Inventor · disambiguated record
Vladislav Vassiliev
Also filed as: VASSILIEV VLADISLAV · VASSILIEV VLADISLAV Y
7 granted patents·731 citations·filing 1997–2000
90Inventor score
Top patents by PatentIndex Score
7 records- 0195US6197705B1Method of silicon oxide and silicon glass films depositionCHARTERED SEMICONDUCTOR MFG·Filed 1999·Granted Mar 6, 2001·299 cites·5 claims
- 0293US6180490B1Method of filling shallow trenchesCHARTERED SEMICONDUCTOR MFG·Filed 1999·Granted Jan 30, 2001·174 cites·11 claims
- 0387US6355581B1Gas-phase additives for an enhancement of lateral etch component during high density plasma film deposition to improve film gap-fill capabilityCHARTERED SEMICONDUCTOR MFG·Filed 2000·Granted Mar 12, 2002·52 cites·17 claims
- 0486US6583069B1Method of silicon oxide and silicon glass films depositionCHARTERED SEMICONDUCTOR MFG CO·Filed 1999·Granted Jun 24, 2003·49 cites·19 claims
- 0584US5876798AMethod of fluorinated silicon oxide film depositionCHARTERED SEMICONDUCTOR MFG·Filed 1997·Granted Mar 2, 1999·76 cites·15 claims
- 0679US6500771B1Method of high-density plasma boron-containing silicate glass film depositionCHARTERED SEMICONDUCTOR MFG·Filed 2000·Granted Dec 31, 2002·24 cites·10 claims
- 0777US6027982AMethod to form shallow trench isolation structures with improved isolation fill and surface planarityCHARTERED SEMICONDUCTOR MFG·Filed 1999·Granted Feb 22, 2000·57 cites·20 claims
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