Inventor · disambiguated record
Andrew J. Blakeney
Also filed as: BLAKENEY ANDREW · BLAKENEY ANDREW J
45 granted patents·1 pending application·722 citations·filing 1985–2004
98Inventor score
Files withARCH SPEC CHEM INC18OCG MICROELECTRONIC MATERIALS12OLIN HUNT SPECIALTY PROD7OLIN MICROELECTRONIC CHEM INC6ARCH CHEM INC1
Top patents by PatentIndex Score
46 records- 0193US6855476B2Photoacid generators for use in photoresist compositionsARCH SPEC CHEM INC·Filed 2002·Granted Feb 15, 2005·58 cites·29 claims
- 0290US5541033ASelected o-quinonediazide sulfonic acid esters of phenolic compounds and their use in radiation-sensitive compositionsOCG MICROELECTRONIC MATERIALS·Filed 1995·Granted Jul 30, 1996·37 cites·48 claims
- 0388US6143467APhotosensitive polybenzoxazole precursor compositionsARCH SPEC CHEM INC·Filed 1999·Granted Nov 7, 2000·63 cites·26 claims
- 0487US4837121AThermally stable light-sensitive compositions with o-quinone diazide and phenolic resinOLIN HUNT SPECIALTY PROD·Filed 1987·Granted Jun 6, 1989·36 cites·20 claims
- 0586US6610808B2Thermally cured underlayer for lithographic applicationARCH SPEC CHEM INC·Filed 2002·Granted Aug 26, 2003·28 cites·6 claims
- 0685US6323287B1Hydroxy-amino thermally cured undercoat for 193 NM lithographyARCH SPEC CHEM INC·Filed 1999·Granted Nov 27, 2001·33 cites·13 claims
- 0784US5547814AO-quinonediazide sulfonic acid esters of phenolic compounds and their use in forming positive imagesOCG MICROELECTRONIC MATERIALS·Filed 1995·Granted Aug 20, 1996·22 cites·16 claims
- 0883US4957846ARadiation sensitive compound and mixtures with trinuclear novolak oligomer with o-naphthoquinone diazide sulfonyl groupOLIN HUNT SPECIALTY PROD·Filed 1988·Granted Sep 18, 1990·18 cites·16 claims
- 0982US5602260ASelected O-quinonediazide sulfonic acid esters of phenolic compounds and their use in radiation-sensitive compositionsOCG MICROELECTRONIC MATERIALS·Filed 1995·Granted Feb 11, 1997·19 cites·3 claims
- 1081US6783916B2Hydroxy-amino thermally cured undercoat of 193 nm lithographyARCH SPEC CHEM INC·Filed 2001·Granted Aug 31, 2004·14 cites·5 claims
- 1174US6514664B1Radiation sensitive compositions containing image quality and profile enhancement additivesARCH SPEC CHEM INC·Filed 2000·Granted Feb 4, 2003·18 cites·22 claims
- 1274US6133412AProduction of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulationsARCH CHEM INC·Filed 1999·Granted Oct 17, 2000·21 cites·5 claims
- 1373US6924339B2Thermally cured underlayer for lithographic applicationARCH SPEC CHEM INC·Filed 2003·Granted Aug 2, 2005·12 cites·18 claims
- 1473US5164286APhotoresist developer containing fluorinated amphoteric surfactantOCG MICROELECTRONIC MATERIALS·Filed 1992·Granted Nov 17, 1992·28 cites·12 claims
- 1573US5001040AProcess of forming resist image in positive photoresist with thermally stable phenolic resinOLIN HUNT SPECIALTY PROD·Filed 1990·Granted Mar 19, 1991·21 cites·3 claims
- 1671US6783917B2Silicon-containing acetal protected polymers and photoresists compositions thereofARCH SPEC CHEM INC·Filed 2002·Granted Aug 31, 2004·13 cites·41 claims
- 1771US6146793ARadiation sensitive terpolymer, photoresist compositions thereof and 193 nm bilayer systemsARCH SPEC CHEM INC·Filed 1999·Granted Nov 14, 2000·30 cites·18 claims
- 1871US5985507ASelected high thermal novolaks and positive-working radiation-sensitive compositionsOLIN MICROELECTRONIC CHEM INC·Filed 1998·Granted Nov 16, 1999·23 cites·20 claims
- 1971US4992596ASelected trinuclear novolak oligomers and their use in photoactive compounds and radiation sensitive mixturesOLIN HUNT SPECIALTY PROD·Filed 1990·Granted Feb 12, 1991·17 cites·5 claims
- 2069US5196289ASelected block phenolic oligomers and their use in radiation-sensitive resist compositionsOCG MICROELECTRONIC MATERIALS·Filed 1991·Granted Mar 23, 1993·15 cites·13 claims
- 2167US6159653AProduction of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulationsARCH SPEC CHEM INC·Filed 1998·Granted Dec 12, 2000·24 cites·15 claims
- 2262US6054248AHydroxy-diisocyanate thermally cured undercoat for 193 nm lithographyARCH SPEC CHEM INC·Filed 1999·Granted Apr 25, 2000·21 cites·23 claims
- 2360US6492092B1Hydroxy-epoxide thermally cured undercoat for 193 NM lithographyARCH SPEC CHEM INC·Filed 1999·Granted Dec 10, 2002·20 cites·33 claims
