Inventor · disambiguated record
Masahiro Ogasawara
Also filed as: OGASAWARA MASAHIRO
30 granted patents·11 pending applications·1,437 citations·filing 1984–2022
97Inventor score
Top patents by PatentIndex Score
41 records- 0197US5919332APlasma processing apparatusTOKYO ELECTRON LTD·Filed 1996·Granted Jul 6, 1999·445 cites·15 claims
- 0296US9865471B2Etching method and etching apparatusTOKYO ELECTRON LTD·Filed 2016·Granted Jan 9, 2018·43 cites·11 claims
- 0396US7255773B2Plasma processing apparatus and evacuation ringTOKYO ELECTRON LTD·Filed 2005·Granted Aug 14, 2007·33 cites·20 claims
- 0496US5997962APlasma process utilizing an electrostatic chuckTOKYO ELECTRON LTD·Filed 1996·Granted Dec 7, 1999·253 cites·11 claims
- 0593US5494522APlasma process system and methodTOKYO ELECTRON LTD·Filed 1994·Granted Feb 27, 1996·90 cites·6 claims
- 0690US5356515ADry etching methodTOKYO ELECTRON LTD·Filed 1992·Granted Oct 18, 1994·139 cites·10 claims
- 0788US7506610B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2005·Granted Mar 24, 2009·15 cites·16 claims
- 0888US5770098AEtching processTOKYO ELECTRON LTD·Filed 1994·Granted Jun 23, 1998·144 cites·11 claims
- 0987US5411624AMagnetron plasma processing apparatusTOKYO ELECTRON LTD·Filed 1993·Granted May 2, 1995·54 cites·17 claims
- 1086US7494561B2Plasma processing apparatus and method, and electrode plate for plasma processing apparatusTOKYO ELECTRON LTD·Filed 2005·Granted Feb 24, 2009·12 cites·32 claims
- 1183US6878234B2Plasma processing device and exhaust ringTOKYO ELECTRON LTD·Filed 2001·Granted Apr 12, 2005·25 cites·12 claims
- 1283US4558510AMethod of producing a semiconductor deviceTOKYO SHIBAURA ELECTRIC CO·Filed 1984·Granted Dec 17, 1985·43 cites·8 claims
- 1381US5449977AApparatus and method for generating plasma of uniform flux densityMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1994·Granted Sep 12, 1995·37 cites·13 claims
- 1480US5717294APlasma process apparatusTOSHIBA KK·Filed 1995·Granted Feb 10, 1998·65 cites·10 claims
- 1577US8512510B2Plasma processing method and apparatusKOSHIISHI AKIRA·Filed 2011·Granted Aug 20, 2013·3 cites·17 claims
- 1667US8298960B2Plasma etching method, control program and computer storage mediumOGASAWARA MASAHIRO·Filed 2009·Granted Oct 30, 2012·2 cites·6 claims
- 1767US7351665B2Plasma etching method, plasma etching apparatus, control program, computer recording medium and recording medium having processing recipe recorded thereonTOKYO ELECTRON LTD·Filed 2006·Granted Apr 1, 2008·2 cites·5 claims
- 1863US5785877ADry etching methodNIPPON TELEGRAPH & TELEPHONE·Filed 1997·Granted Jul 28, 1998·29 cites·11 claims
- 1959US8609549B2Plasma etching method, plasma etching apparatus, and computer-readable storage mediumLEE SUNGTAE·Filed 2011·Granted Dec 17, 2013·1 cites·12 claims
- 2058US11389617B2Sleep induction device and sleep induction methodOGASAWARA MASAHIRO·Filed 2010·Granted Jul 19, 2022·1 cites·10 claims
- 2158US2022313944A1Sleep Induction Device and Sleep Induction MethodMIGNON BELLE CO LTD·Filed 2022·Application pending·0 cites
- 2257US2010043974A1Plasma processing method and apparatusKOSHIISHI AKIRA·Filed 2009·Application pending·0 cites
- 2356US11404279B2Etching method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Aug 2, 2022·0 cites·9 claims
- 2452US11257662B2Annular member, plasma processing apparatus and plasma etching methodTOKYO ELECTRON LTD·Filed 2019·Granted Feb 22, 2022·0 cites·8 claims
- 2552US2009229759A1Annular assembly for plasma processing, plasma processing apparatus, and outer annular memberTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 2652US2008156441A1Plasma processing apparatus and electrode plate, electrode supporting body, and shield ring thereofTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 2750US9257301B2Method of etching silicon oxide filmTOKYO ELECTRON LTD·Filed 2014·Granted Feb 9, 2016·0 cites·14 claims
- 2850US8986561B2Substrate processing method and storage mediumLEE SUNGTAE·Filed 2009·Granted Mar 24, 2015·0 cites·33 claims
- 2950US8642482B2Plasma etching method, control program and computer storage mediumOGASAWARA MASAHIRO·Filed 2012·Granted Feb 4, 2014·0 cites·18 claims
- 3050US2007224709A1Plasma processing method and apparatus, control program and storage mediumTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 3149US9530657B2Method of processing substrate and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Dec 27, 2016·0 cites·8 claims
- 3249US2006000803A1Plasma processing method and apparatusKOSHIISHI AKIRA·Filed 2005·Application pending·0 cites
- 3347US2021305023A1Edge ring and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 3445US7300881B2Plasma etching methodTOKYO ELECTRON LTD·Filed 2004·Granted Nov 27, 2007·1 cites·9 claims
- 3545US2010152645A1Facial Hair-Growth Device and Facial Hair-Growth SystemOGASAWARA MASAHIRO·Filed 2008·Application pending·0 cites
- 3643US10384073B2Skin wound healing and hair growthMIGNON BELLE CO LTD·Filed 2015·Granted Aug 20, 2019·0 cites·6 claims
- 3743US2012271383A1Skin Wound Healing and Hair Growth DeviceOGASAWARA MASAHIRO·Filed 2010·Application pending·0 cites
- 3842US9716014B2Method of processing workpieceTOKYO ELECTRON LTD·Filed 2016·Granted Jul 25, 2017·0 cites·11 claims
- 3941US8815106B2Method of supplying etching gas and etching apparatusOGASAWARA MASAHIRO·Filed 2011·Granted Aug 26, 2014·0 cites·8 claims
- 4040US2003155078A1Plasma processing apparatus, and electrode plate, electrode supporting body, and shield ring thereofTOKYO ELECTRON LTD·Filed 2003·Application pending·0 cites
- 4138US2010218786A1Cleaning method of plasma processing apparatus and storage mediumTOKYO ELECTRON LTD·Filed 2010·Application pending·0 cites
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