Inventor · disambiguated record
Stijn Willem Herman Karel Steenbrink
Also filed as: STEENBRINK STIJN WILLEM · STEENBRINK STIJN WILLEM HERMAN · STEENBRINK STIJN WILLEM HERMAN KAREL · STEENBRINK STIJN WILLEM KAREL HERMAN
38 granted patents·2 pending applications·303 citations·filing 2004–2020
97Inventor score
Files withMAPPER LITHOGRAPHY IP BV15WIELAND MARCO JAN-JACO7KRUIT PIETER4STEENBRINK STIJN WILLEM HERMAN KAREL4ASML NETHERLANDS BV2
Top patents by PatentIndex Score
40 records- 0196US8134135B2Multiple beam charged particle optical systemKRUIT PIETER·Filed 2007·Granted Mar 13, 2012·43 cites·43 claims
- 0296US8089056B2Projection lens arrangementWIELAND MARCO JAN JACO·Filed 2009·Granted Jan 3, 2012·29 cites·20 claims
- 0394US8618496B2Charged particle system comprising a manipulator device for manipulation of one or more charged particle beamsWIELAND MARCO JAN-JACO·Filed 2012·Granted Dec 31, 2013·38 cites·36 claims
- 0494US7868300B2Lithography system, sensor and measuring methodMAPPER LITHOGRAPHY IP BV·Filed 2006·Granted Jan 11, 2011·30 cites·37 claims
- 0593US7842936B2Lithography system and projection methodMAPPER LITHOGRAPHY IP BV·Filed 2007·Granted Nov 30, 2010·20 cites·15 claims
- 0691US8492731B2Charged particle multi-beamlet lithography system with modulation deviceWIELAND MARCO JAN-JACO·Filed 2010·Granted Jul 23, 2013·9 cites·24 claims
- 0791US8198602B2Electrostatic lens structureSTEENBRINK STIJN WILLEM HERMAN KAREL·Filed 2011·Granted Jun 12, 2012·22 cites·23 claims
- 0889US8586949B2Charged particle lithography system with intermediate chamberDINU-GUERTLER LAURA·Filed 2011·Granted Nov 19, 2013·17 cites·16 claims
- 0989US7709815B2Lithography system and projection methodMAPPER LITHOGRAPHY IP BV·Filed 2006·Granted May 4, 2010·19 cites·22 claims
- 1087US8570055B2Capacitive sensing systemDE BOER GUIDO·Filed 2010·Granted Oct 29, 2013·8 cites·20 claims
- 1185US8841920B2Capacitive sensing systemMAPPER LITHOGRAPHY IP BV·Filed 2013·Granted Sep 23, 2014·3 cites·29 claims
- 1284US8890094B2Projection lens arrangementMAPPER LITHOGRAPHY IP BV·Filed 2013·Granted Nov 18, 2014·6 cites·19 claims
- 1384US8604411B2Charged particle beam modulatorWIELAND MARCO JAN-JACO·Filed 2011·Granted Dec 10, 2013·6 cites·31 claims
- 1483US8598545B2Multiple beam charged particle optical systemKRUIT PIETER·Filed 2012·Granted Dec 3, 2013·4 cites·11 claims
- 1583US8362441B2Enhanced integrity projection lens assemblyMAPPER LITHOGRAPHY IP BV·Filed 2010·Granted Jan 29, 2013·7 cites·54 claims
- 1682US8916837B2Charged particle lithography system with intermediate chamberMAPPER LITHOGRAPHY IP BV·Filed 2013·Granted Dec 23, 2014·4 cites·23 claims
- 1782US8188450B2Multiple beam charged particle optical systemKRUIT PIETER·Filed 2011·Granted May 29, 2012·4 cites·23 claims
- 1880US8921758B2Modulation device and charged particle multi-beamlet lithography system using the sameWIELAND MARCO JAN-JACO·Filed 2011·Granted Dec 30, 2014·4 cites·30 claims
- 1978USRE48046ELithography system, sensor and measuring methodASML NETHERLANDS BV·Filed 2014·Granted Jun 9, 2020·2 cites·57 claims
