Inventor · disambiguated record
Vadim Yevgenyevich Banine
Also filed as: BANINE VADIM · BANINE VADIM Y · BANINE VADIM YEVGENYEVICH · BANINE VADIM YEVGENYEVICH JOSEPH
193 granted patents·36 pending applications·1,852 citations·filing 2000–2021
99Inventor score
Files withASML NETHERLANDS BV155BANINE VADIM YEVGENYEVICH14YAKUNIN ANDREI MIKHAILOVICH5SOER WOUTER ANTHON4DE JAGER PIETER WILLEM HERMAN3
Top patents by PatentIndex Score
229 records- 0198US7462850B2Radical cleaning arrangement for a lithographic apparatusASML NETHERLANDS BV·Filed 2005·Granted Dec 9, 2008·60 cites·13 claims
- 0297US10228615B2Membranes for use within a lithographic apparatus and a lithographic apparatus comprising such a membraneASML NETHERLANDS BV·Filed 2015·Granted Mar 12, 2019·17 cites·28 claims
- 0397US9335638B2Lithographic apparatus, programmable patterning device and lithographic methodASML NETHERLANDS BV·Filed 2013·Granted May 10, 2016·19 cites·24 claims
- 0497US7405417B2Lithographic apparatus having a monitoring device for detecting contaminationASML NETHERLANDS BV·Filed 2005·Granted Jul 29, 2008·62 cites·36 claims
- 0597US7317504B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Jan 8, 2008·114 cites·24 claims
- 0697US6838684B2Lithographic projection apparatus and particle barrier for use thereinASML NETHERLANDS BV·Filed 2003·Granted Jan 4, 2005·111 cites·15 claims
- 0797US6576912B2Lithographic projection apparatus equipped with extreme ultraviolet window serving simultaneously as vacuum windowFiled 2001·Granted Jun 10, 2003·128 cites·23 claims
- 0896US10698312B2Membranes for use within a lithographic apparatus and a lithographic apparatus comprising such a membraneASML NETHERLANDS BV·Filed 2019·Granted Jun 30, 2020·8 cites·23 claims
- 0996US7684008B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Mar 23, 2010·58 cites·69 claims
- 1096US7106832B2Apparatus including a radiation source, a filter system for filtering particles out of radiation emitted by the source, and a processing system for processing the radiation, a lithographic apparatus including such an apparatus, and a method of filtering particles out of radiation emitting and propagating from a radiation sourceASML NETHERLANDS BV·Filed 2005·Granted Sep 12, 2006·33 cites·64 claims
- 1195US6614505B2Lithographic projection apparatus, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2002·Granted Sep 2, 2003·99 cites·20 claims
- 1294US9482960B2Pellicle for reticle and multilayer mirrorASML NETHERLANDS BV·Filed 2014·Granted Nov 1, 2016·14 cites·13 claims
- 1394US8531648B2Lithographic apparatus, programmable patterning device and lithographic methodDE JAGER PIETER WILLEM HERMAN·Filed 2009·Granted Sep 10, 2013·25 cites·34 claims
- 1494US7414700B2Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithographic apparatusASML NETHERLANDS BV·Filed 2005·Granted Aug 19, 2008·16 cites·64 claims
- 1594US7057190B2Lithographic projection apparatus, particle barrier for use therein, integrated structure manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2004·Granted Jun 6, 2006·51 cites·20 claims
- 1693US8018578B2Pellicle, lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2007·Granted Sep 13, 2011·16 cites·29 claims
- 1793US7473907B2Illumination system for a wavelength of ≦ 193 nm, with sensors for determining an illuminationZEISS CARL SMT AG·Filed 2005·Granted Jan 6, 2009·26 cites·29 claims
- 1892US9395630B2Lithographic apparatus and methodYAKUNIN ANDREI MIKHAILOVICH·Filed 2011·Granted Jul 19, 2016·13 cites·16 claims
- 1992US7868304B2Method for removal of deposition on an optical element, lithographic apparatus, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2005·Granted Jan 11, 2011·17 cites·30 claims
- 2092US7473908B2Getter and cleaning arrangement for a lithographic apparatus and method for cleaning a surfaceASML NETHERLANDS BV·Filed 2006·Granted Jan 6, 2009·22 cites·32 claims
- 2192US7372623B2Multi-layer spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2005·Granted May 13, 2008·19 cites·23 claims
- 2292US7307263B2Lithographic apparatus, radiation system, contaminant trap, device manufacturing method, and method for trapping contaminants in a contaminant trapASML NETHERLANDS BV·Filed 2004·Granted Dec 11, 2007·50 cites·34 claims
- 2391US10884339B2Lithographic methodASML NETHERLANDS BV·Filed 2019·Granted Jan 5, 2021·3 cites·27 claims
