Inventor · disambiguated record
Hui-Fang Kuo
Also filed as: KUO HUI-FANG
10 granted patents·39 citations·filing 2008–2022
86Inventor score
Top patents by PatentIndex Score
10 records- 0192US8627242B1Method for making photomask layoutUNITED MICROELECTRONICS CORP·Filed 2013·Granted Jan 7, 2014·9 cites·11 claims
- 0290US8701052B1Method of optical proximity correction in combination with double patterning techniqueUNITED MICROELECTRONICS CORP·Filed 2013·Granted Apr 15, 2014·7 cites·11 claims
- 0387US9104833B2Mask set for double exposure process and method of using the mask setUNITED MICROELECTRONICS CORP·Filed 2014·Granted Aug 11, 2015·5 cites·18 claims
- 0482US8930858B1Method for optical proximity correctionUNITED MICROELECTRONICS CORP·Filed 2013·Granted Jan 6, 2015·7 cites·22 claims
- 0577US8778604B2Mask set for double exposure process and method of using the mask setKUO HUI-FANG·Filed 2012·Granted Jul 15, 2014·4 cites·8 claims
- 0666US7943274B2Mask pattern correction and layout methodUNITED MICROELECTRONICS CORP·Filed 2008·Granted May 17, 2011·2 cites·18 claims
- 0764US11934106B2Optical proximity correction device and methodUNITED MICROELECTRONICS CORP·Filed 2022·Granted Mar 19, 2024·0 cites·20 claims
- 0863US8423923B2Optical proximity correction methodHUANG CHIA-WEI·Filed 2011·Granted Apr 16, 2013·1 cites·12 claims
- 0961US8042069B2Method for selectively amending layout patternsUNITED MICROELECTRONICS CORP·Filed 2008·Granted Oct 18, 2011·3 cites·36 claims
- 1060US7797656B2Method of checking and correcting mask patternUNITED MICROELECTRONICS CORP·Filed 2008·Granted Sep 14, 2010·1 cites·14 claims
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