Inventor · disambiguated record
Chueh-Yang Liu
Also filed as: LIU CHUEH · LIU CHUEH-YANG
27 granted patents·1 pending application·42 citations·filing 2014–2019
93Inventor score
Top patents by PatentIndex Score
28 records- 0195US9716165B1Field-effect transistor and method of making the sameUNITED MICROELECTRONICS CORP·Filed 2016·Granted Jul 25, 2017·15 cites·13 claims
- 0289US9646889B1Method of removing a hard mask layer on a gate structure while forming a protective layer on the surface of a substrateUNITED MICROELECTRONICS CORP·Filed 2016·Granted May 9, 2017·5 cites·11 claims
- 0385US10312084B2Semiconductor device and fabrication method thereofUNITED MICROELECTRONICS CORP·Filed 2017·Granted Jun 4, 2019·3 cites·8 claims
- 0484US10079143B2Method of forming semiconductor device having wick structureUNITED MICROELECTRONICS CORP·Filed 2017·Granted Sep 18, 2018·3 cites·10 claims
- 0581US11056288B2Nanodendrite with ruthenium oxide capacitor and methodUNIV CALIFORNIA·Filed 2016·Granted Jul 6, 2021·2 cites·9 claims
- 0681US9960084B1Method for forming semiconductor deviceUNITED MICROELECTRONICS CORP·Filed 2016·Granted May 1, 2018·3 cites·11 claims
- 0778US9728397B1Semiconductor device having the insulating layers cover a bottom portion of the fin shaped structureUNITED MICROELECTRONICS CORP·Filed 2016·Granted Aug 8, 2017·2 cites·7 claims
- 0876US9793105B1Fabricating method of fin field effect transistor (FinFET)UNITED MICROELECTRONICS CORP·Filed 2016·Granted Oct 17, 2017·2 cites·20 claims
- 0976US9613808B1Method of forming multilayer hard mask with treatment for removing impurities and forming dangling bondsUNITED MICROELECTRONICS CORP·Filed 2016·Granted Apr 4, 2017·2 cites·7 claims
- 1075US9748111B2Method of fabricating semiconductor structure using planarization process and cleaning processUNITED MICROELECTRONICS CORP·Filed 2016·Granted Aug 29, 2017·2 cites·18 claims
- 1169US9627534B1Semiconductor MOS device having a dense oxide film on a spacerUNITED MICROELECTRONICS CORP·Filed 2015·Granted Apr 18, 2017·1 cites·12 claims
- 1269US9530886B1Semiconductor device with epitaxial structure and manufacturing method thereofUNITED MICROELECTRONICS CORP·Filed 2015·Granted Dec 27, 2016·1 cites·10 claims
- 1366US9466480B2Cleaning process for oxideUNITED MICROELECTRONICS CORP·Filed 2014·Granted Oct 11, 2016·1 cites·20 claims
- 1465US11367869B2Glass bottles based silicon electrode materialsUNIV CALIFORNIA·Filed 2019·Granted Jun 21, 2022·0 cites·14 claims
- 1560US10651174B2FinFET structure and fabricating method of gate structureUNITED MICROELECTRONICS CORP·Filed 2019·Granted May 12, 2020·0 cites·5 claims
- 1659US10128366B2Field-effect transistorUNITED MICROELECTRONICS CORP·Filed 2018·Granted Nov 13, 2018·0 cites·15 claims
- 1758US9929264B2Field-effect transistor and method of making the sameUNITED MICROELECTRONICS CORP·Filed 2017·Granted Mar 27, 2018·0 cites·9 claims
- 1855US10505041B2Semiconductor device having epitaxial layer with planar surface and protrusionsUNITED MICROELECTRONICS CORP·Filed 2017·Granted Dec 10, 2019·0 cites·7 claims
- 1954US9633904B1Method for manufacturing semiconductor device with epitaxial structureUNITED MICROELECTRONICS CORP·Filed 2016·Granted Apr 25, 2017·0 cites·10 claims
- 2050US10340268B2FinFET structure and fabricating method of gate structureUNITED MICROELECTRONICS CORP·Filed 2016·Granted Jul 2, 2019·0 cites·6 claims
- 2144US10199485B2Semiconductor device including quantum wiresUNITED MICROELECTRONICS CORP·Filed 2017·Granted Feb 5, 2019·0 cites·20 claims
- 2244US9871113B2Semiconductor processUNITED MICROELECTRONICS CORP·Filed 2016·Granted Jan 16, 2018·0 cites·16 claims
- 2342US9899520B2Method for fabricating semiconductor deviceUNITED MICROELECTRONICS CORP·Filed 2015·Granted Feb 20, 2018·0 cites·15 claims
- 2441US9741572B1Method of forming oxide layerUNITED MICROELECTRONICS CORP·Filed 2016·Granted Aug 22, 2017·0 cites·12 claims
- 2541US9570315B2Method of interfacial oxide layer formation in semiconductor deviceUNITED MICROELECTRONICS CORP·Filed 2015·Granted Feb 14, 2017·0 cites·18 claims
- 2641US2016172190A1Gate oxide formation processUNITED MICROELECTRONICS CORP·Filed 2014·Application pending·0 cites
- 2738US9966266B2Apparatus for semiconductor wafer treatment and semiconductor wafer treatmentUNITED MICROELECTRONICS CORP·Filed 2016·Granted May 8, 2018·0 cites·10 claims
- 2837US9741818B2Manufacturing method of semiconductor structure for improving quality of epitaxial layersUNITED MICROELECTRONICS CORP·Filed 2015·Granted Aug 22, 2017·0 cites·12 claims
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