Inventor · disambiguated record
Effiong Ibok
Also filed as: IBOK EFFIONG · IBOK EFFIONG E · IBOK EFFIONG ETUKUDO
61 granted patents·3 pending applications·2,063 citations·filing 1988–2012
99Inventor score
Files withADVANCED MICRO DEVICES INC59TRAVIS BUSINESS GROUP INC2ADVANCED MICROS DEVICES INC1IBOK EFFIONG ETUKUDO1
Top patents by PatentIndex Score
64 records- 0197US6451641B1Non-reducing process for deposition of polysilicon gate electrode over high-K gate dielectric materialADVANCED MICRO DEVICES INC·Filed 2002·Granted Sep 17, 2002·148 cites·20 claims
- 0296US6043138AMulti-step polysilicon deposition process for boron penetration inhibitionADVANCED MICRO DEVICES INC·Filed 1997·Granted Mar 28, 2000·189 cites·23 claims
- 0395US6329256B1Self-aligned damascene gate formation with low gate resistanceADVANCED MICRO DEVICES INC·Filed 2000·Granted Dec 11, 2001·102 cites·5 claims
- 0493US6630383B1Bi-layer floating gate for improved work function between floating gate and a high-K dielectric layerADVANCED MICRO DEVICES INC·Filed 2002·Granted Oct 7, 2003·74 cites·21 claims
- 0593US6232244B1Methodology for achieving dual gate oxide thicknessesADVANCED MICRO DEVICES INC·Filed 2000·Granted May 15, 2001·63 cites·7 claims
- 0692US6080682AMethodology for achieving dual gate oxide thicknessesADVANCED MICRO DEVICES INC·Filed 1997·Granted Jun 27, 2000·104 cites·26 claims
- 0791US6444555B2Method for establishing ultra-thin gate insulator using anneal in ammoniaADVANCED MICRO DEVICES INC·Filed 2000·Granted Sep 3, 2002·60 cites·3 claims
- 0890US6037671AStepper alignment mark structure for maintaining alignment integrityADVANCED MICRO DEVICES INC·Filed 1998·Granted Mar 14, 2000·107 cites·21 claims
- 0989US6472233B1MOSFET test structure for capacitance-voltage measurementsADVANCED MICRO DEVICES INC·Filed 2000·Granted Oct 29, 2002·45 cites·12 claims
- 1089US6025228AMethod of fabricating an oxynitride-capped high dielectric constant interpolysilicon dielectric structure for a low voltage non-volatile memoryADVANCED MICRO DEVICES INC·Filed 1997·Granted Feb 15, 2000·79 cites·72 claims
- 1187US6472283B1MOS transistor processing utilizing UV-nitride removable spacer and HF etchADVANCED MICRO DEVICES INC·Filed 2000·Granted Oct 29, 2002·51 cites·19 claims
- 1287US6344396B1Removable spacer technology using ion implantation for forming asymmetric MOS transistorsADVANCED MICRO DEVICES INC·Filed 2000·Granted Feb 5, 2002·51 cites·18 claims
- 1385US5930645AShallow trench isolation formation with reduced polish stop thicknessADVANCED MICRO DEVICES INC·Filed 1997·Granted Jul 27, 1999·87 cites·17 claims
- 1484US6693004B1Interfacial barrier layer in semiconductor devices with high-K gate dielectric materialADVANCED MICRO DEVICES INC·Filed 2002·Granted Feb 17, 2004·33 cites·21 claims
- 1584US6239031B1Stepper alignment mark structure for maintaining alignment integrityADVANCED MICRO DEVICES INC·Filed 2000·Granted May 29, 2001·39 cites·3 claims
- 1682US8045314B2Method of atmospheric discharge energy conversion, storage and distributionTRAVIS BUSINESS GROUP INC·Filed 2009·Granted Oct 25, 2011·12 cites·18 claims
- 1782US6429083B1Removable spacer technology using ion implantation to augment etch rate differences of spacer materialsADVANCED MICRO DEVICES INC·Filed 2000·Granted Aug 6, 2002·32 cites·31 claims
- 1882US6171962B1Shallow trench isolation formation without planarization maskADVANCED MICRO DEVICES INC·Filed 1997·Granted Jan 9, 2001·68 cites·11 claims
- 1975US6735123B1High density dual bit flash memory cell with non planar structureADVANCED MICRO DEVICES INC·Filed 2002·Granted May 11, 2004·20 cites·7 claims
- 2074US6235456B1Graded anti-reflective barrier films for ultra-fine lithographyADVANCED MICROS DEVICES INC·Filed 1998·Granted May 22, 2001·36 cites·19 claims
- 2172US6207542B1Method for establishing ultra-thin gate insulator using oxidized nitride filmADVANCED MICRO DEVICES INC·Filed 2000·Granted Mar 27, 2001·14 cites·8 claims
- 2271US6143624AShallow trench isolation formation with spacer-assisted ion implantationADVANCED MICRO DEVICES INC·Filed 1998·Granted Nov 7, 2000·42 cites·24 claims
- 2370US6372582B1Indium retrograde channel doping for improved gate oxide reliabilityADVANCED MICRO DEVICES INC·Filed 2000·Granted Apr 16, 2002·13 cites·13 claims
- 2470US6342423B1MOS-type transistor processing utilizing UV-nitride removable spacer and HF etchADVANCED MICRO DEVICES INC·Filed 2000·Granted Jan 29, 2002·16 cites·19 claims
