Inventor · disambiguated record
Yuuichi Mikata
Also filed as: MIKATA YUUICHI
46 granted patents·1 pending application·1,789 citations·filing 1985–2006
98Inventor score
Top patents by PatentIndex Score
47 records- 0198US6713824B1Reliable semiconductor device and method of manufacturing the sameTOSHIBA KK·Filed 1999·Granted Mar 30, 2004·527 cites·23 claims
- 0297US5637153AMethod of cleaning reaction tube and exhaustion piping system in heat processing apparatusTOKYO ELECTRON LTD·Filed 1995·Granted Jun 10, 1997·351 cites·16 claims
- 0389US4931405AMethod for manufacturing a semiconductor device and suppressing the generation of bulk microdefects near the substrate surface layerTOSHIBA KK·Filed 1989·Granted Jun 5, 1990·102 cites·4 claims
- 0485US5380370AMethod of cleaning reaction tubeTOKYO ELECTRON LTD·Filed 1993·Granted Jan 10, 1995·56 cites·8 claims
- 0583US6093243ASemiconductor device and its fabricating methodTOSHIBA KK·Filed 1997·Granted Jul 25, 2000·50 cites·1 claims
- 0683US4597159AMethod of manufacturing SiO2 -Si interface for floating gate semiconductor deviceTOSHIBA KK·Filed 1985·Granted Jul 1, 1986·44 cites·6 claims
- 0782US6865513B2Method for predicting life of rotary machine and determining repair timing of rotary machineTOSHIBA KK·Filed 2002·Granted Mar 8, 2005·18 cites·18 claims
- 0881US5234869AMethod of manufacturing silicon nitride filmTOSHIBA KK·Filed 1991·Granted Aug 10, 1993·72 cites·6 claims
- 0979US5582640ASemiconductor device and its fabricating methodTOSHIBA KK·Filed 1993·Granted Dec 10, 1996·50 cites·13 claims
- 1076US5746581AMethod and apparatus for evacuating vacuum systemEBARA CORP·Filed 1995·Granted May 5, 1998·41 cites·18 claims
- 1174US5316472AVertical boat used for heat treatment of semiconductor wafer and vertical heat treatment apparatusTOKYO ELECTRON LTD·Filed 1992·Granted May 31, 1994·66 cites·24 claims
- 1272US6944572B2Apparatus for predicting life of rotary machine and equipment using the sameTOSHIBA KK·Filed 2004·Granted Sep 13, 2005·15 cites·22 claims
- 1371US7844433B2System, method and program for designing a utility facility and method for manufacturing a product by the utility facilityTOSHIBA KK·Filed 2006·Granted Nov 30, 2010·8 cites·20 claims
- 1470US6066872ASemiconductor device and its fabricating methodTOSHIBA KK·Filed 1997·Granted May 23, 2000·27 cites·5 claims
- 1566US5378652AMethod of making a through hole in multi-layer insulating filmsTOSHIBA KK·Filed 1991·Granted Jan 3, 1995·37 cites·6 claims
- 1664US5238859AMethod of manufacturing semiconductor deviceTOSHIBA KK·Filed 1991·Granted Aug 24, 1993·39 cites·3 claims
- 1762US6772045B2System for determining dry cleaning timing, method for determining dry cleaning timing, dry cleaning method, and method for manufacturing semiconductor deviceTOSHIBA KK·Filed 2002·Granted Aug 3, 2004·8 cites·27 claims
- 1860US5370371AHeat treatment apparatusTOKYO ELECTRON LTD·Filed 1993·Granted Dec 6, 1994·30 cites·15 claims
- 1960US5237196ASemiconductor device and method for manufacturing the sameTOSHIBA KK·Filed 1990·Granted Aug 17, 1993·22 cites·3 claims
- 2060US5032535AMethod of manufacturing semiconductor deviceTOSHIBA KK·Filed 1989·Granted Jul 16, 1991·27 cites·6 claims
- 2159US5561087AMethod of forming a uniform thin film by cooling wafers during CVDTOSHIBA KK·Filed 1994·Granted Oct 1, 1996·15 cites·10 claims
- 2258US5291058ASemiconductor device silicon via fill formed in multiple dielectric layersTOSHIBA KK·Filed 1992·Granted Mar 1, 1994·26 cites·4 claims
- 2357US6983191B2Semiconductor manufacturing line availability evaluating system and design systemTOSHIBA KK·Filed 2004·Granted Jan 3, 2006·5 cites·19 claims
- 2456US6163050ASemiconductor device having insulation film whose breakdown voltage is improved and its manufacturing methodTOSHIBA KK·Filed 1997·Granted Dec 19, 2000·16 cites·3 claims
