Inventor · disambiguated record
Koji Nozaki
Also filed as: NOZAKI KOJI
83 granted patents·12 pending applications·1,636 citations·filing 1988–2014
99Inventor score
Top patents by PatentIndex Score
95 records- 0199US8349536B2Dithiane derivative, polymer, resist composition, and method for manufacturing semiconductor device using such resist compositionFUJITSU LTD·Filed 2010·Granted Jan 8, 2013·47 cites·13 claims
- 0298US8088556B2Thiopyran derivative, polymer, resist composition, and method for manufacturing semiconductor device using such resist compositionNOZAKI KOJI·Filed 2010·Granted Jan 3, 2012·46 cites·12 claims
- 0398US8080365B2Thiopyran derivative, polymer, resist composition, and method for manufacturing semiconductor device using such resist compositionNOZAKI KOJI·Filed 2010·Granted Dec 20, 2011·46 cites·4 claims
- 0496US7608386B2Resist cover film-forming material, process for forming resist pattern, semiconductor device and process for manufacturing the sameFUJITSU LTD·Filed 2006·Granted Oct 27, 2009·79 cites·19 claims
- 0596US6329125B2Chemically amplified resist compositions and process for the formation of resist patternsFUJITSU LTD·Filed 2000·Granted Dec 11, 2001·154 cites·1 claims
- 0696US6013416AChemically amplified resist compositions and process for the formation of resist patternsFUJITSU LTD·Filed 1996·Granted Jan 11, 2000·164 cites·15 claims
- 0796US5968713AChemically amplified resist compositions and process for the formation of resist patternsFUJITSU LTD·Filed 1997·Granted Oct 19, 1999·165 cites·20 claims
- 0892US6200725B1Chemically amplified resist compositions and process for the formation of resist patternsFUJITSU LTD·Filed 1997·Granted Mar 13, 2001·105 cites·8 claims
- 0990US5048294ASafety device for hydraulic closed circuitHITACHI CONSTRUCTION MACHINERY·Filed 1990·Granted Sep 17, 1991·47 cites·8 claims
- 1089US6027856ANegative-type resist composition and process for forming resist patternsFUJITSU LTD·Filed 1999·Granted Feb 22, 2000·67 cites·13 claims
- 1189US5585219AResist composition and process for forming resist patternFUJITSU LTD·Filed 1995·Granted Dec 17, 1996·96 cites·3 claims
- 1289US5399647APhotoresist composition of 1-(1'-cyanoethenyl)adamantaneFUJITSU LTD·Filed 1994·Granted Mar 21, 1995·53 cites·5 claims
- 1388US6506534B1Negative resist composition, method for the formation of resist patterns and process for the production of electronic devicesFUJITSU LTD·Filed 2000·Granted Jan 14, 2003·29 cites·11 claims
- 1487US7585610B2Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for manufacturing the sameFUJITSU LTD·Filed 2006·Granted Sep 8, 2009·9 cites·5 claims
- 1583US7488569B2Negative resist composition, a method for forming a resist pattern thereof, and a method for fabricating a semiconductor deviceFUJITSU LTD·Filed 2006·Granted Feb 10, 2009·5 cites·18 claims
- 1683US7202289B2Biodegradable resin composition, filler therefor and molded article thereofFUJITSU LTD·Filed 2003·Granted Apr 10, 2007·17 cites·18 claims
- 1782US8334091B2Resist pattern swelling material, and method for patterning using sameNOZAKI KOJI·Filed 2008·Granted Dec 18, 2012·7 cites·15 claims
- 1881US7897321B2Monomer, resin, resist composition using the resin, and method producing semiconductor device using the resist compositionFUJITSU LTD·Filed 2009·Granted Mar 1, 2011·2 cites·7 claims
- 1981US7419894B2Gate electrode and manufacturing method thereof, and semiconductor device and manufacturing method thereofFUJITSU LTD·Filed 2005·Granted Sep 2, 2008·7 cites·30 claims
- 2081US7338750B2Resist pattern thickness reducing material, resist pattern and process for forming thereof, and semiconductor device and process for manufacturing thereofFUJITSU LTD·Filed 2002·Granted Mar 4, 2008·25 cites·19 claims
- 2180US5585222AResist composition and process for forming resist patternFUJITSU LTD·Filed 1992·Granted Dec 17, 1996·42 cites·9 claims
- 2279US7820367B2Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for producing the sameFUJITSU LTD·Filed 2005·Granted Oct 26, 2010·4 cites·8 claims
- 2375US8906598B2Pattern forming method, method for manufacturing semiconductor device, and material for forming coating layer of resist patternKOZAWA MIWA·Filed 2011·Granted Dec 9, 2014·3 cites·9 claims
- 2475US7189783B2Resist pattern thickening material, resist pattern and forming process thereof, and semiconductor device and manufacturing process thereofFUJITSU LTD·Filed 2002·Granted Mar 13, 2007·13 cites·20 claims
- 2575US6451501B1Acid sensitive copolymer, resist composition and resist pattern forming methodFUJITSU LTD·Filed 2000·Granted Sep 17, 2002·14 cites·14 claims
- 2674US8349542B2Manufacturing process of semiconductor deviceFUJITSU LTD·Filed 2010·Granted Jan 8, 2013·2 cites·4 claims
- 2774US7744768B2Resist pattern thickening material, resist pattern and forming process thereof, and semiconductor device and manufacturing process thereofFUJITSU LTD·Filed 2006·Granted Jun 29, 2010·3 cites·7 claims
- 2874US5910392AResist composition, a process for forming a resist pattern and a process for manufacturing a semiconductor deviceFUJITSU LTD·Filed 1997·Granted Jun 8, 1999·46 cites·17 claims
- 2973US8945822B2Resist pattern thickening material, method for forming resist pattern, semiconductor device and method for manufacturing the sameFUJITSU LTD·Filed 2013·Granted Feb 3, 2015·2 cites·11 claims
- 3073US7799508B2Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for manufacturing the sameFUJITSU LTD·Filed 2009·Granted Sep 21, 2010·3 cites·24 claims
- 3173US7625688B2Resist pattern thickening material, resist pattern and process for forming the same, and semiconductor device and process for manufacturing the sameFUJITSU LTD·Filed 2005·Granted Dec 1, 2009·4 cites·35 claims
- 3273US6052261AMethod for manufacturing magnetoresistance headFUJITSU LTD·Filed 1996·Granted Apr 18, 2000·23 cites·28 claims
- 3372US8129092B2Resist pattern thickening material and process for forming resist pattern, and semiconductor device and method for manufacturing the sameKOZAWA MIWA·Filed 2006·Granted Mar 6, 2012·3 cites·2 claims
- 3472US8119325B2Method for forming resist pattern, semiconductor device and production method thereofKOZAWA MIWA·Filed 2006·Granted Feb 21, 2012·3 cites·10 claims
- 3570US8795949B2Resist pattern improving material, method for forming resist pattern, and method for producing semiconductor deviceKOZAWA MIWA·Filed 2011·Granted Aug 5, 2014·2 cites·19 claims
- 3669US8449787B2Method for wet etching while forming interconnect trench in insulating filmIMADA TADAHIRO·Filed 2008·Granted May 28, 2013·2 cites·7 claims
- 3769US7652964B2Optical disk deviceFUNAI ELECTRIC CO·Filed 2007·Granted Jan 26, 2010·1 cites·3 claims
- 3868US7416837B2Resist pattern-improving material and a method for preparing a resist pattern by using the sameFUJITSU LTD·Filed 2002·Granted Aug 26, 2008·11 cites·18 claims
- 3968US5506088AChemically amplified resist composition and process for forming resist pattern using sameFUJITSU LTD·Filed 1994·Granted Apr 9, 1996·23 cites·4 claims
- 4067US8420288B2Resist pattern thickening material, method for forming resist pattern, semiconductor device and method for manufacturing the sameNOZAKI KOJI·Filed 2007·Granted Apr 16, 2013·2 cites·7 claims
- 4167US6773867B2Negative resist composition, method for the formation of resist patterns and process for the production of electronic devicesFUJITSU LTD·Filed 2002·Granted Aug 10, 2004·7 cites·39 claims
- 4266US8198014B2Resist cover film forming material, resist pattern forming method, and electronic device and method for manufacturing the sameKOZAWA MIWA·Filed 2007·Granted Jun 12, 2012·2 cites·13 claims
- 4366US6770417B2Negative resist composition, process for forming resist patterns, and process for manufacturing electron deviceFUJITSU LTD·Filed 2001·Granted Aug 3, 2004·20 cites·37 claims
- 4464US7452657B2Resist composition, method of forming resist pattern, semiconductor device and method of manufacturing thereofFUJITSU LTD·Filed 2005·Granted Nov 18, 2008·1 cites·18 claims
- 4563US8303014B2Pick-up style utility vehicle with expandable cargo bedORIHASHI YOSHIHIKO·Filed 2009·Granted Nov 6, 2012·10 cites·10 claims
- 4663US5139901ALithium secondary battery using hydric boron carbonitride as electrode materialCENTRAL GLASS CO LTD·Filed 1990·Granted Aug 18, 1992·31 cites·15 claims
- 4762US6887644B1Polymer compound for a chemical amplification resist and a fabrication process of a semiconductor device using such a chemical amplification resistFUJITSU LTD·Filed 1998·Granted May 3, 2005·26 cites·27 claims
- 4862US6844135B2Chemically amplified resist material and patterning method using sameFUJITSU LTD·Filed 2003·Granted Jan 18, 2005·16 cites·8 claims
- 4960US7662539B2Resist pattern thickening material, process for forming resist pattern, and process for manufacturing semiconductor deviceFUJITSU LTD·Filed 2004·Granted Feb 16, 2010·6 cites·56 claims
- 5060US7592127B2Resist pattern thickening material, resist pattern and process for forming the same, and semiconductor device and process for manufacturing the sameFUJITSU LTD·Filed 2003·Granted Sep 22, 2009·7 cites·30 claims
Showing the top 50 of 95 patent records by PatentIndex Score.
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