Inventor · disambiguated record
Kotaro Endo
Also filed as: ENDO KOTARO
49 granted patents·19 pending applications·423 citations·filing 1997–2025
98Inventor score
Top patents by PatentIndex Score
68 records- 0196US9851637B2Resist composition, method of forming resist pattern, compound, and acid diffusion control agentTOKYO OHKA KOGYO CO LTD·Filed 2016·Granted Dec 26, 2017·7 cites·10 claims
- 0296US9703653B2Cloud system management apparatus, cloud system, reallocation method, and computer program productTOSHIBA KK·Filed 2015·Granted Jul 11, 2017·24 cites·9 claims
- 0395US7879529B2Material for formation of resist protection film and method of forming resist pattern therewithTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Feb 1, 2011·37 cites·20 claims
- 0494US7846637B2Material for forming resist protective film for use in liquid immersion lithography process and method for forming resist pattern using the protective filmTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Dec 7, 2010·40 cites·10 claims
- 0594US7264918B2Resist composition for liquid immersion exposure process and method of forming resist pattern therewithTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted Sep 4, 2007·69 cites·24 claims
- 0689US8338076B2Resist composition, method of forming resist pattern, novel compound, and acid generatorKAWAUE AKIYA·Filed 2009·Granted Dec 25, 2012·7 cites·24 claims
- 0788US7799883B2Norbornene-type polymers, compositions thereof and lithographic process using such compositionsPROMERUS LLC·Filed 2006·Granted Sep 21, 2010·10 cites·23 claims
- 0887US8206891B2Positive resist composition and method of forming resist patternSESHIMO TAKEHIRO·Filed 2009·Granted Jun 26, 2012·10 cites·6 claims
- 0985US8236477B2Positive resist composition and method of forming resist patternMATSUMIYA TASUKU·Filed 2009·Granted Aug 7, 2012·7 cites·8 claims
- 1084US8795947B2Resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2013·Granted Aug 5, 2014·4 cites·2 claims
- 1184US6721863B1Disk control mechanism preferable for random disk writeTOSHIBA KK·Filed 2000·Granted Apr 13, 2004·39 cites·13 claims
- 1283US10180625B2Resist composition, method of forming resist pattern, compound, and acid diffusion control agentTOKYO OHKA KOGYO CO LTD·Filed 2017·Granted Jan 15, 2019·1 cites·2 claims
- 1381US2025371101A1Information processing device, non-transitory storage medium, information processing method and electronic circuitTOSHIBA KK·Filed 2025·Application pending·0 cites
- 1480US6683202B2Fluorine-containing monomeric ester compound for base resin in photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2002·Granted Jan 27, 2004·8 cites·5 claims
- 1576US6807642B2Cluster system having virtual raid, computer for the cluster system, and parity calculation method in the cluster systemTOKYO SHIBAURA ELECTRIC CO·Filed 2002·Granted Oct 19, 2004·23 cites·7 claims
- 1673US8329838B2Norbornene-type polymers, compositions thereof and lithographic processes using such compositionsRHODES LARRY F·Filed 2010·Granted Dec 11, 2012·2 cites·18 claims
- 1769US6799222B1Method for synchronizing program applied to distributed computer systemTOSHIBA KK·Filed 2000·Granted Sep 28, 2004·13 cites·13 claims
- 1869US5978939ATimeout monitoring systemTOSHIBA KK·Filed 1997·Granted Nov 2, 1999·64 cites·11 claims
- 1968US8227169B2Compound, acid generator, resist composition, and method of forming resist patternKAWAUE AKIYA·Filed 2008·Granted Jul 24, 2012·2 cites·9 claims
- 2068US7620845B2Distributed system and redundancy control methodTOSHIBA KK·Filed 2005·Granted Nov 17, 2009·4 cites·12 claims
- 2167US10229797B2Push switchMIYAMA ELECTRIC CO LTD·Filed 2017·Granted Mar 12, 2019·2 cites·9 claims
- 2267US8487056B2Positive resist composition and method of forming resist patternMATSUMIYA TASUKU·Filed 2012·Granted Jul 16, 2013·4 cites·6 claims
- 2366US7951523B2Material for forming resist protective film and method for forming resist pattern using sameTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted May 31, 2011·2 cites·26 claims
- 2464US7592122B2Photoresist composition, and low-molecular compound and high-molecular compound for the photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted Sep 22, 2009·3 cites·6 claims
