Inventor · disambiguated record
Sandra Hyland
Also filed as: HYLAND SANDRA · HYLAND SANDRA L
9 granted patents·2 pending applications·101 citations·filing 2001–2014
86Inventor score
Files withTOKYO ELECTRON LTD8BAE SYSTEMS INFORMATION & ELECTRONIC SYSTEMS INTEGRATION INC1HUGHES JOHN A1NAT SEMICONDUCTOR CORP1
Top patents by PatentIndex Score
11 records- 0188US7226868B2Method of etching high aspect ratio featuresTOKYO ELECTRON LTD·Filed 2002·Granted Jun 5, 2007·45 cites·43 claims
- 0286US7432191B1Method of forming a dual damascene structure utilizing a developable anti-reflective coatingTOKYO ELECTRON LTD·Filed 2007·Granted Oct 7, 2008·18 cites·16 claims
- 0385US7723237B2Method for selective removal of damaged multi-stack bilayer filmsTOKYO ELECTRON LTD·Filed 2006·Granted May 25, 2010·12 cites·21 claims
- 0474US7461614B2Method and apparatus for improved baffle plateTOKYO ELECTRON LTD·Filed 2003·Granted Dec 9, 2008·16 cites·11 claims
- 0558US6376262B1Method of forming a semiconductor device using double endpoint detectionNAT SEMICONDUCTOR CORP·Filed 2001·Granted Apr 23, 2002·10 cites·24 claims
- 0646US8580075B2Method and system for introduction of an active material to a chemical processHUGHES JOHN A·Filed 2012·Granted Nov 12, 2013·0 cites·25 claims
- 0744US9255345B2Method for growing germanium/silicon—germanium superlatticeBAE SYSTEMS INFORMATION & ELECTRONIC SYSTEMS INTEGRATION INC·Filed 2014·Granted Feb 9, 2016·0 cites·20 claims
- 0843US7811747B2Method of patterning an anti-reflective coating by partial developingTOKYO ELECTRON LTD·Filed 2006·Granted Oct 12, 2010·0 cites·16 claims
- 0942US7883835B2Method for double patterning a thin filmTOKYO ELECTRON LTD·Filed 2006·Granted Feb 8, 2011·0 cites·29 claims
- 1041US2008073321A1Method of patterning an anti-reflective coating by partial etchingTOKYO ELECTRON LTD·Filed 2006·Application pending·0 cites
- 1138US2005067098A1Method and system for introduction of an active material to a chemical processTOKYO ELECTRON LTD·Filed 2003·Application pending·0 cites
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