Inventor · disambiguated record
Paul Graupner
Also filed as: GRAEUPNER PAUL · GRAUPNER PAUL · GRÄUPNER PAUL
11 granted patents·1 pending application·156 citations·filing 2002–2014
90Inventor score
Files withASML NETHERLANDS BV4ZEISS CARL SMT AG4MULKENS JOHANNES CATHARINUS HUBERTUS2STREEFKERK BOB1ZEISS CARL SMT GMBH1
Top patents by PatentIndex Score
12 records- 0194US7715107B2Optical element for correction of aberration, and a lithographic apparatus comprising sameASML NETHERLANDS BV·Filed 2006·Granted May 11, 2010·21 cites·22 claims
- 0292US7545481B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2003·Granted Jun 9, 2009·45 cites·50 claims
- 0391US7433015B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Oct 7, 2008·39 cites·69 claims
- 0487US6678240B2Method for optimizing the image properties of at least two optical elements as well as methods for optimizing the image properties of at least three optical elementsZEISS CARL SMT AG·Filed 2002·Granted Jan 13, 2004·27 cites·20 claims
- 0584US7301622B2Method for optimizing the image properties of at least two optical elements as well as methods for optimizing the image properties of at least three optical elementsZEISS CARL SMT AG·Filed 2005·Granted Nov 27, 2007·6 cites·18 claims
- 0681US8174674B2Lithographic apparatus and device manufacturing methodMULKENS JOHANNES CATHARINUS HUBERTUS·Filed 2008·Granted May 8, 2012·4 cites·38 claims
- 0779US9146475B2Projection exposure system and projection exposure methodZEISS CARL SMT GMBH·Filed 2013·Granted Sep 29, 2015·3 cites·33 claims
- 0876US6934011B2Method for optimizing the image properties of at least two optical elements as well as methods for optimizing the image properties of at least three optical elementsZEISS CARL SMT AG·Filed 2003·Granted Aug 23, 2005·11 cites·10 claims
- 0962US9285685B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2014·Granted Mar 15, 2016·0 cites·20 claims
- 1057US8472006B2Lithographic apparatus and device manufacturing methodSTREEFKERK BOB·Filed 2009·Granted Jun 25, 2013·0 cites·15 claims
- 1154US8570486B2Lithographic apparatus and device manufacturing methodMULKENS JOHANNES CATHARINUS HUBERTUS·Filed 2012·Granted Oct 29, 2013·0 cites·20 claims
- 1245US2008068599A1Method for optimizing the image properties of at least two optical elements as well as methods for optimizing the image properties of at least three optical elementsZEISS CARL SMT AG·Filed 2007·Application pending·0 cites
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