- 2563US7171465B1Method for determining a server computer which carried out a process most recently, and high availability computer systemTOSHIBA KK·Filed 2000·Granted Jan 30, 2007·10 cites·12 claims
- 2661US12399951B2Information processing device, non-transitory storage medium, information processing method and electronic circuitTOSHIBA KK·Filed 2021·Granted Aug 26, 2025·0 cites·23 claims
- 2761US7799507B2Positive resist composition for immersion lithography and method for forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2007·Granted Sep 21, 2010·6 cites·16 claims
- 2859US2025200131A1Solving device and computer program productTOSHIBA KK·Filed 2025·Application pending·0 cites
- 2957US7326512B2Polymer compound, resist composition and dissolution inhibitor agent containing the polymer compoundTOKYO OHKA KOGYO CO LTD·Filed 2003·Granted Feb 5, 2008·4 cites·23 claims
- 3056US7272632B2Distributed system and multiplexing control method for the systemTOSHIBA KK·Filed 2002·Granted Sep 18, 2007·5 cites·6 claims
- 3155US2021383266A1Information processing system, method for processing information and programTOSHIBA KK·Filed 2021·Application pending·0 cites
- 3254US12033090B2Information processing device, PUBO solver, information processing method and non-transitory storage mediumTOSHIBA KK·Filed 2021·Granted Jul 9, 2024·0 cites·19 claims
- 3353US12309280B2Tampering validation method and tampering validation systemTOSHIBA KK·Filed 2022·Granted May 20, 2025·0 cites·9 claims
- 3453US2022019714A1Calculation device, display device, and computer program productTOSHIBA KK·Filed 2021·Application pending·0 cites
- 3550US11424935B2Tampering detection system and method for detecting tamperingTOSHIBA KK·Filed 2020·Granted Aug 23, 2022·0 cites·11 claims
- 3650US6846949B2Fluorine-containing monomeric ester compound for base resin in photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2003·Granted Jan 25, 2005·0 cites·3 claims
- 3749US11461118B2Flow-based programming environment for persistent execution and recoveryTOSHIBA KK·Filed 2019·Granted Oct 4, 2022·0 cites·11 claims
- 3847US9244357B2Method for forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2014·Granted Jan 26, 2016·0 cites·8 claims
- 3947US2022012387A1Information processing device, information processing system, information processing method, and storage mediumTOSHIBA KK·Filed 2021·Application pending·0 cites
- 4046US7523113B2Distributed system, computer and state transition control method for distributed systemTOSHIBA KK·Filed 2006·Granted Apr 21, 2009·0 cites·10 claims
- 4145US10489239B2Multiplexing system, multiplexing method, and computer program productTOSHIBA KK·Filed 2018·Granted Nov 26, 2019·0 cites·8 claims
- 4244US10921711B2Resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2018·Granted Feb 16, 2021·0 cites·6 claims
- 4344US2009280431A1Material for protective film formation, and method for photoresist pattern formation using the sameTOKYO OHKA KOGYO CO LTD·Filed 2006·Application pending·0 cites
- 4443US10162719B2Ordering device, data processing device, ordering method, computer program product, and multiplex systemTOSHIBA KK·Filed 2016·Granted Dec 25, 2018·0 cites·23 claims
- 4543US2010124720A1Material for protective film formation, and method for photoresist pattern formation using the sameTOKYO OHKA KOGYO CO LTD·Filed 2006·Application pending·0 cites
- 4642US8278025B2Material for forming resist protection films and method for resist pattern formation with the sameISHIDUKA KEITA·Filed 2005·Granted Oct 2, 2012·0 cites·6 claims
- 4741US10627717B2Resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2018·Granted Apr 21, 2020·0 cites·3 claims
- 4841US10303565B2Multicasting system voting on server dataTOSHIBA KK·Filed 2016·Granted May 28, 2019·0 cites·15 claims
- 4941US10165086B2Information processing system, server apparatus, information processing method, and computer program productTOSHIBA KK·Filed 2016·Granted Dec 25, 2018·0 cites·13 claims
- 5041US2006235174A1Norbornene-type polymers, compositions thereof and lithographic processes using such compositionsTOKYO OHKA KOGYO CO LTD·Filed 2006·Application pending·0 cites
Showing the top 50 of 68 patent records by PatentIndex Score.
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