- 2077US8242467B2Lithography system and projection methodJAGER REMCO·Filed 2010·Granted Aug 14, 2012·5 cites·20 claims
- 2175US8841636B2Modulation device and charged particle multi-beamlet lithography system using the sameWIELAND MARCO JAN-JACO·Filed 2010·Granted Sep 23, 2014·2 cites·23 claims
- 2274US8648318B2Multiple beam charged particle optical systemKRUIT PIETER·Filed 2011·Granted Feb 11, 2014·2 cites·10 claims
- 2372USRE49602ELithography system, sensor and measuring methodASML NETHERLANDS BV·Filed 2020·Granted Aug 8, 2023·0 cites·57 claims
- 2471US8513959B2Integrated sensor systemDE BOER GUIDO·Filed 2010·Granted Aug 20, 2013·1 cites·22 claims
- 2571US7710009B2System, method and apparatus for multi-beam lithography including a dispenser cathode for homogeneous electron emissionMAPPER LITHOGRAPHY IP BV·Filed 2007·Granted May 4, 2010·2 cites·35 claims
- 2670US8263942B2System, method and apparatus for multi-beam lithography including a dispenser cathode for homogeneous electron emissionSTEENBRINK STIJN WILLEM HERMAN KAREL·Filed 2011·Granted Sep 11, 2012·1 cites·17 claims
- 2769US7215070B2System, method and apparatus for multi-beam lithography including a dispenser cathode for homogeneous electron emissionMAPPER LITHOGRAPHY IP BV·Filed 2004·Granted May 8, 2007·5 cites·27 claims
- 2868US8890095B2Reliability in a maskless lithography systemSTEENBRINK STIJN WILLEM HERMAN KAREL·Filed 2006·Granted Nov 18, 2014·2 cites·18 claims
- 2968US8716671B2Enhanced integrity projection lens assemblyKONING JOHAN JOOST·Filed 2012·Granted May 6, 2014·2 cites·24 claims
- 3065US8110813B2Charged particle optical system comprising an electrostatic deflectorBAARS NORMAN HENDRIKUS RUDOLF·Filed 2010·Granted Feb 7, 2012·4 cites·23 claims
- 3161USRE46452EElectrostatic lens structureMAPPER LITHOGRAPHY IP BV·Filed 2014·Granted Jun 27, 2017·1 cites·34 claims
- 3259US8759787B2Charged particle multi-beamlet lithography system with modulation deviceMAPPER LITHOGRAPHY IP BV·Filed 2013·Granted Jun 24, 2014·0 cites·12 claims
- 3355US9362084B2Electro-optical element for multiple beam alignmentVAN DEN BROM ALRIK·Filed 2012·Granted Jun 7, 2016·1 cites·15 claims
- 3454US2017309438A1Electrostatic lens structureMAPPER LITHOGRAPHY IP BV·Filed 2017·Application pending·0 cites
- 3553US9105439B2Projection lens arrangementWIELAND MARCO JAN JACO·Filed 2011·Granted Aug 11, 2015·0 cites·23 claims
- 3653USRE45552ELithography system and projection methodMAPPER LITHOGRAPHY IP BV·Filed 2012·Granted Jun 9, 2015·0 cites·31 claims
- 3753US2009261267A1Projection lens arrangementMAPPER LITHOGRAPHY IP BV·Filed 2009·Application pending·0 cites
- 3852US8247958B2System, method and apparatus for multi-beam lithography including a dispenser cathode for homogeneous electron emissionSTEENBRINK STIJN WILLEM HERMAN KAREL·Filed 2010·Granted Aug 21, 2012·0 cites·11 claims
- 3945US8987679B2Enhanced integrity projection lens assemblyMAPPER LITHOGRAPHY IP BV·Filed 2012·Granted Mar 24, 2015·0 cites·25 claims
- 4034US8624478B2High voltage shielding arrangement of a charged particle lithography systemKONING JOHAN JOOST·Filed 2010·Granted Jan 7, 2014·0 cites·12 claims
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