Inventor · disambiguated record
Shinji Nagashima
Also filed as: NAGASHIMA SHINJI
26 granted patents·2 pending applications·1,059 citations·filing 1995–2006
97Inventor score
Files withTOKYO ELECTRON LTD28
Top patents by PatentIndex Score
28 records- 0198US5826129ASubstrate processing systemTOKYO ELECTRON LTD·Filed 1995·Granted Oct 20, 1998·552 cites·23 claims
- 0292US6190459B1Gas treatment apparatusTOKYO ELECTRON LTD·Filed 1998·Granted Feb 20, 2001·104 cites·13 claims
- 0387US6248168B1Spin coating apparatus including aging unit and solvent replacement unitTOKYO ELECTRON LTD·Filed 1998·Granted Jun 19, 2001·63 cites·12 claims
- 0485US6589339B2Method of coating film, coating unit, aging unit, solvent replacement unit, and apparatus for coating filmTOKYO ELECTRON LTD·Filed 2001·Granted Jul 8, 2003·26 cites·12 claims
- 0583US6501191B2Heat treatment apparatus and methodTOKYO ELECTRON LTD·Filed 2001·Granted Dec 31, 2002·28 cites·22 claims
- 0682US6786974B2Insulating film forming method and insulating film forming apparatusTOKYO ELECTRON LTD·Filed 2003·Granted Sep 7, 2004·28 cites·7 claims
- 0781US6590186B2Heat treatment apparatus and methodTOKYO ELECTRON LTD·Filed 2002·Granted Jul 8, 2003·24 cites·7 claims
- 0879US6564474B2Apparatus for heat processing of substrateTOKYO ELECTRON LTD·Filed 2001·Granted May 20, 2003·18 cites·13 claims
- 0979US6419751B1Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Jul 16, 2002·19 cites·12 claims
- 1078US6660096B2Gas treatment apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Dec 9, 2003·17 cites·3 claims
- 1177US6982002B2Apparatus and method for forming coating filmTOKYO ELECTRON LTD·Filed 2002·Granted Jan 3, 2006·19 cites·10 claims
- 1277US6413317B1Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Jul 2, 2002·23 cites·6 claims
- 1376US6808567B2Gas treatment apparatusTOKYO ELECTRON LTD·Filed 2003·Granted Oct 26, 2004·14 cites·4 claims
- 1475US6827973B2Substrate processing methodTOKYO ELECTRON LTD·Filed 2001·Granted Dec 7, 2004·18 cites·1 claims
- 1572US6665952B2Method for heat processing of substrateTOKYO ELECTRON LTD·Filed 2003·Granted Dec 23, 2003·12 cites·6 claims
- 1672US6350316B1Apparatus for forming coating filmTOKYO ELECTRON LTD·Filed 1999·Granted Feb 26, 2002·25 cites·19 claims
- 1764US6726775B2Method of coating film, coating unit, aging unit, solvent replacement unit, and apparatus for coating filmTOKYO ELECTRON LTD·Filed 2003·Granted Apr 27, 2004·6 cites·6 claims
- 1859US6605550B2Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2002·Granted Aug 12, 2003·5 cites·3 claims
- 1958US7520936B2Hardening processing apparatus, hardening processing method, and coating film forming apparatusTOKYO ELECTRON LTD·Filed 2004·Granted Apr 21, 2009·6 cites·18 claims
- 2058US6261365B1Heat treatment method, heat treatment apparatus and treatment systemTOKYO ELECTRON LTD·Filed 1999·Granted Jul 17, 2001·19 cites·14 claims
- 2156US6979474B2Heat treatment method, heat treatment apparatus and treatment systemTOKYO ELECTRON LTD·Filed 2001·Granted Dec 27, 2005·4 cites·15 claims
- 2253US2006292298A1Method of coating film, coating unit, aging unit, solvent replacement unit, and apparatus for coating filmTOKYO ELECTRON LTD·Filed 2006·Application pending·0 cites
- 2349US6673155B2Apparatus for forming coating film and apparatus for curing the coating filmTOKYO ELECTRON LTD·Filed 1999·Granted Jan 6, 2004·16 cites·18 claims
- 2449US6197385B1Film forming apparatus, substrate conveying apparatus, film forming method, and substrate conveying methodTOKYO ELECTRON LTD·Filed 1999·Granted Mar 6, 2001·10 cites·15 claims
- 2546US6730620B2Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2002·Granted May 4, 2004·2 cites·11 claims
- 2645US6573191B1Insulating film forming method and insulating film forming apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Jun 3, 2003·1 cites·6 claims
- 2744US7205024B2Method of coating film, coating unit, aging unit, solvent replacement unit, and apparatus for coating filmTOKYO ELECTRON LTD·Filed 2004·Granted Apr 17, 2007·0 cites·12 claims
- 2837US2002100419A1Film treatment apparatus and methodTOKYO ELECTRON LTD·Filed 2002·Application pending·0 cites
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