Inventor · disambiguated record
Masaru Isago
Also filed as: ISAGO MASARU
3 granted patents·4 pending applications·0 citations·filing 2014–2025
39Inventor score
Files withTOKYO ELECTRON LTD7
Top patents by PatentIndex Score
7 records- 0144US2024112891A1Plasma processing apparatus and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 0243US9728418B2Etching method and etching apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Aug 8, 2017·0 cites·8 claims
- 0341US2025181087A1Temperature control device, substrate processing apparatus, and temperature control methodTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0440US2021074519A1Heat medium circulation system and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 0539US10553409B2Method of cleaning plasma processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Feb 4, 2020·0 cites·8 claims
- 0637US2019318914A1Processing apparatus and method for controlling processing apparatusTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
- 0728US11367595B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Jun 21, 2022·0 cites·10 claims
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →