Inventor · disambiguated record
Teruaki Okino
Also filed as: OKINO TERUAKI
37 granted patents·3 pending applications·744 citations·filing 1995–2003
98Inventor score
Files withNIKON CORP40
Top patents by PatentIndex Score
40 records- 0194US5981947AApparatus for detecting or collecting secondary electrons, charged-particle beam exposure apparatus comprising same, and related methodsNIKON CORP·Filed 1998·Granted Nov 9, 1999·94 cites·55 claims
- 0291US6815693B2Charged-particle-beam microlithography apparatus and methods including proximity-effect correctionNIKON CORP·Filed 2001·Granted Nov 9, 2004·38 cites·25 claims
- 0387US5914493ACharged-particle-beam exposure apparatus and methods with substrate-temperature controlNIKON CORP·Filed 1998·Granted Jun 22, 1999·87 cites·15 claims
- 0484US6072184ACharged-particle-beam projection methodsNIKON CORP·Filed 1998·Granted Jun 6, 2000·44 cites·13 claims
- 0583US5973333ACharged-particle-beam pattern-transfer apparatus and methodsNIKON CORP·Filed 1998·Granted Oct 26, 1999·40 cites·32 claims
- 0681US6447964B2Charged-particle-beam microlithography methods including chip-exposure sequences for reducing thermally induced lateral shift of exposure position on the substrateNIKON CORP·Filed 2001·Granted Sep 10, 2002·17 cites·20 claims
- 0781US5874198ACharged particle beam transfer methodNIKON CORP·Filed 1996·Granted Feb 23, 1999·38 cites·21 claims
- 0881US5856677APattern projection method with charged particle beam and charged particle beam projection systemNIKON CORP·Filed 1997·Granted Jan 5, 1999·30 cites·8 claims
- 0977US6307209B1Pattern-transfer method and apparatusNIKON CORP·Filed 2000·Granted Oct 23, 2001·10 cites·4 claims
- 1075US5912467AMethod and apparatus for measurement of pattern formation characteristicsNIKON CORP·Filed 1997·Granted Jun 15, 1999·29 cites·21 claims
- 1173US6541169B1Methods for charged-particle-beam microlithography including correction of deflection aberrations, and device-manufacturing methods comprising sameNIKON CORP·Filed 2000·Granted Apr 1, 2003·10 cites·33 claims
- 1271US5912469ACharged-particle-beam microlithography apparatusNIKON CORP·Filed 1997·Granted Jun 15, 1999·55 cites·26 claims
- 1370US6680481B2Mark-detection methods and charged-particle-beam microlithography methods and apparatus comprising sameNIKON CORP·Filed 2002·Granted Jan 20, 2004·8 cites·26 claims
- 1470US5798196APattern transfer method utilizing distribution condition evaluation by charged particle beamNIKON CORP·Filed 1996·Granted Aug 25, 1998·19 cites·6 claims
- 1569US6258511B1Charged particle beam exposure method utilizing partial exposure stitch areaNIKON CORP·Filed 1999·Granted Jul 10, 2001·21 cites·6 claims
- 1669US5879842APattern projection method with charged particle beam utilizing continuous movement of mask and substrateNIKON CORP·Filed 1997·Granted Mar 9, 1999·17 cites·6 claims
- 1767US5817442APattern projection method with charged particle beam utilizing continuous movement to perform projectionNIKON CORP·Filed 1996·Granted Oct 6, 1998·15 cites·5 claims
- 1866US6362489B2Charged-particle-beam microlithography methods exhibiting reduced thermal deformation of mark-defining memberNIKON CORP·Filed 2001·Granted Mar 26, 2002·10 cites·3 claims
- 1965US6376137B1Charged-particle-beam microlithography apparatus and methods including correction of stage-positioning errors using a deflectorNIKON CORP·Filed 2000·Granted Apr 23, 2002·6 cites·12 claims
- 2063US6194732B1Charged-particle-beam exposure methods with beam parallelism detection and correctionNIKON CORP·Filed 1998·Granted Feb 27, 2001·16 cites·30 claims
