Inventor · disambiguated record
Nakaatsu Yoshimura
Also filed as: YOSHIMURA NAKAATSU
9 granted patents·2 pending applications·88 citations·filing 2002–2012
85Inventor score
Top patents by PatentIndex Score
11 records- 0190US8334338B2Composition for forming resist lower layer filmYOSHIMURA NAKAATSU·Filed 2008·Granted Dec 18, 2012·35 cites·3 claims
- 0280US8691496B2Method for forming resist under layer film, pattern forming method and composition for resist under layer filmKONNO YOUSUKE·Filed 2012·Granted Apr 8, 2014·3 cites·8 claims
- 0379US7169327B2Composite particle for dielectrics, ultramicroparticulate composite resin particle, composition for forming dielectrics and use thereofJSR CORP·Filed 2002·Granted Jan 30, 2007·32 cites·17 claims
- 0467US7749681B2Composition for forming lower layer film and pattern forming methodJSR CORP·Filed 2007·Granted Jul 6, 2010·9 cites·12 claims
- 0565US8288073B2Pattern forming methodKONNO YOUSUKE·Filed 2007·Granted Oct 16, 2012·2 cites·6 claims
- 0665US6737169B2Polymer composition, cured product, laminate and method for producing the cured productJSR CORP·Filed 2002·Granted May 18, 2004·7 cites·13 claims
- 0744US8663905B2Pattern-forming methodYOSHIMURA NAKAATSU·Filed 2007·Granted Mar 4, 2014·0 cites·4 claims
- 0843US2006264525A1Composition for photocatalyst coating and coating filmJSR CORP·Filed 2004·Application pending·0 cites
- 0942US7709182B2Composition for forming antireflection film, layered product, and method of forming resist patternJSR CORP·Filed 2005·Granted May 4, 2010·0 cites·14 claims
- 1041US2006070551A1Coating compositionJSR CORP·Filed 2003·Application pending·0 cites
- 1140US7514205B2Composition for forming antireflection film, laminate, and method for forming resist patternJSR CORP·Filed 2006·Granted Apr 7, 2009·0 cites·12 claims
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