Inventor · disambiguated record
Kazufumi Sato
Also filed as: SATO KAZUFUMI
44 granted patents·23 pending applications·764 citations·filing 1988–2025
98Inventor score
Files withTOKYO OHKA KOGYO CO LTD40KOBE STEEL LTD6HIRAYAMA TAKU3YAMAZAKI AKIYOSHI3ASAHI INTECC CO LTD2
Top patents by PatentIndex Score
67 records- 0195US6388101B1Chemical-sensitization photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted May 14, 2002·42 cites·4 claims
- 0295US5945517AChemical-sensitization photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1998·Granted Aug 31, 1999·305 cites·9 claims
- 0385US5736296APositive resist composition comprising a mixture of two polyhydroxystyrenes having different acid cleavable groups and an acid generating compoundTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted Apr 7, 1998·46 cites·24 claims
- 0479US6087063APositive-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1998·Granted Jul 11, 2000·37 cites·14 claims
- 0575US5908730AChemical-sensitization photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Jun 1, 1999·35 cites·19 claims
- 0675US5817444APositive-working photoresist composition and multilayered resist material using the sameTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Oct 6, 1998·35 cites·21 claims
- 0774US5929271ACompounds for use in a positive-working resist compositionTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Jul 27, 1999·26 cites·2 claims
- 0868US2024002987A1Wire material and guide wireASAHI INTECC CO LTD·Filed 2023·Application pending·0 cites
- 0967US6284430B1Positive-working chemical-amplification photoresist composition and method for forming a resist pattern using the sameTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted Sep 4, 2001·8 cites·5 claims
- 1066US6387587B1Positive-working chemical-amplification photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1999·Granted May 14, 2002·22 cites·14 claims
- 1164US12099298B2Resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2021·Granted Sep 24, 2024·0 cites·6 claims
- 1263US6638684B2Photosensitive laminate, process for forming resist pattern using same and positive resist compositionTOKYO OHKA KOGYO CO LTD·Filed 2001·Granted Oct 28, 2003·7 cites·37 claims
- 1361US5955240APositive resist compositionTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted Sep 21, 1999·23 cites·9 claims
- 1460US5948589APositive-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted Sep 7, 1999·20 cites·8 claims
- 1559US7666569B2Positive resist composition and method for forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2003·Granted Feb 23, 2010·6 cites·2 claims
- 1659US5770343APositive-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted Jun 23, 1998·15 cites·9 claims
- 1758US6818380B2Method for the preparation of a semiconductor deviceTOKYO OHKA KOGYO CO LTD·Filed 2003·Granted Nov 16, 2004·4 cites·7 claims
- 1858US2009311625A1Method for forming photoresist pattern and photoresist laminateYAMAZAKI AKIYOSHI·Filed 2009·Application pending·0 cites
- 1957US8216763B2Photosensitive resin composition and method of forming patternSATO KAZUFUMI·Filed 2006·Granted Jul 10, 2012·1 cites·14 claims
- 2057US6159652APositive resist compositionTOKYO OHKA KOGYO CO LTD·Filed 1998·Granted Dec 12, 2000·12 cites·4 claims
- 2156US6673516B2Coating composition for chemically amplified positive resist and method of patterning resist using the sameTOKYO OHKA KOGYO CO LTD·Filed 2001·Granted Jan 6, 2004·4 cites·12 claims
- 2256US2008227027A1Method for forming photoresist pattern and photoresist laminateYAMAZAKI AKIYOSHI·Filed 2008·Application pending·0 cites
- 2355US6255041B1Method for formation of patterned resist layerTOKYO OHKA KOGYO CO LTD·Filed 1999·Granted Jul 3, 2001·16 cites·10 claims
- 2455US5976760AChemical-sensitization resist compositionTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Nov 2, 1999·16 cites·13 claims
- 2555US2025229009A1Medical wire material and guide wireASAHI INTECC CO LTD·Filed 2025·Application pending·0 cites
- 2654US6890697B2Positive-working chemical-amplification photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2002·Granted May 10, 2005·2 cites·22 claims
- 2754US6869745B2Positive-working chemical-amplification photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2002·Granted Mar 22, 2005·2 cites·11 claims
- 2854US6777158B2Method for the preparation of a semiconductor deviceTOKYO OHKA KOGYO CO LTD·Filed 2001·Granted Aug 17, 2004·3 cites·13 claims
- 2950US6815144B2Positive-working chemical-amplification photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2002·Granted Nov 9, 2004·2 cites·11 claims
- 3050US2007122744A1Positive-working photoresist composition and photosensitive material using sameMAEMORI SATOSHI·Filed 2006·Application pending·0 cites
- 3150US2005266346A1Method for forming photoresist pattern and photoresist laminateYAMAZAKI AKIYOSHI·Filed 2005·Application pending·0 cites
- 3248US10344359B2Aluminum alloy clad sheet and aluminum alloy clad structural memberKOBE STEEL LTD·Filed 2016·Granted Jul 9, 2019·0 cites·3 claims
- 3348US6225476B1Positive-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted May 1, 2001·6 cites·2 claims
- 3448US5945248AChemical-sensitization positive-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Aug 31, 1999·14 cites·9 claims
- 3548US5874195APositive-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Feb 23, 1999·9 cites·7 claims
- 3648US2017144411A1Aluminum alloy clad plate, and aluminum alloy clad structural memberKOBE STEEL LTD·Filed 2016·Application pending·0 cites
- 3747US2006292488A1Composition for formation of antireflection film, and antireflection film in which the same is usedTOKYO OHKA KOGYO CO LTD·Filed 2006·Application pending·0 cites
- 3847US2007281098A1Composition for forming antireflection coatingHIRAYAMA TAKU·Filed 2007·Application pending·0 cites
- 3946US10272645B2Aluminum-alloy-clad plate and aluminum-alloy-clad structural memberKOBE STEEL LTD·Filed 2016·Granted Apr 30, 2019·0 cites·2 claims
- 4046US6245930B1Chemical-sensitization resist compositionTOKYO OHKA KOGYO CO LTD·Filed 1999·Granted Jun 12, 2001·9 cites·7 claims
- 4145US9964851B2Resist pattern forming method and developer for lithographyTOKYO OHKA KOGYO CO LTD·Filed 2016·Granted May 8, 2018·0 cites·2 claims
- 4245US6444394B1Positive-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted Sep 3, 2002·5 cites·4 claims
- 4345US2017204503A1Aluminum alloy structural part, method for producing the same, and aluminum alloy sheetKOBE STEEL LTD·Filed 2016·Application pending·0 cites
- 4445US2018001596A1Aluminum-alloy-clad plate and aluminum-alloy-clad structural memberKOBE STEEL LTD·Filed 2016·Application pending·0 cites
- 4544US6787290B2Positive-working photoresist composition and resist patterning method using sameTOKYO OHKA KOGYO CO LTD·Filed 2001·Granted Sep 7, 2004·6 cites·8 claims
- 4643US2006021964A1Composition for forming antireflection coatingHIRAYAMA TAKU·Filed 2005·Application pending·0 cites
- 4743US2005042544A1Positive-working chemical-amplification photoresist compositionFiled 2004·Application pending·0 cites
- 4843US2004248033A1Method for forming photoresist pattern and photoresist laminateFiled 2004·Application pending·0 cites
- 4942US6773863B2Positive-working chemical-amplification photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2003·Granted Aug 10, 2004·0 cites·3 claims
- 5042US2005282090A1Composition for forming antireflection coatingHIRAYAMA KAWASAKI-SHI·Filed 2003·Application pending·0 cites
Showing the top 50 of 67 patent records by PatentIndex Score.
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