- 2163US5933217AElectron-beam projection-microlithography apparatus and methodsNIKON CORP·Filed 1997·Granted Aug 3, 1999·16 cites·22 claims
- 2261US6207962B1Charged-particle-beam microlithography apparatus and methods exhibiting reduced thermal deformation of mark-defining memberNIKON CORP·Filed 1999·Granted Mar 27, 2001·12 cites·9 claims
- 2360US6657207B2Charged-particle-beam microlithography apparatus and methods including optical corrections made during subfield exposuresNIKON CORP·Filed 2001·Granted Dec 2, 2003·7 cites·18 claims
- 2460US6027843ACharged-particle-beam microlithography methods including correction of imaging faultsNIKON CORP·Filed 1999·Granted Feb 22, 2000·14 cites·33 claims
- 2559US5567949ACharged particle beam transfer apparatusNIKON CORP·Filed 1995·Granted Oct 22, 1996·13 cites·8 claims
- 2657US6894291B2Apparatus and methods for blocking highly scattered charged particles in a patterned beam in a charged-particle-beam microlithography systemNIKON CORP·Filed 2001·Granted May 17, 2005·3 cites·12 claims
- 2757US6151101ACharged-particle-beam projection-exposure apparatus and methods exhibiting increased throughtputNIKON CORP·Filed 1999·Granted Nov 21, 2000·12 cites·24 claims
- 2855US6936831B2Divided reticles for charged-particle-beam microlithography apparatus, and methods for using sameNIKON CORP·Filed 2001·Granted Aug 30, 2005·4 cites·18 claims
- 2955US6277542B1Charged-particle-beam projection-exposure methods exhibiting more uniform beam-current densityNIKON CORP·Filed 1999·Granted Aug 21, 2001·11 cites·26 claims
- 3055US5624774AMethod for transferring patterns with charged particle beamNIKON CORP·Filed 1995·Granted Apr 29, 1997·11 cites·11 claims
- 3150US5929457ACharged particle beam transfer apparatusNIKON CORP·Filed 1997·Granted Jul 27, 1999·7 cites·4 claims
- 3249US6664551B2Methods for detecting incidence orthogonality of a patterned beam in charged-particle-beam (CPB) microlithography, and CPB microlithography systems that perform sameNIKON CORP·Filed 2002·Granted Dec 16, 2003·1 cites·32 claims
- 3348US6162581ACharged particle beam pattern-transfer method utilizing non-uniform dose distribution in stitching regionNIKON CORP·Filed 1998·Granted Dec 19, 2000·11 cites·27 claims
- 3446US5700604ACharged particle beam exposure method and mask employed thereforNIKON CORP·Filed 1996·Granted Dec 23, 1997·9 cites·14 claims
- 3540US5789119AImage transfer mask for charged particle-beamNIKON CORP·Filed 1997·Granted Aug 4, 1998·6 cites·10 claims
- 3637US2002036272A1Charged-particle-beam microlithography methods and apparatus providing reduced reticle heatingNIKON CORP·Filed 2001·Application pending·0 cites
- 3737US2002036273A1Methods for manufacturing reticles for charged-particle-beam microlithography exhibiting reduced proximity effects, and reticles produced using sameNIKON CORP·Filed 2001·Application pending·0 cites
- 3834US5989753AMethod, apparatus, and mask for pattern projection using a beam of charged particlesNIKON CORP·Filed 1996·Granted Nov 23, 1999·2 cites·12 claims
- 3933US2004126673A1Microlithography reticles including high-contrast reticle-identification codes, and apparatus and methods for identifying reticles based on such codesNIKON CORP·Filed 2003·Application pending·0 cites
- 4031US5888699APattern transfer method and transfer apparatus by charged particle beamNIKON CORP·Filed 1996·Granted Mar 30, 1999·1 cites·5 claims
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