Inventor · disambiguated record
Kazuhiro Hamamoto
Also filed as: HAMAMOTO KAZUHIRO
40 granted patents·3 pending applications·81 citations·filing 1995–2023
96Inventor score
Top patents by PatentIndex Score
43 records- 0193US10394113B2Reflective mask blank, reflective mask and method of manufacturing semiconductor deviceHOYA CORP·Filed 2015·Granted Aug 27, 2019·7 cites·19 claims
- 0292US11500281B2Reflective film coated substrate, mask blank, reflective mask, and semiconductor device manufacturing methodHOYA CORP·Filed 2020·Granted Nov 15, 2022·2 cites·16 claims
- 0392US9746762B2Conductive film coated substrate, multilayer reflective film coated substrate, reflective mask blank, reflective mask, and semiconductor device manufacturing methodHOYA CORP·Filed 2014·Granted Aug 29, 2017·8 cites·11 claims
- 0491US10001699B2Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask, and semiconductor device fabrication methodHOYA CORP·Filed 2016·Granted Jun 19, 2018·6 cites·14 claims
- 0589US9377679B2Reflective mask blank and method for manufacturing same, method for manufacturing reflective mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2013·Granted Jun 28, 2016·5 cites·19 claims
- 0685US12025911B2Reflective structure, reflective mask blank, reflective mask and method of manufacturing semiconductor deviceHOYA CORP·Filed 2023·Granted Jul 2, 2024·0 cites·17 claims
- 0781US11262647B2Substrate with multilayer reflective film, reflective mask blank, reflective mask, and semiconductor device manufacturing methodHOYA CORP·Filed 2018·Granted Mar 1, 2022·1 cites·22 claims
- 0881US9897909B2Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask blank, transmissive mask, reflective mask, and semiconductor device fabrication methodHOYA CORP·Filed 2016·Granted Feb 20, 2018·2 cites·8 claims
- 0979US11681214B2Substrate with a multilayer reflective film, reflective mask blank, reflective mask and method of manufacturing semiconductor deviceHOYA CORP·Filed 2022·Granted Jun 20, 2023·0 cites·19 claims
- 1078US9720315B2Reflective mask blank, method of manufacturing reflective mask blank, reflective mask and method of manufacturing semiconductor deviceHOYA CORP·Filed 2014·Granted Aug 1, 2017·2 cites·18 claims
- 1177US11899356B2Reflective film coated substrate, mask blank, reflective mask, and semiconductor device manufacturing methodHOYA CORP·Filed 2022·Granted Feb 13, 2024·0 cites·19 claims
- 1277US7553769B2Method for treating a dielectric filmTOKYO ELECTRON LTD·Filed 2003·Granted Jun 30, 2009·19 cites·10 claims
- 1376US9726969B2Reflective mask blank, method of manufacturing same, reflective mask and method of manufacturing semiconductor deviceHOYA CORP·Filed 2014·Granted Aug 8, 2017·2 cites·18 claims
- 1475US10126641B2Multilayer reflective film formed substrate, reflective mask blank, mask blank, methods of manufacturing the same, reflective mask, and maskHOYA CORP·Filed 2016·Granted Nov 13, 2018·1 cites·15 claims
- 1575US9348217B2Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask blank, transmissive mask, reflective mask, and semiconductor device fabrication methodHOYA CORP·Filed 2013·Granted May 24, 2016·2 cites·15 claims
- 1674US10606166B2Substrate with electrically conductive film, substrate with multilayer reflective film, reflective mask blank, reflective mask, and method of manufacturing semiconductor deviceHOYA CORP·Filed 2016·Granted Mar 31, 2020·1 cites·20 claims
- 1774US9494851B2Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask, and semiconductor device fabrication methodHOYA CORP·Filed 2013·Granted Nov 15, 2016·2 cites·30 claims
- 1874US9323141B2Method for producing substrate with multilayer reflective film, method for producing reflective mask blank and method for producing reflective maskHOYA CORP·Filed 2015·Granted Apr 26, 2016·1 cites·15 claims
- 1972US10527927B2Conductive film coated substrate, multilayer reflective film coated substrate, reflective mask blank, reflective mask, and semiconductor device manufacturing methodHOYA CORP·Filed 2018·Granted Jan 7, 2020·0 cites·11 claims
- 2072US10067419B2Method for manufacturing reflective mask blank, and method for manufacturing reflective maskHOYA CORP·Filed 2014·Granted Sep 4, 2018·1 cites·11 claims
- 2171US9229316B2Method for producing substrate with multilayer reflective film, method for producing reflective mask blank and method for producing reflective maskHOYA CORP·Filed 2013·Granted Jan 5, 2016·1 cites·21 claims
- 2270US10642149B2Reflective mask blank, reflective mask and method of manufacturing semiconductor deviceHOYA CORP·Filed 2019·Granted May 5, 2020·0 cites·20 claims
