Inventor · disambiguated record
Shigeyuki Iwasa
Also filed as: IWASA SHIGEYUKI · IWASA SHIGEYÜKI
55 granted patents·23 pending applications·1,077 citations·filing 1994–2021
99Inventor score
Top patents by PatentIndex Score
78 records- 0198US7432035B2(Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using itNEC CORP·Filed 2007·Granted Oct 7, 2008·54 cites·11 claims
- 0297US5738975APhotosensitive resin and method for patterning by use of the sameNEC CORP·Filed 1994·Granted Apr 14, 1998·149 cites·21 claims
- 0396US7186495B2(Meth) acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using itNEC CORP·Filed 2000·Granted Mar 6, 2007·46 cites·26 claims
- 0491US5994025APhotoresist, compounds for composing the photoresist, and method of forming pattern by using the photoresistNEC CORP·Filed 1996·Granted Nov 30, 1999·93 cites·6 claims
- 0590US5585507AAlkylsulfonium salts and photoresist compositions containing the sameNEC CORP·Filed 1995·Granted Dec 17, 1996·35 cites·9 claims
- 0689US7642011B2Secondary battery with a radical compound active materialNEC CORP·Filed 2005·Granted Jan 5, 2010·8 cites·6 claims
- 0788US5635332AAlkylsulfonium salts and photoresist compositions containing the sameNEC CORP·Filed 1994·Granted Jun 3, 1997·63 cites·4 claims
- 0887US6528232B1Sulfonium salt compound, photoresist composition and method for patterning by employing sameNEC CORP·Filed 2000·Granted Mar 4, 2003·28 cites·7 claims
- 0986US5866304APhotosensitive resin and method for patterning by use of the sameNEC CORP·Filed 1997·Granted Feb 2, 1999·61 cites·4 claims
- 1084US8969483B2(Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using itNEC CORP·Filed 2012·Granted Mar 3, 2015·2 cites·2 claims
- 1184US5691111APhotosensitive resin composition useful as resist for deep UV lithography containing sulfonium saltsNEC CORP·Filed 1995·Granted Nov 25, 1997·47 cites·22 claims
- 1283US6866964B2Secondary batteryNEC CORP·Filed 2001·Granted Mar 15, 2005·19 cites·33 claims
- 1382US6602647B2Sulfonium salt compound and resist composition and pattern forming method using the sameNEC CORP·Filed 2000·Granted Aug 5, 2003·11 cites·14 claims
- 1482US6074801ANegative type photoresist composition used for light beam with short wavelength and method of forming pattern using the sameNEC CORP·Filed 1998·Granted Jun 13, 2000·41 cites·28 claims
- 1581US6106998ANegative resist materials, pattern formation method making use thereof, and method of manufacturing semiconductor devicesNEC CORP·Filed 1998·Granted Aug 22, 2000·44 cites·6 claims
- 1680US6146806ANegative photoresist composition using polymer having 1,2-diol structure and process for forming pattern using the sameNEC CORP·Filed 1999·Granted Nov 14, 2000·36 cites·10 claims
- 1778US6391529B2(Meth)acrylate, polymer photoresist composition, and pattern forming process making use of the compositionNEC CORP·Filed 2001·Granted May 21, 2002·12 cites·4 claims
- 1876US8728662B2Process for producing polyradical compound and battery cellSUGURO MASAHIRO·Filed 2007·Granted May 20, 2014·3 cites·15 claims
- 1976US7226697B2Electricity storage deviceNEC CORP·Filed 2002·Granted Jun 5, 2007·13 cites·4 claims
- 2075US8242213B2Method for manufacturing polyradical compound and batterySUGURO MASAHIRO·Filed 2011·Granted Aug 14, 2012·2 cites·4 claims
- 2175US6437052B1Monomer having diol structure, polymer thereof, and negative photoresist composition and pattern forming method using the sameNEC CORP·Filed 1999·Granted Aug 20, 2002·29 cites·32 claims
- 2275US5621019AMonomer having vinyl group, polymer thereof and photosensitive resin including thoseNEC CORP·Filed 1995·Granted Apr 15, 1997·37 cites·11 claims
- 2373US7018738B2Electrode and battery using sameNEC CORP·Filed 2002·Granted Mar 28, 2006·11 cites·20 claims
- 2470US6469197B1Negative photoresist composition using polymer having 1,2-diol structure and process for forming pattern using the sameNEC CORP·Filed 2000·Granted Oct 22, 2002·8 cites·1 claims
- 2569US8475956B2Polyradical compound-conductive material composite, method for producing the same, and battery using the sameKUSACHI YUKI·Filed 2008·Granted Jul 2, 2013·2 cites·16 claims
- 2669US6140010ANegative type photoresist composition used for light beam with short wavelength and method of forming pattern using the sameNEC CORP·Filed 1998·Granted Oct 31, 2000·27 cites·12 claims
- 2768US6638685B2Photoacid generator containing two kinds of sulfonium salt compound, chemically amplified resist containing the same and pattern transfer methodNEC CORP·Filed 2001·Granted Oct 28, 2003·9 cites·18 claims
- 2867US5770346APhotoresist and compounds for composing the photoresistNEC CORP·Filed 1996·Granted Jun 23, 1998·18 cites·11 claims
- 2966US8617744B2Electricity storage deviceNAKAHARA KENTARO·Filed 2010·Granted Dec 31, 2013·1 cites·12 claims
- 3065US6030747AChemically amplified resist large in transparency and sensitivity to exposure light less than 248 nanometer wavelength and process of forming maskNEC CORP·Filed 1998·Granted Feb 29, 2000·29 cites·4 claims
- 3165US2015183912A1(meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using itNEC CORP·Filed 2014·Application pending·0 cites
- 3264US7318981B2Secondary battery with a nitroxyl polymer active materialNEC CORP·Filed 2004·Granted Jan 15, 2008·5 cites·12 claims
- 3364US6352813B2Photosensitive resin composition and patterning method using the sameNEC CORP·Filed 1998·Granted Mar 5, 2002·22 cites·9 claims
- 3464US5756850ASulfonium salts having bridged cyclic alkyl group useful as resist for deep UV lithographyNEC CORP·Filed 1997·Granted May 26, 1998·18 cites·2 claims
- 3561US7045248B2Secondary battery having radical compound electrodeNEC CORP·Filed 2001·Granted May 16, 2006·4 cites·10 claims
- 3661US5985522APhotoresist and compounds for composing the photoresistNEC CORP·Filed 1997·Granted Nov 16, 1999·14 cites·15 claims
- 3761US5747622APolymer having silicon atoms and sulfonium salt units and photoresist compositions containing the sameNEC CORP·Filed 1997·Granted May 5, 1998·21 cites·23 claims
- 3861US2014057167A1Secondary battery and carbon ink for conductive auxiliary layer of the sameNEC CORP·Filed 2013·Application pending·0 cites
- 3961US2011129730A1Secondary battery and carbon ink for conductive auxiliary layer of the sameDAINIPPON INK & CHEMICALS·Filed 2009·Application pending·0 cites
- 4060US8802798B2(Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using itMAEDA KATSUMI·Filed 2008·Granted Aug 12, 2014·0 cites·5 claims
- 4159US12480875B2Method for sensing plant hormone, and method for early detection of disease infection in plant using sameNEC CORP·Filed 2021·Granted Nov 25, 2025·0 cites·15 claims
- 4259US6773767B2Liquid crystal display unit and method for manufacturing the sameNEC CORP·Filed 2001·Granted Aug 10, 2004·6 cites·4 claims
- 4359US6559337B2(Meth)acrylate, polymer, photoresist composition, and pattern forming process making use of the compositionNEC CORP·Filed 2001·Granted May 6, 2003·10 cites·1 claims
- 4457US2011196122A1(meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using itNEC CORP·Filed 2011·Application pending·0 cites
- 4556US7544441B2Secondary battery having an active material radical compoundNEC CORP·Filed 2002·Granted Jun 9, 2009·2 cites·2 claims
- 4656US2023236210A1Method for sensing plant hormone using rare earth compound, sensor using the same, and method for early detection of disease infection in plantNEC CORP·Filed 2021·Application pending·0 cites
- 4756US2012178023A1(meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using itMAEDA KATSUMI·Filed 2011·Application pending·0 cites
- 4855US2011159379A1Secondary batteryNEC CORP·Filed 2009·Application pending·0 cites
- 4955US2011070504A1Secondary batteryNEC CORP·Filed 2009·Application pending·0 cites
- 5055US2021273226A1Secondary battery using radical polymer in an electrodeNEC CORP·Filed 2019·Application pending·0 cites
Showing the top 50 of 78 patent records by PatentIndex Score.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →