Inventor · disambiguated record
Tjarko Adriaan Rudolf Van Empel
Also filed as: VAN EMPEL TJARKO · VAN EMPEL TJARKO A R · VAN EMPEL TJARKO ADRIAAN RUDOL · VAN EMPEL TJARKO ADRIAAN RUDOLF
41 granted patents·1 pending application·406 citations·filing 1999–2014
97Inventor score
Files withASML NETHERLANDS BV28VAN EMPEL TJARKO ADRIAAN RUDOLF6VAN DE VIJVER YURI JOHANNES GABRIEL2ASM LITHOGRAPHY BV1RIJPMA ALBERT PIETER1
Top patents by PatentIndex Score
42 records- 0194US6542220B1Purge gas systems for use in lithographic projection apparatusASML NETHERLANDS BV·Filed 2000·Granted Apr 1, 2003·92 cites·15 claims
- 0293US6480260B1Mask clamping apparatus, e.g. for a lithographic apparatusASML NETHERLANDS BV·Filed 2000·Granted Nov 12, 2002·48 cites·26 claims
- 0390US8228487B2Lithographic apparatus and device manufacturing methodRIJPMA ALBERT PIETER·Filed 2009·Granted Jul 24, 2012·32 cites·16 claims
- 0489US7110085B2Lithographic apparatus, substrate holder and method of manufacturingASML NETHERLANDS BV·Filed 2004·Granted Sep 19, 2006·36 cites·20 claims
- 0586US6413701B1Lithographic projection apparatusASML NETHERLANDS BV·Filed 2000·Granted Jul 2, 2002·36 cites·7 claims
- 0685US7492441B2Lithographic apparatus and device manufacturing method incorporating a pressure shieldASML NETHERLANDS BV·Filed 2005·Granted Feb 17, 2009·6 cites·21 claims
- 0782US7542127B2Lithographic apparatus and method for manufacturing a deviceASML NETHERLANDS BV·Filed 2005·Granted Jun 2, 2009·7 cites·29 claims
- 0881US7924399B2Assembly comprising a conditioning system and at least one object, a conditioning system, a lithographic apparatus and methodsASML NETHERLANDS BV·Filed 2006·Granted Apr 12, 2011·6 cites·28 claims
- 0980US9455172B2Electrostatic clampASML NETHERLANDS BV·Filed 2013·Granted Sep 27, 2016·4 cites·12 claims
- 1080US7119885B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Oct 10, 2006·19 cites·20 claims
- 1177US8451429B2Dichroic mirror, method for manufacturing a dichroic mirror, lithographic apparatus, semiconductor device and method of manufacturing thereforVAN EMPEL TJARKO ADRIAAN RUDOLF·Filed 2009·Granted May 28, 2013·6 cites·15 claims
- 1275US7106412B2Lithographic apparatus comprising a gas flushing systemASML NETHERLANDS BV·Filed 2004·Granted Sep 12, 2006·17 cites·30 claims
- 1370USRE41307EMask for clamping apparatus, e.g. for a lithographic apparatusASML NETHERLANDS BV·Filed 2005·Granted May 4, 2010·2 cites·35 claims
- 1470US6707530B2Lithographic apparatus, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2002·Granted Mar 16, 2004·11 cites·10 claims
- 1570US6232615B1Lithographic projection apparatus with improved substrate holderASM LITHOGRAPHY BV·Filed 1999·Granted May 15, 2001·29 cites·9 claims
- 1669US7432513B2Gas shower, lithographic apparatus and use of a gas showerASML NETHERLANDS BV·Filed 2005·Granted Oct 7, 2008·2 cites·66 claims
- 1768US7239368B2Using unflatness information of the substrate table or mask table for decreasing overlayASML NETHERLANDS BV·Filed 2004·Granted Jul 3, 2007·10 cites·13 claims
- 1866US7700930B2Lithographic apparatus with rotation filter deviceASML NETHERLANDS BV·Filed 2007·Granted Apr 20, 2010·2 cites·22 claims
- 1966US7161662B2Lithographic apparatus, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2004·Granted Jan 9, 2007·8 cites·15 claims
- 2066US6933513B2Gas flushing system for use in lithographic apparatusASML NETHERLANDS BV·Filed 2002·Granted Aug 23, 2005·9 cites·20 claims
