Inventor · disambiguated record
Lawrence Ferreira
Also filed as: FERREIRA LAWRENCE
16 granted patents·312 citations·filing 1986–2003
94Inventor score
Files withARCH SPEC CHEM INC7OCG MICROELECTRONIC MATERIALS5ARCH CHEM INC1FUJIFILM ELECTRONIC MATERIALS1OLIN HUNT SPECIALTY PROD1
Top patents by PatentIndex Score
16 records- 0193US6855476B2Photoacid generators for use in photoresist compositionsARCH SPEC CHEM INC·Filed 2002·Granted Feb 15, 2005·58 cites·29 claims
- 0290US5541033ASelected o-quinonediazide sulfonic acid esters of phenolic compounds and their use in radiation-sensitive compositionsOCG MICROELECTRONIC MATERIALS·Filed 1995·Granted Jul 30, 1996·37 cites·48 claims
- 0386US5446125AMethod for removing metal impurities from resist componentsOCG MICROELECTRONIC MATERIALS·Filed 1991·Granted Aug 29, 1995·52 cites·21 claims
- 0484US5547814AO-quinonediazide sulfonic acid esters of phenolic compounds and their use in forming positive imagesOCG MICROELECTRONIC MATERIALS·Filed 1995·Granted Aug 20, 1996·22 cites·16 claims
- 0582US6312870B1t-butyl cinnamate polymers and their use in photoresist compositionsARCH SPEC CHEM INC·Filed 2000·Granted Nov 6, 2001·29 cites·24 claims
- 0682US5602260ASelected O-quinonediazide sulfonic acid esters of phenolic compounds and their use in radiation-sensitive compositionsOCG MICROELECTRONIC MATERIALS·Filed 1995·Granted Feb 11, 1997·19 cites·3 claims
- 0774US6133412AProduction of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulationsARCH CHEM INC·Filed 1999·Granted Oct 17, 2000·21 cites·5 claims
- 0867US6159653AProduction of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulationsARCH SPEC CHEM INC·Filed 1998·Granted Dec 12, 2000·24 cites·15 claims
- 0961US7935665B2Non-corrosive cleaning compositions for removing etch residuesFUJIFILM ELECTRONIC MATERIALS·Filed 2003·Granted May 3, 2011·8 cites·26 claims
- 1060US4711836ADevelopment of positive-working photoresist compositionsOLIN HUNT SPECIALTY PROD·Filed 1986·Granted Dec 8, 1987·14 cites·12 claims
- 1156US6309793B1Production of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulationsARCH SPEC CHEM INC·Filed 2000·Granted Oct 30, 2001·9 cites·20 claims
- 1245US6140026APhotosensitive diazonaphthoquinone esters based on selected cyclic alkyl ether-containing phenolics and their use in radiation sensitive mixturesARCH SPEC CHEM INC·Filed 1999·Granted Oct 31, 2000·2 cites·10 claims
- 1344US6040107APhotosensitive diazonaphthoquinone esters based on selected cyclic alkyl ether-containing phenolics and their use in radiation sensitive mixturesOLIN MICROELECTRONIC CHEM INC·Filed 1998·Granted Mar 21, 2000·2 cites·7 claims
- 1442US5234789APolylactide compounds as sensitivity enhancers for radiation sensitive mixtures containing o-quinonediazide photoactive compoundsOCG MICROELECTRONIC MATERIALS·Filed 1992·Granted Aug 10, 1993·9 cites·9 claims
- 1539US6380317B1Production of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulationsARCH SPEC CHEM INC·Filed 1999·Granted Apr 30, 2002·5 cites·10 claims
- 1631US6200480B1Method of purifying photoacid generators for use in photoresist compositionsARCH SPEC CHEM INC·Filed 1998·Granted Mar 13, 2001·1 cites·14 claims
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