- 2556US5714399ASemiconductor device having insulation film whose breakdown voltage is improved and its manufacturing methodTOSHIBA KK·Filed 1995·Granted Feb 3, 1998·16 cites·24 claims
- 2655US5879447ASemiconductor device and its fabricating methodTOSHIBA KK·Filed 1995·Granted Mar 9, 1999·14 cites·4 claims
- 2754US6171977B1Semiconductor device applied to composite insulative film manufacturing method thereofTOSHIBA KK·Filed 1996·Granted Jan 9, 2001·17 cites·15 claims
- 2852US4966866AMethod for manufacturing semiconductor device having gate electrodes of different conductivity typesTOSHIBA KK·Filed 1989·Granted Oct 30, 1990·13 cites·11 claims
- 2949US5702531AApparatus for forming a thin filmTOSHIBA KK·Filed 1995·Granted Dec 30, 1997·11 cites·6 claims
- 3048US7145667B2Semiconductor device manufacturing method, semiconductor device manufacturing apparatus, semiconductor device manufacturing system, and cleaning method for semiconductor device manufacturing apparatusTOSHIBA KK·Filed 2002·Granted Dec 5, 2006·1 cites·29 claims
- 3146US7497908B2Film coating unit and film coating methodSANYO ELECTRIC CO·Filed 2004·Granted Mar 3, 2009·2 cites·13 claims
- 3246US5181088AVertical field effect transistor with an extended polysilicon channel regionTOSHIBA KK·Filed 1991·Granted Jan 19, 1993·11 cites·4 claims
- 3345US5612236AMethod of forming a silicon semiconductor device using doping during deposition of polysiliconTOSHIBA KK·Filed 1995·Granted Mar 18, 1997·10 cites·11 claims
- 3444US6989281B2Cleaning method for a semiconductor device manufacturing apparatusTOSHIBA KK·Filed 2004·Granted Jan 24, 2006·0 cites·8 claims
- 3543US7632382B2Plating apparatusEBARA CORP·Filed 2005·Granted Dec 15, 2009·0 cites·10 claims
- 3643US5149666AMethod of manufacturing a semiconductor memory device having a floating gate electrode composed of 2-10 silicon grainsTOSHIBA KK·Filed 1991·Granted Sep 22, 1992·9 cites·4 claims
- 3740US5838056ASemiconductor device applied to composite insulative film and manufacturing method thereofTOSHIBA KK·Filed 1996·Granted Nov 17, 1998·7 cites·21 claims
- 3839US6929991B2Reliable semiconductor device and method of manufacturing the sameTOSHIBA KK·Filed 2004·Granted Aug 16, 2005·0 cites·10 claims
- 3939US5031010ASemiconductor memory device and method of manufacturing the sameTOSHIBA KK·Filed 1990·Granted Jul 9, 1991·6 cites·4 claims
- 4038US6867054B2Method of manufacturing a semiconductor deviceTOSHIBA KK·Filed 2002·Granted Mar 15, 2005·0 cites·26 claims
- 4137US2007251449A1Coating Film Forming Apparatus and Coating Film Forming MethodTOKYO ELECTION LTD·Filed 2004·Application pending·0 cites
- 4234US5250463AMethod of making doped semiconductor film having uniform impurity concentration on semiconductor substrateTOSHIBA KK·Filed 1991·Granted Oct 5, 1993·6 cites·7 claims
- 4333US5766785AMethod and apparatus for manufacturing a semiconductor deviceTOSHIBA KK·Filed 1995·Granted Jun 16, 1998·3 cites·12 claims
- 4433US5702529AMethod of making doped semiconductor film having uniform impurity concentration on semiconductor substrate and apparatus for making the sameTOSHIBA KK·Filed 1995·Granted Dec 30, 1997·3 cites·4 claims
- 4532US5286523AMethod of processing substrates and substrate processing apparatusTOSHIBA KK·Filed 1991·Granted Feb 15, 1994·4 cites·6 claims
- 4631US6329303B1Thin film forming method, thin film forming apparatus and method for manufacturing semiconductor deviceTOSHIBA KK·Filed 1999·Granted Dec 11, 2001·1 cites·20 claims
- 4726US4721991ARefractory silicide conductor containing ironTOSHIBA KK·Filed 1985·Granted Jan 26, 1988·3 cites·8 claims
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