- 2165US8115900B2Lithographic apparatus and device manufacturing methodVAN DE VIJVER YURI JOHANNES GABRIEL·Filed 2007·Granted Feb 14, 2012·6 cites·23 claims
- 2259US7113262B2Lithographic apparatus, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2004·Granted Sep 26, 2006·8 cites·17 claims
- 2358US7110091B2Lithographic apparatus, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2004·Granted Sep 19, 2006·4 cites·16 claims
- 2457US8218128B2Lithographic apparatus and device manufacturing method incorporating a pressure shieldVAN EMPEL TJARKO ADRIAAN RUDOLF·Filed 2009·Granted Jul 10, 2012·0 cites·11 claims
- 2556US8901521B2Module and method for producing extreme ultraviolet radiationVAN EMPEL TJARKO ADRIAAN RUDOLF·Filed 2008·Granted Dec 2, 2014·3 cites·31 claims
- 2654US8094287B2Lithographic appararus and methodVAN EMPEL TJARKO ADRIAAN RUDOLF·Filed 2008·Granted Jan 10, 2012·0 cites·18 claims
- 2753US9363879B2Module and method for producing extreme ultraviolet radiationASML NETHERLANDS BV·Filed 2014·Granted Jun 7, 2016·0 cites·19 claims
- 2851US7528935B2Lithographic apparatus, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2005·Granted May 5, 2009·0 cites·20 claims
- 2947US8072575B2Lithographic apparatus with temperature sensor and device manufacturing methodVAN EMPEL TJARKO ADRIAAN RUDOLF·Filed 2009·Granted Dec 6, 2011·1 cites·13 claims
- 3047US7629593B2Lithographic apparatus, radiation system, device manufacturing method, and radiation generating methodASML NETHERLANDS BV·Filed 2007·Granted Dec 8, 2009·0 cites·28 claims
- 3146US8441610B2Assembly comprising a conditioning system and at least one object, a conditioning system, a lithographic apparatus and methodsVAN DER HAM RONALD·Filed 2011·Granted May 14, 2013·0 cites·20 claims
- 3246US8242471B2Radiation source and lithographic apparatus including a contamination trapSOER WOUTER ANTHON·Filed 2009·Granted Aug 14, 2012·1 cites·11 claims
- 3346US7728951B2Lithographic apparatus and method for conditioning an interior space of a device manufacturing apparatusASML NETHERLANDS BV·Filed 2005·Granted Jun 1, 2010·0 cites·52 claims
- 3444US8749756B2Lithographic apparatus and device manufacturing methodVAN DE VIJVER YURI JOHANNES GABRIEL·Filed 2012·Granted Jun 10, 2014·0 cites·20 claims
- 3544US8711325B2Method and system for determining a suppression factor of a suppression system and a lithographic apparatusSCHIMMEL HENDRIKUS GIJSBERTUS·Filed 2008·Granted Apr 29, 2014·0 cites·22 claims
- 3643US9176398B2Method and system for thermally conditioning an optical elementSCHMITZ ROGER WILHELMUS ANTONIUS HENRICUS·Filed 2009·Granted Nov 3, 2015·1 cites·13 claims
- 3742US7978339B2Lithographic apparatus temperature compensationASML NETHERLANDS BV·Filed 2005·Granted Jul 12, 2011·0 cites·5 claims
- 3841US7446849B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Nov 4, 2008·0 cites·20 claims
- 3940US7327438B2Lithographic apparatus and method of a manufacturing deviceASML NETHERLANDS BV·Filed 2004·Granted Feb 5, 2008·0 cites·19 claims
- 4039US7227612B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Jun 5, 2007·0 cites·74 claims
- 4138US9766558B2Lithographic apparatus with flexible transportation line having varying stiffness between two objectsVAN EMPEL TJARKO ADRIAAN RUDOLF·Filed 2010·Granted Sep 19, 2017·0 cites·15 claims
- 4237US2011024651A1Radiation system and method, and a spectral purity filterASML NETHERLANDS BV·Filed 2008·Application pending·0 cites
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