- 2491US8529823B2Imprint lithographyDEN BOEF ARIE JEFFREY·Filed 2010·Granted Sep 10, 2013·7 cites·20 claims
- 2591US7598503B2Lithographic apparatus and cleaning method thereforASML NETHERLANDS BV·Filed 2006·Granted Oct 6, 2009·11 cites·20 claims
- 2691US6781673B2Mask handling apparatus, lithographic projection apparatus, device manufacturing method and device manufactured therebyASML NETHERLANDS BV·Filed 2001·Granted Aug 24, 2004·56 cites·30 claims
- 2791US6452194B2Radiation source for use in lithographic projection apparatusASML NETHERLANDS BV·Filed 2000·Granted Sep 17, 2002·88 cites·23 claims
- 2890US10342108B2Metrology methods, radiation source, metrology apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2016·Granted Jul 2, 2019·5 cites·20 claims
- 2990US9989844B2Pellicle for reticle and multilayer mirrorASML NETHERLANDS BV·Filed 2016·Granted Jun 5, 2018·5 cites·13 claims
- 3090US7639418B2Multi-layer spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2008·Granted Dec 29, 2009·13 cites·23 claims
- 3190US7463413B2Spectral purity filter for a multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Dec 9, 2008·8 cites·21 claims
- 3290US7336416B2Spectral purity filter for multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Feb 26, 2008·12 cites·18 claims
- 3390US7034308B2Radiation system, contamination barrier, lithographic apparatus, device manufacturing method and device manufactured therebyASML NETHERLANDS BV·Filed 2004·Granted Apr 25, 2006·37 cites·23 claims
- 3489US9897930B2Optical element comprising oriented carbon nanotube sheet and lithographic apparatus comprising such optical elementSJMAENOK LEONID AIZIKOVITCH·Filed 2009·Granted Feb 20, 2018·14 cites·18 claims
- 3589US6678037B2Lithographic apparatus, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2001·Granted Jan 13, 2004·32 cites·23 claims
- 3688US8139200B2Spectral purity filter for multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing methodVAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS·Filed 2011·Granted Mar 20, 2012·6 cites·20 claims
- 3788US7812330B2Radical cleaning arrangement for a lithographic apparatusASML NETHERLANDS BV·Filed 2008·Granted Oct 12, 2010·8 cites·10 claims
- 3888US7750326B2Lithographic apparatus and cleaning method thereforASML NETHERLANDS BV·Filed 2005·Granted Jul 6, 2010·8 cites·21 claims
- 3988US7504643B2Method for cleaning a lithographic apparatus module, a cleaning arrangement and a lithographic apparatus comprising the cleaning arrangementASML NETHERLANDS BV·Filed 2006·Granted Mar 17, 2009·10 cites·50 claims
- 4087US10481510B2Graphene spectral purity filterASML NETHERLANDS BV·Filed 2018·Granted Nov 19, 2019·3 cites·27 claims
- 4187US7372058B2Ex-situ removal of deposition on an optical elementASML NETHERLANDS BV·Filed 2005·Granted May 13, 2008·8 cites·10 claims
- 4286US8416391B2Radiation source, lithographic apparatus and device manufacturing methodBANINE VADIM YEVGENYEVICH·Filed 2008·Granted Apr 9, 2013·8 cites·16 claims
- 4386US8363208B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2010·Granted Jan 29, 2013·3 cites·19 claims
- 4486US7233010B2Radiation system and lithographic apparatusASML NETHERLANDS BV·Filed 2005·Granted Jun 19, 2007·12 cites·27 claims
- 4586US6456362B1Integrating waveguide for use in lithographic projection apparatusASML NETHERLANDS BV·Filed 2000·Granted Sep 24, 2002·26 cites·20 claims
- 4685US8610089B2Thermal conditioning system for thermal conditioning a part of a lithographic apparatus and a thermal conditioning methodDONDERS SJOERD NICOLAAS LAMBERTUS·Filed 2012·Granted Dec 17, 2013·13 cites·19 claims
- 4785US7495239B2Method for cleaning a lithographic apparatus module, a cleaning arrangement and a lithographic apparatus comprising the cleaning arrangementASML NETHERLANDS BV·Filed 2005·Granted Feb 24, 2009·8 cites·37 claims
- 4885US7030958B2Optical attenuator device, radiation system and lithographic apparatus therewith and device manufacturing methodASML NETHERLANDS BV·Filed 2003·Granted Apr 18, 2006·31 cites·47 claims
- 4984US9606445B2Lithographic apparatus and method of manufacturing a deviceASML NETHERLANDS BV·Filed 2013·Granted Mar 28, 2017·5 cites·21 claims
- 5084US9442380B2Method and apparatus for generating radiationASML NETHERLANDS BV·Filed 2013·Granted Sep 13, 2016·4 cites·15 claims
Showing the top 50 of 229 patent records by PatentIndex Score.
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