- 2369US10996554B2Substrate with an electrically conductive film, substrate with a multilayer reflective film, reflective mask blank, reflective mask and method of manufacturing semiconductor deviceHOYA CORP·Filed 2020·Granted May 4, 2021·0 cites·21 claims
- 2465US10620527B2Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask blank, transmissive mask, reflective mask, and semiconductor device fabrication methodHOYA CORP·Filed 2019·Granted Apr 14, 2020·0 cites·20 claims
- 2561US11131921B2Method for manufacturing reflective mask blank, and method for manufacturing reflective maskHOYA CORP·Filed 2018·Granted Sep 28, 2021·0 cites·12 claims
- 2660US10429728B2Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask blank, transmissive mask, reflective mask, and semiconductor device fabrication methodHOYA CORP·Filed 2017·Granted Oct 1, 2019·0 cites·21 claims
- 2760US10295900B2Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask, and semiconductor device fabrication methodHOYA CORP·Filed 2018·Granted May 21, 2019·0 cites·26 claims
- 2860US9581895B2Mask blank substrate, substrate with multilayer reflective film, reflective mask blank, reflective mask, method of manufacturing mask blank substrate, method of manufacturing substrate with reflective film and method of manufacturing semiconductor deviceHOYA CORP·Filed 2013·Granted Feb 28, 2017·0 cites·26 claims
- 2959US10209614B2Conductive film coated substrate, multilayer reflective film coated substrate, reflective mask blank, reflective mask, and semiconductor device manufacturing methodHOYA CORP·Filed 2017·Granted Feb 19, 2019·0 cites·11 claims
- 3059US10191365B2Reflective mask blank, method of manufacturing reflective mask blank, reflective mask and method of manufacturing semiconductor deviceHOYA CORP·Filed 2017·Granted Jan 29, 2019·0 cites·20 claims
- 3159US9423685B2Multilayer reflective film formed substrate, reflective mask blank, mask blank, methods of manufacturing the same, reflective mask, and maskHOYA CORP·Filed 2013·Granted Aug 23, 2016·0 cites·24 claims
- 3258US9798050B2Substrate with multilayer reflective film, mask blank, transfer mask and method of manufacturing semiconductor deviceHOYA CORP·Filed 2014·Granted Oct 24, 2017·0 cites·14 claims
- 3357US10175394B2Substrate with multilayer reflective film, mask blank, transfer mask and method of manufacturing semiconductor deviceHOYA CORP·Filed 2017·Granted Jan 8, 2019·0 cites·9 claims
- 3457US10025176B2Mask blank substrate, substrate with multilayer reflective film, reflective mask blank, reflective mask, method of manufacturing mask blank substrate, method of manufacturing substrate with reflective film and method of manufacturing semiconductor deviceHOYA CORP·Filed 2017·Granted Jul 17, 2018·0 cites·17 claims
- 3556US9535318B2Reflective mask blank and method for manufacturing same, method for manufacturing reflective mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2016·Granted Jan 3, 2017·0 cites·9 claims
- 3656US2022308438A1Method for manufacturing multilayered-reflective-film-provided substrate, reflective mask blank and method for manufacturing the same, and method for manufacturing reflective maskHOYA CORP·Filed 2022·Application pending·0 cites
- 3755US11281090B2Substrate with a multilayer reflective film, reflective mask blank, reflective mask, and method of manufacturing semiconductor deviceHOYA CORP·Filed 2018·Granted Mar 22, 2022·0 cites·19 claims
- 3854US2023051023A1Reflective mask blank, reflective mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2021·Application pending·0 cites
- 3952US2024027891A1Reflective mask blank, reflective mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2021·Application pending·0 cites
- 4045US9507254B2Method of manufacturing substrate with a multilayer reflective film, method of manufacturing a reflective mask blank, substrate with a multilayer reflective film, reflective mask blank, reflective mask and method of manufacturing a semiconductor deviceHOYA CORP·Filed 2013·Granted Nov 29, 2016·0 cites·17 claims
- 4137US5872060ASemiconductor device manufacturing methodTEXAS INSTRUMENTS INC·Filed 1996·Granted Feb 16, 1999·7 cites·11 claims
- 4236US6218277B1Method for filling a via opening or contact opening in an integrated circuitTEXAS INSTRUMENTS INC·Filed 1999·Granted Apr 17, 2001·5 cites·19 claims
- 4336US5946591AMethod of making a semiconductor device having a flat surfaceTEXAS INSTRUMENTS INC·Filed 1995·Granted Aug 31, 1999·6 cites·15 claims
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →