Inventor · disambiguated record
Kyoko Soga
Also filed as: SOGA KYOKO
15 granted patents·1 pending application·31 citations·filing 2003–2020
88Inventor score
Top patents by PatentIndex Score
16 records- 0190US8889810B2Adhesive composition and adhesive dry filmTAKEDA TAKANOBU·Filed 2012·Granted Nov 18, 2014·8 cites·11 claims
- 0289US9012111B2Photo-curable resin composition, photo-curable dry film, patterning process, protective film, and electric/electronic partSHINETSU CHEMICAL CO·Filed 2013·Granted Apr 21, 2015·6 cites·15 claims
- 0381US8697333B2Photocurable resin composition, dry film thereof, pattern forming method, and electrical/electronic part protective filmSOGA KYOKO·Filed 2011·Granted Apr 15, 2014·5 cites·15 claims
- 0476US10416559B2Film material and pattern forming processSHINETSU CHEMICAL CO·Filed 2017·Granted Sep 17, 2019·1 cites·7 claims
- 0576US10319653B2Semiconductor apparatus, stacked semiconductor apparatus, encapsulated stacked-semiconductor apparatus, and method for manufacturing the sameSHINETSU CHEMICAL CO·Filed 2015·Granted Jun 11, 2019·3 cites·10 claims
- 0672US10416557B2Method for manufacturing semiconductor apparatus, method for manufacturing flip-chip type semiconductor apparatus, semiconductor apparatus, and flip-chip type semiconductor apparatusSHINETSU CHEMICAL CO·Filed 2017·Granted Sep 17, 2019·2 cites·11 claims
- 0760US10141272B2Semiconductor apparatus, stacked semiconductor apparatus and encapsulated stacked-semiconductor apparatus each having photo-curable resin layerSHINETSU CHEMICAL CO·Filed 2015·Granted Nov 27, 2018·1 cites·7 claims
- 0858US6773858B2Positive photoresist compositionSHINETSU CHEMICAL CO·Filed 2003·Granted Aug 10, 2004·5 cites·2 claims
- 0957US11119409B2Polysiloxane skeleton polymer, photosensitive resin composition, pattern forming process, and fabrication of opto-semiconductor deviceSHINETSU CHEMICAL CO·Filed 2019·Granted Sep 14, 2021·0 cites·14 claims
- 1049US11548985B2Siloxane polymer containing isocyanuric acid and polyether skeletons, photosensitive resin composition, pattern forming process, and fabrication of opto-semiconductor deviceSHINETSU CHEMICAL CO·Filed 2019·Granted Jan 10, 2023·0 cites·14 claims
- 1145US9971242B2Photo-curable resin composition and photo-curable dry film using the sameSHINETSU CHEMICAL CO·Filed 2016·Granted May 15, 2018·0 cites·5 claims
- 1245US9796892B2Silicone adhesive composition and solid-state imaging deviceSHINETSU CHEMICAL CO·Filed 2014·Granted Oct 24, 2017·0 cites·6 claims
- 1341US10948823B2Laminate and pattern forming methodSHINETSU CHEMICAL CO·Filed 2017·Granted Mar 16, 2021·0 cites·7 claims
- 1441US2022236644A1Photosensitive resin composition, photosensitive dry film, layered product, and pattern formation methodSHINETSU CHEMICAL CO·Filed 2020·Application pending·0 cites
- 1536US9620429B2Semiconductor apparatus, stacked semiconductor apparatus, encapsulated stacked-semiconductor apparatus, and method for manufacturing the sameSHINETSU CHEMICAL CO·Filed 2016·Granted Apr 11, 2017·0 cites·17 claims
- 1636US9494863B2Chemically amplified negative resist composition, photo-curable dry film, making method, patterning process, and electric/electronic part-protecting filmSHINETSU CHEMICAL CO·Filed 2015·Granted Nov 15, 2016·0 cites·12 claims
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