 2016·Granted Jun 25, 2019·5 cites·15 claims
- 0584US9737465B2Process for producing a blank, and a blankDENTSPLY INT INC·Filed 2014·Granted Aug 22, 2017·4 cites·24 claims
- 0667US4818626AMethod for producing sintered metalized aluminum nitride ceramic bodiesHERAEUS GMBH W C·Filed 1987·Granted Apr 4, 1989·20 cites·22 claims
- 0765US11464608B2Method for producing a blank, blank and a dental restorationDENTSPLY SIRONA INC·Filed 2019·Granted Oct 11, 2022·0 cites·13 claims
- 0864US11166794B2Support body for a blankDENTSPLY SIRONA INC·Filed 2019·Granted Nov 9, 2021·0 cites·20 claims
- 0964US2021338389A1Method for producing a blank and dental restorationDENTSPLY SIRONA INC·Filed 2021·Application pending·0 cites
- 1060US5480532ASputter target for cathodic atomization to produce transparent, conductive layersLEYBOLD MATERIALS GMBH·Filed 1994·Granted Jan 2, 1996·21 cites·5 claims
- 1160US2025275839A1Blank and method for manufacturing the sameDEGUDENT GMBH·Filed 2023·Application pending·0 cites
- 1247US8512606B2Procedure for dimensionally accurate sintering of a shaped pieceKUTZNER MARTIN·Filed 2009·Granted Aug 20, 2013·0 cites·15 claims
- 1345US2021290351A1Method for the manufacture of a blank and blankDENTSPLY SIRONA INC·Filed 2019·Application pending·0 cites
- 1441US5531948AProcess for the production of partially reduced indium oxide-tin oxide targetsLEYBOLD MATERIALS GMBH·Filed 1995·Granted Jul 2, 1996·9 cites·5 claims
- 1539US5660599AProcess for the recycling of spent indium oxide-tin oxide sputtering targetsLEYBOLD MATERIALS GMBH·Filed 1995·Granted Aug 26, 1997·9 cites·4 claims
- 1635US6187253B1Method of preparing indium oxide/tin oxide target for cathodic sputteringLEYBOLD MATERIALS GMBH·Filed 1997·Granted Feb 13, 2001·7 cites·1 claims
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →