Inventor · disambiguated record
Ricarda Schoemer
Also filed as: SCHOEMER RICARDA · SCHOEMER RICARDA MARIA
17 granted patents·3 pending applications·34 citations·filing 2014–2021
90Inventor score
Top patents by PatentIndex Score
20 records- 0193US9939730B2Optical assemblyZEISS CARL SMT GMBH·Filed 2015·Granted Apr 10, 2018·7 cites·31 claims
- 0290US10401540B2Optical element having a coating for influencing heating radiation and optical arrangementZEISS CARL SMT GMBH·Filed 2017·Granted Sep 3, 2019·3 cites·21 claims
- 0390US10048592B2Projection lens, projection exposure apparatus and projection exposure method for EUV microlithographyZEISS CARL SMT GMBH·Filed 2017·Granted Aug 14, 2018·4 cites·22 claims
- 0489US11112543B2Optical element having a coating for influencing heating radiation and optical arrangementZEISS CARL SMT GMBH·Filed 2019·Granted Sep 7, 2021·2 cites·20 claims
- 0586US10061206B2Projection lens with wave front manipulator and related method and apparatusZEISS CARL SMT GMBH·Filed 2017·Granted Aug 28, 2018·3 cites·18 claims
- 0685US9910364B2Projection exposure apparatus including at least one mirrorZEISS CARL SMT GMBH·Filed 2016·Granted Mar 6, 2018·3 cites·15 claims
- 0779US10001631B2Projection lens for EUV microlithography, film element and method for producing a projection lens comprising a film elementZEISS CARL SMT GMBH·Filed 2014·Granted Jun 19, 2018·6 cites·40 claims
- 0877US10183613B2Projection lamp for illuminationOSRAM GMBH·Filed 2017·Granted Jan 22, 2019·2 cites·16 claims
- 0974US10018907B2Method of operating a microlithographic projection apparatusZEISS CARL SMT GMBH·Filed 2016·Granted Jul 10, 2018·2 cites·18 claims
- 1072US12025818B2Optical element having a coating for influencing heating radiation and optical arrangementZEISS CARL SMT GMBH·Filed 2021·Granted Jul 2, 2024·0 cites·20 claims
- 1166US9348234B2Microlithographic apparatusZEISS CARL SMT GMBH·Filed 2015·Granted May 24, 2016·1 cites·22 claims
- 1260US10591825B2Projection lens, projection exposure apparatus and projection exposure method for EUV microlithographyZEISS CARL SMT GMBH·Filed 2018·Granted Mar 17, 2020·0 cites·30 claims
- 1359US9372411B2Projection objective of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Jun 21, 2016·1 cites·34 claims
- 1457US10416569B2Attenuation filter for projection lens, projection lens having attenuation filter for projection exposure apparatus, and projection exposure apparatus having projection lensZEISS CARL SMT GMBH·Filed 2018·Granted Sep 17, 2019·0 cites·20 claims
- 1554US9709770B2Mirror arrangement for an EUV projection exposure apparatus, method for operating the same, and EUV projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Jul 18, 2017·0 cites·14 claims
- 1650US9829800B2System correction from long timescalesZEISS CARL SMT GMBH·Filed 2014·Granted Nov 28, 2017·0 cites·20 claims
- 1741US11035536B2Illumination device for emitting illumination lightOSRAM GMBH·Filed 2016·Granted Jun 15, 2021·0 cites·25 claims
- 1840US2018010759A1Light-emitting arrangement and vehicle headlightOSRAM GMBH·Filed 2017·Application pending·0 cites
- 1939US2017350570A1Illumination apparatus with sensor at the absorberOSRAM GMBH·Filed 2017·Application pending·0 cites
- 2037US2018003356A1Lighting apparatus and vehicle headlight comprising lighting apparatusOSRAM GMBH·Filed 2017·Application pending·0 cites
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