Inventor · disambiguated record
Toshiyuki Kaeriyama
Also filed as: KAERIYAMA TOSHIYUKI
22 granted patents·2 pending applications·1,379 citations·filing 1988–2011
97Inventor score
Top patents by PatentIndex Score
24 records- 0198US5646768ASupport posts for micro-mechanical devicesTEXAS INSTRUMENTS INC·Filed 1995·Granted Jul 8, 1997·364 cites·3 claims
- 0297US6099132AManufacture method for micromechanical devicesTEXAS INSTRUMENTS INC·Filed 1995·Granted Aug 8, 2000·233 cites·4 claims
- 0395US5485304ASupport posts for micro-mechanical devicesTEXAS INSTRUMENTS INC·Filed 1994·Granted Jan 16, 1996·188 cites·10 claims
- 0494US5497262ASupport posts for micro-mechanical devicesTEXAS INSTRUMENTS INC·Filed 1995·Granted Mar 5, 1996·137 cites·7 claims
- 0591US5872046AMethod of cleaning wafer after partial sawTEXAS INSTRUMENTS INC·Filed 1997·Granted Feb 16, 1999·116 cites·16 claims
- 0689US6618186B2Micro-electromechanical systemTEXAS INSTRUMENTS INC·Filed 2001·Granted Sep 9, 2003·40 cites·21 claims
- 0786US5804479AMethod for forming semiconductor integrated circuit device having a capacitorHITACHI LTD·Filed 1996·Granted Sep 8, 1998·58 cites·25 claims
- 0882US6053617AManufacture method for micromechanical devicesTEXAS INSTRUMENTS INC·Filed 1994·Granted Apr 25, 2000·46 cites·4 claims
- 0977US6150214ATitanium nitride metal interconnection system and method of forming the sameTEXAS INSTRUMENTS INC·Filed 1998·Granted Nov 21, 2000·40 cites·11 claims
- 1075US4855798ASemiconductor and process of fabrication thereofTEXAS INSTRUMENTS INC·Filed 1988·Granted Aug 8, 1989·53 cites·15 claims
- 1171US7692841B2System and method for regulating micromirror positionTEXAS INSTRUMENTS INC·Filed 2007·Granted Apr 6, 2010·5 cites·19 claims
- 1271US6528835B1Titanium nitride metal interconnection system and method of forming the sameTEXAS INSTRUMENTS INC·Filed 2000·Granted Mar 4, 2003·17 cites·6 claims
- 1368US6987601B2Damped control of a micromechanical deviceTEXAS INSTRUMENTS INC·Filed 2003·Granted Jan 17, 2006·10 cites·14 claims
- 1459US6753219B2Method of manufacturing semiconductor integrated circuit devices having a memory device with a reduced bit line stray capacity and such semiconductor integrated circuit devicesHITACHI LTD·Filed 2002·Granted Jun 22, 2004·8 cites·7 claims
- 1559US6060352AMethod of manufacturing semiconductor device with increased focus marginHITACHI LTD·Filed 1998·Granted May 9, 2000·16 cites·32 claims
- 1656US5933726AMethod of forming a semiconductor device have a screen stacked cell capacitorTEXAS INSTRUMENTS INC·Filed 1996·Granted Aug 3, 1999·17 cites·4 claims
- 1754US8610997B2Micro-electromechanical deviceKAERIYAMA TOSHIYUKI·Filed 2011·Granted Dec 17, 2013·1 cites·16 claims
- 1849US2002122881A1Micromechanical device recoat methodsFiled 2001·Application pending·0 cites
- 1943US5933724AMethod of manufacturing a semiconductor integrated circuit device using a photomask in which transmitted light beam intensities are controlledHITACHI LTD·Filed 1996·Granted Aug 3, 1999·11 cites·26 claims
- 2041US2005214462A1Micromechanical device recoat methodsKAERIYAMA TOSHIYUKI·Filed 2005·Application pending·0 cites
- 2140US6969649B2Method of manufacturing semiconductor integrated circuit devices having a memory device with a reduced bit line stray capacity and such semiconductor integrated circuit devicesTEXAS INSTRUMENTS INC·Filed 2004·Granted Nov 29, 2005·0 cites·3 claims
- 2239US5937290AMethod of manufacturing semiconductor integrated circuit devices using phase shifting maskHITACHI LTD·Filed 1997·Granted Aug 10, 1999·8 cites·4 claims
- 2335US6077735AMethod of manufacturing semiconductor deviceTEXAS INSTRUMENTS INC·Filed 1996·Granted Jun 20, 2000·6 cites·7 claims
- 2433US5804034AMethod for manufacturing semiconductor deviceTEXAS INSTRUMENTS INC·Filed 1994·Granted Sep 8, 1998·5 cites·12 claims
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