Inventor · disambiguated record
Kazuya Kamon
Also filed as: KAMON KAZUYA
52 granted patents·2 pending applications·1,502 citations·filing 1990–2025
99Inventor score
Files withMITSUBISHI ELECTRIC CORP40RENESAS TECH CORP8RENESAS ELECTRONICS CORP3KAMON KAZUYA2MITSUBISHI DENKI KABUSHIKI KAISHA1
Top patents by PatentIndex Score
54 records- 0197US5815685AApparatus and method for correcting light proximity effects by predicting mask performanceMITSUBISHI ELECTRIC CORP·Filed 1995·Granted Sep 29, 1998·190 cites·51 claims
- 0295US5481624AMask inspecting method and mask detectorMITSUBISHI ELECTRIC CORP·Filed 1993·Granted Jan 2, 1996·115 cites·7 claims
- 0395US5436761AProjection exposure apparatus and polarizerMITSUBISHI ELECTRIC CORP·Filed 1994·Granted Jul 25, 1995·131 cites·1 claims
- 0492US5365371AProjection exposure apparatusMITSUBISHI ELECTRIC CORP·Filed 1993·Granted Nov 15, 1994·96 cites·4 claims
- 0591US5144362AProjection alignerMITSUBISHI ELECTRIC CORP·Filed 1991·Granted Sep 1, 1992·78 cites·17 claims
- 0690US5229230APhotomaskMITSUBISHI ELECTRIC CORP·Filed 1991·Granted Jul 20, 1993·66 cites·10 claims
- 0789US7363207B2Simulator for a chemical mechanical polishingRENESAS TECH CORP·Filed 2003·Granted Apr 22, 2008·45 cites·9 claims
- 0889US5300972AProjection exposure apparatusMITSUBISHI ELECTRIC CORP·Filed 1993·Granted Apr 5, 1994·60 cites·8 claims
- 0988US5382999AOptical pattern projecting apparatusMITSUBISHI ELECTRIC CORP·Filed 1993·Granted Jan 17, 1995·78 cites·11 claims
- 1087US5264898AProjection exposure apparatusMITSUBISHI ELECTRIC CORP·Filed 1992·Granted Nov 23, 1993·56 cites·20 claims
- 1183US6245470B1Projection aligner, aberration estimating mask pattern, aberration quantity estimating method, aberration eliminating filter and semiconductor manufacturing methodMITSUBISHI ELECTRIC CORP·Filed 1996·Granted Jun 12, 2001·46 cites·5 claims
- 1280US6453274B2Method of forming a pattern using proximity-effect-correctionMITSUBISHI ELECTRIC CORP·Filed 1998·Granted Sep 17, 2002·38 cites·7 claims
- 1377US9331212B2Semiconductor device comprising an antiferroelectric gate insulating filmKAMON KAZUYA·Filed 2012·Granted May 3, 2016·5 cites·17 claims
- 1477US5369464AExposure apparatus and an exposure method using the sameMITSUBISHI ELECTRIC CORP·Filed 1993·Granted Nov 29, 1994·25 cites·24 claims
- 1577US5253040AProjection alignerMITSUBISHI ELECTRIC CORP·Filed 1991·Granted Oct 12, 1993·32 cites·14 claims
- 1676US5321493AApparatus and method for evaluating a projection lensMITSUBISHI ELECTRIC CORP·Filed 1992·Granted Jun 14, 1994·29 cites·8 claims
- 1773US7170682B2Projection aligner, aberration estimating mask pattern, aberration quantity estimating method, aberration eliminating filter and semiconductor manufacturing methodRENESAS TECH CORP·Filed 2005·Granted Jan 30, 2007·2 cites·3 claims
- 1871US5251067AFly-eye lens device and lighting system including sameMITSUBISHI ELECTRIC CORP·Filed 1991·Granted Oct 5, 1993·33 cites·7 claims
- 1971US5073918AAngle detector device for silicon wafersMITSUBISHI ELECTRIC CORP·Filed 1990·Granted Dec 17, 1991·33 cites·7 claims
- 2069US6831997B2Mask data correction apparatus, fourier transformation apparatus, up sampling apparatus, down sampling apparatus, method of manufacturing transfer mask, and method of manufacturing device having pattern structureRENESAS TECH CORP·Filed 2001·Granted Dec 14, 2004·12 cites·15 claims
- 2168US5317450AProjection exposure apparatusMITSUBISHI ELECTRIC CORP·Filed 1992·Granted May 31, 1994·20 cites·16 claims
- 2266US6951004B2Layout data saving method, layout data converting device and graphic verifying deviceRENESAS TECH CORP·Filed 2003·Granted Sep 27, 2005·9 cites·1 claims
- 2365US5219686APhotomaskMITSUBISHI ELECTRIC CORP·Filed 1990·Granted Jun 15, 1993·18 cites·11 claims
- 2464US7020866B2Mask data processorRENESAS TECH CORP·Filed 2003·Granted Mar 28, 2006·9 cites·14 claims
- 2564US5422206APhotomask and method of manufacturing the sameMITSUBISHI ELECTRIC CORP·Filed 1994·Granted Jun 6, 1995·18 cites·12 claims
- 2664US5406373AAlignment mark and aligning method using the sameMITSUBISHI ELECTRIC CORP·Filed 1992·Granted Apr 11, 1995·17 cites·7 claims
- 2764US5300967AProjection exposure apparatusMITSUBISHI ELECTRIC CORP·Filed 1992·Granted Apr 5, 1994·17 cites·15 claims
- 2864US5287142AProjection exposure apparatusMITSUBISHI ELECTRIC CORP·Filed 1992·Granted Feb 15, 1994·17 cites·5 claims
- 2963US5311249AProjection exposure apparatusMITSUBISHI ELECTRIC CORP·Filed 1993·Granted May 10, 1994·17 cites·5 claims
- 3062US6517983B2Aberration estimating mask patternMITSUBISHI ELECTRIC CORP·Filed 2001·Granted Feb 11, 2003·4 cites·1 claims
- 3162US5418599AExposure methodMITSUBISHI ELECTRIC CORP·Filed 1994·Granted May 23, 1995·13 cites·1 claims
- 3262US5285258AMethod of and an apparatus for detecting alignment marksMITSUBISHI ELECTRIC CORP·Filed 1992·Granted Feb 8, 1994·16 cites·11 claims
- 3361US5393623AExposure apparatus employing a photomaskMITSUBISHI ELECTRIC CORP·Filed 1993·Granted Feb 28, 1995·13 cites·2 claims
- 3460US7213217B2Layout data saving method, layout data converting device and graphic verifying deviceRENESAS TECH CORP·Filed 2005·Granted May 1, 2007·1 cites·8 claims
- 3559US6970291B2Projection aligner, aberration estimating mask pattern, aberration quantity estimating method, aberration eliminating filter and semiconductor manufacturing methodRENESAS TECH CORP·Filed 2002·Granted Nov 29, 2005·3 cites·1 claims
- 3659US5524039AProjection exposure apparatusMITSUBISHI ELECTRIC CORP·Filed 1995·Granted Jun 4, 1996·19 cites·16 claims
- 3759US2025338568A1Semiconductor device and method of manufacturing the sameRENESAS ELECTRONICS CORP·Filed 2025·Application pending·0 cites
- 3856US5279911APhotomaskMITSUBISHI ELECTRIC CORP·Filed 1991·Granted Jan 18, 1994·13 cites·20 claims
- 3955US8839176B2Semiconductor integrated circuit and pattern layouting method for the sameRENESAS ELECTRONICS CORP·Filed 2013·Granted Sep 16, 2014·0 cites·5 claims
- 4055US2025338569A1Semiconductor device and method of manufacturing the sameRENESAS ELECTRONICS CORP·Filed 2025·Application pending·0 cites
- 4154US6061188AProjecting printing apparatus, projection printing method, mask pattern for estimating amplitude aberrations, method of estimating the quantity of amplitude aberration, and amplitude-aberration estimating filterMITSUBISHI ELECTRIC CORP·Filed 1997·Granted May 9, 2000·18 cites·28 claims
- 4253US5367358AProjection exposing apparatus and projection exposing methodMITSUBISHI ELECTRIC CORP·Filed 1993·Granted Nov 22, 1994·11 cites·18 claims
- 4351US5538818AReflection PhotomaskMITSUBISHI ELECTRIC CORP·Filed 1994·Granted Jul 23, 1996·8 cites·11 claims
- 4451US5432588ASemiconductor device and method of making the semiconductor deviceMITSUBISHI DENKI KABUSHIKI KAISHA·Filed 1994·Granted Jul 11, 1995·12 cites·19 claims
- 4549US5248574APhotomaskMITSUBISHI ELECTRIC CORP·Filed 1991·Granted Sep 28, 1993·9 cites·21 claims
- 4647US5254418AMethod of manufacturing photomaskMITSUBISHI ELECTRIC CORP·Filed 1991·Granted Oct 19, 1993·8 cites·7 claims
- 4746US8543956B2Semiconductor integrated circuit and pattern layouting method for the sameKAMON KAZUYA·Filed 2011·Granted Sep 24, 2013·0 cites·5 claims
- 4843US5315349AProjection alignerMITSUBISHI ELECTRIC CORP·Filed 1992·Granted May 24, 1994·6 cites·4 claims
- 4943US5173380APhotomaskMITSUBISHI ELECTRIC CORP·Filed 1991·Granted Dec 22, 1992·6 cites·8 claims
- 5041US5294505APattern forming methodMITSUBISHI ELECTRIC CORP·Filed 1991·Granted Mar 15, 1994·5 cites·7 claims
Showing the top 50 of 54 patent records by PatentIndex Score.
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