- 2570US6051478AMethod of enhancing trench edge oxide qualityADVANCED MICRO DEVICES INC·Filed 1997·Granted Apr 18, 2000·36 cites·26 claims
- 2669US6235607B1Method for establishing component isolation regions in SOI semiconductor deviceADVANCED MICRO DEVICES INC·Filed 2000·Granted May 22, 2001·13 cites·15 claims
- 2769US6180466B1Isotropic assisted dual trench etchADVANCED MICRO DEVICES INC·Filed 1997·Granted Jan 30, 2001·35 cites·41 claims
- 2868US6074927AShallow trench isolation formation with trench wall spacerADVANCED MICRO DEVICES INC·Filed 1998·Granted Jun 13, 2000·37 cites·17 claims
- 2968US6020238AMethod of fabricating a high dielectric constant interpolysilicon dielectric structure for a low voltage non-volatile memoryADVANCED MICRO DEVICES INC·Filed 1997·Granted Feb 1, 2000·26 cites·76 claims
- 3068US5940718ANitridation assisted polysilicon sidewall protection in self-aligned shallow trench isolationADVANCED MICRO DEVICES INC·Filed 1998·Granted Aug 17, 1999·33 cites·17 claims
- 3168US5879975AHeat treating nitrogen implanted gate electrode layer for improved gate electrode etch profileADVANCED MICRO DEVICES INC·Filed 1997·Granted Mar 9, 1999·33 cites·14 claims
- 3268US5518950ASpin-on-glass filled trench isolation method for semiconductor circuitsADVANCED MICRO DEVICES INC·Filed 1994·Granted May 21, 1996·39 cites·27 claims
- 3367US6593637B1Method for establishing component isolation regions in SOI semiconductor deviceADVANCED MICRO DEVICES INC·Filed 2001·Granted Jul 15, 2003·11 cites·10 claims
- 3464US6599810B1Shallow trench isolation formation with ion implantationADVANCED MICRO DEVICES INC·Filed 1998·Granted Jul 29, 2003·29 cites·21 claims
- 3563US6034395ASemiconductor device having a reduced height floating gateADVANCED MICRO DEVICES INC·Filed 1998·Granted Mar 7, 2000·21 cites·9 claims
- 3662US6391784B1Spacer-assisted ultranarrow shallow trench isolation formationADVANCED MICRO DEVICES INC·Filed 1999·Granted May 21, 2002·25 cites·11 claims
- 3760US6228746B1Methodology for achieving dual field oxide thicknessesADVANCED MICRO DEVICES INC·Filed 1997·Granted May 8, 2001·24 cites·33 claims
- 3860US6225170B1Self-aligned damascene gate with contact formationADVANCED MICRO DEVICES INC·Filed 1999·Granted May 1, 2001·19 cites·7 claims
- 3959US6380047B1Shallow trench isolation formation with two source/drain masks and simplified planarization maskADVANCED MICRO DEVICES INC·Filed 2000·Granted Apr 30, 2002·9 cites·17 claims
- 4059US6124183AShallow trench isolation formation with simplified reverse planarization maskADVANCED MICRO DEVICES INC·Filed 1997·Granted Sep 26, 2000·25 cites·13 claims
- 4158US6153486AMethod for establishing shallow junction in semiconductor device to minimize junction capacitanceADVANCED MICRO DEVICES INC·Filed 2000·Granted Nov 28, 2000·6 cites·16 claims
- 4257US6399519B1Method for establishing ultra-thin gate insulator having annealed oxide and oxidized nitrideADVANCED MICRO DEVICES INC·Filed 2000·Granted Jun 4, 2002·5 cites·8 claims
- 4357US6130467AShallow trench isolation with spacers for improved gate oxide qualityADVANCED MICRO DEVICES INC·Filed 1997·Granted Oct 10, 2000·23 cites·2 claims
- 4454US4894353AMethod of fabricating passivated tunnel oxideADVANCED MICRO DEVICES INC·Filed 1988·Granted Jan 16, 1990·19 cites·16 claims
- 4554US2002116219A1Method of wireless medical database creation and retrievalFiled 2001·Application pending·0 cites
- 4653US5970363AShallow trench isolation formation with improved trench edge oxideADVANCED MICRO DEVICES INC·Filed 1997·Granted Oct 19, 1999·19 cites·30 claims
- 4751US5970362ASimplified shallow trench isolation formation with no polish stopADVANCED MICRO DEVICES INC·Filed 1997·Granted Oct 19, 1999·17 cites·14 claims
- 4851US5712196AMethod for producing a low resistivity polycideADVANCED MICRO DEVICES INC·Filed 1996·Granted Jan 27, 1998·12 cites·19 claims
- 4951US5384272AMethod for manufacturing a non-volatile, virtual ground memory elementADVANCED MICRO DEVICES INC·Filed 1994·Granted Jan 24, 1995·13 cites·11 claims
- 5050US6800568B1Methods for the deposition of high-K films and high-K films produced therebyADVANCED MICRO DEVICES INC·Filed 2002·Granted Oct 5, 2004·2 cites·18 claims
Showing the top 50 of 64 patent records by PatentIndex Score.
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