- 2459US4959292ALight-sensitive o-quinone diazide composition and product with phenolic novolak prepared by condensation with haloacetoaldehydeOLIN HUNT SPECIALTY PROD·Filed 1988·Granted Sep 25, 1990·13 cites·18 claims
- 2558US6911297B2Photoresist compositionsARCH SPEC CHEM INC·Filed 2003·Granted Jun 28, 2005·7 cites·22 claims
- 2656US6309793B1Production of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulationsARCH SPEC CHEM INC·Filed 2000·Granted Oct 30, 2001·9 cites·20 claims
- 2756US4710449AHigh contrast low metal ion positive photoresist developing method using aqueous base solutions with surfactantsPETRARCH SYSTEMS INC·Filed 1986·Granted Dec 1, 1987·12 cites·30 claims
- 2853US4970287AThermally stable phenolic resin compositions with ortho, ortho methylene linkageOLIN HUNT SPECIALTY PROD·Filed 1989·Granted Nov 13, 1990·8 cites·13 claims
- 2951US6027853AProcess for preparing a radiation-sensitive compositionOLIN MICROELECTRONIC CHEM INC·Filed 1998·Granted Feb 22, 2000·12 cites·21 claims
- 3050US5232819ASelected block phenolic oligomers and their use in phenolic resin compositions and in radiation-sensitive resist compositionsOCG MICROELECTRONIC MATERIALS·Filed 1992·Granted Aug 3, 1993·4 cites·3 claims
- 3148US5789524AChemical imidization reagent for polyimide synthesisOLIN MICROELECTRONIC CHEM INC·Filed 1997·Granted Aug 4, 1998·9 cites·7 claims
- 3245US6140026APhotosensitive diazonaphthoquinone esters based on selected cyclic alkyl ether-containing phenolics and their use in radiation sensitive mixturesARCH SPEC CHEM INC·Filed 1999·Granted Oct 31, 2000·2 cites·10 claims
- 3344US7217497B2Hydroxy-amino thermally cured undercoat for 193 nm lithographyARCH SPEC CHEM INC·Filed 2004·Granted May 15, 2007·0 cites·11 claims
- 3444US6040107APhotosensitive diazonaphthoquinone esters based on selected cyclic alkyl ether-containing phenolics and their use in radiation sensitive mixturesOLIN MICROELECTRONIC CHEM INC·Filed 1998·Granted Mar 21, 2000·2 cites·7 claims
- 3544US4992356AProcess of developing a radiation imaged product with trinuclear novolak oligomer having o-naphthoquinone diazide sulfonyl groupOLIN HUNT SPECIALTY PROD·Filed 1990·Granted Feb 12, 1991·7 cites·4 claims
- 3642US5302688ASelected block phenolic oligomers and their use in phenolic resin compositions and in radiation-sensitive resist compositionsOCG MICROELECTRONIC MATERIALS·Filed 1992·Granted Apr 12, 1994·5 cites·4 claims
- 3741US5789525AProcess for making polyimides from diamines and tetracarboxylic diacid diesterOLIN MICROELECTRONIC CHEM INC·Filed 1997·Granted Aug 4, 1998·6 cites·5 claims
- 3841US5234795AProcess of developing an image-wise exposed resist-coated substrateOCG MICROELECTRONIC MATERIALS·Filed 1992·Granted Aug 10, 1993·6 cites·3 claims
- 3939US6380317B1Production of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulationsARCH SPEC CHEM INC·Filed 1999·Granted Apr 30, 2002·5 cites·10 claims
- 4039US5235022ASelected block copolymer novolak binder resinsOCG MICROELECTRONIC MATERIALS·Filed 1992·Granted Aug 10, 1993·5 cites·6 claims
- 4139US5024921AThermally stable light-sensitive compositions with o-quinone diazide and phenolic resin used in a method of forming a positive photoresist imageOCG MICROELECTRONIC MATERIALS·Filed 1990·Granted Jun 18, 1991·5 cites·3 claims
- 4239US4661436AProcess of forming high contrast resist pattern in positive photoagent material using alkalai developer with fluorocarbon surfactantPETRARCH SYSTEM INC·Filed 1985·Granted Apr 28, 1987·7 cites·6 claims
- 4335US5834581AProcess for making polyimide-polyamic ester copolymersOLIN MICROELECTRONIC CHEM INC·Filed 1997·Granted Nov 10, 1998·3 cites·2 claims
- 4435US2003022097A1Tertiary-butyl acrylate polymers and their use in photoresist compositionsARCH SPEC CHEM INC·Filed 2001·Application pending·0 cites
- 4534US5053479AThermally stable phenolic resin compositions and their use in light-sensitive compositionsOCG MICROELECTRONIC MATERIALS·Filed 1990·Granted Oct 1, 1991·3 cites·9 claims
- 4630US5188921ASelected block copolymer novolak binder resins in radiation-sensitive resist compositionsOCG MICROELECTRONIC MATERIALS·Filed 1991·Granted Feb 23, 1993·1 cites·15 claims
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