Inventor · disambiguated record
Kaichiro Nakano
Also filed as: NAKANO KAICHIRO
46 granted patents·11 pending applications·1,029 citations·filing 1993–2014
98Inventor score
Top patents by PatentIndex Score
57 records- 0198US7432035B2(Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using itNEC CORP·Filed 2007·Granted Oct 7, 2008·54 cites·11 claims
- 0297US5738975APhotosensitive resin and method for patterning by use of the sameNEC CORP·Filed 1994·Granted Apr 14, 1998·149 cites·21 claims
- 0396US7186495B2(Meth) acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using itNEC CORP·Filed 2000·Granted Mar 6, 2007·46 cites·26 claims
- 0491US5994025APhotoresist, compounds for composing the photoresist, and method of forming pattern by using the photoresistNEC CORP·Filed 1996·Granted Nov 30, 1999·93 cites·6 claims
- 0590US5585507AAlkylsulfonium salts and photoresist compositions containing the sameNEC CORP·Filed 1995·Granted Dec 17, 1996·35 cites·9 claims
- 0688US5635332AAlkylsulfonium salts and photoresist compositions containing the sameNEC CORP·Filed 1994·Granted Jun 3, 1997·63 cites·4 claims
- 0787US6528232B1Sulfonium salt compound, photoresist composition and method for patterning by employing sameNEC CORP·Filed 2000·Granted Mar 4, 2003·28 cites·7 claims
- 0886US5866304APhotosensitive resin and method for patterning by use of the sameNEC CORP·Filed 1997·Granted Feb 2, 1999·61 cites·4 claims
- 0984US8969483B2(Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using itNEC CORP·Filed 2012·Granted Mar 3, 2015·2 cites·2 claims
- 1084US5691111APhotosensitive resin composition useful as resist for deep UV lithography containing sulfonium saltsNEC CORP·Filed 1995·Granted Nov 25, 1997·47 cites·22 claims
- 1182US6602647B2Sulfonium salt compound and resist composition and pattern forming method using the sameNEC CORP·Filed 2000·Granted Aug 5, 2003·11 cites·14 claims
- 1282US6074801ANegative type photoresist composition used for light beam with short wavelength and method of forming pattern using the sameNEC CORP·Filed 1998·Granted Jun 13, 2000·41 cites·28 claims
- 1381US6106998ANegative resist materials, pattern formation method making use thereof, and method of manufacturing semiconductor devicesNEC CORP·Filed 1998·Granted Aug 22, 2000·44 cites·6 claims
- 1480US6146806ANegative photoresist composition using polymer having 1,2-diol structure and process for forming pattern using the sameNEC CORP·Filed 1999·Granted Nov 14, 2000·36 cites·10 claims
- 1578US6391529B2(Meth)acrylate, polymer photoresist composition, and pattern forming process making use of the compositionNEC CORP·Filed 2001·Granted May 21, 2002·12 cites·4 claims
- 1678US5665518APhotoresist and monomer and polymer for composing the photoresistNEC CORP·Filed 1996·Granted Sep 9, 1997·36 cites·3 claims
- 1777US7847017B2Photosensitive resin composition for optical waveguide formation, optical waveguide and method for producing optical waveguideNEC CORP·Filed 2006·Granted Dec 7, 2010·3 cites·4 claims
- 1875US5621019AMonomer having vinyl group, polymer thereof and photosensitive resin including thoseNEC CORP·Filed 1995·Granted Apr 15, 1997·37 cites·11 claims
- 1970US6469197B1Negative photoresist composition using polymer having 1,2-diol structure and process for forming pattern using the sameNEC CORP·Filed 2000·Granted Oct 22, 2002·8 cites·1 claims
- 2069US6140010ANegative type photoresist composition used for light beam with short wavelength and method of forming pattern using the sameNEC CORP·Filed 1998·Granted Oct 31, 2000·27 cites·12 claims
- 2168US7232639B2Monomer having fluorine-containing acetal or ketal structure, polymer thereof, and chemical-amplification-type resist composition as well as process for formation of pattern with use of the sameNEC CORP·Filed 2003·Granted Jun 19, 2007·4 cites·31 claims
- 2268US6638685B2Photoacid generator containing two kinds of sulfonium salt compound, chemically amplified resist containing the same and pattern transfer methodNEC CORP·Filed 2001·Granted Oct 28, 2003·9 cites·18 claims
- 2368US6639084B2Chemically amplified resist, polymer for the chemically amplified resist, monomer for the polymer and method for transferring pattern to chemically amplified resist layerNEC CORP·Filed 2002·Granted Oct 28, 2003·6 cites·9 claims
- 2467US5770346APhotoresist and compounds for composing the photoresistNEC CORP·Filed 1996·Granted Jun 23, 1998·18 cites·11 claims
- 2566US8617744B2Electricity storage deviceNAKAHARA KENTARO·Filed 2010·Granted Dec 31, 2013·1 cites·12 claims
- 2665US8388238B2Ferrule, and method of producing an optical waveguide connector, and optical waveguide connector which use the ferruleOHMURA MASAKI·Filed 2007·Granted Mar 5, 2013·4 cites·11 claims
- 2765US6030747AChemically amplified resist large in transparency and sensitivity to exposure light less than 248 nanometer wavelength and process of forming maskNEC CORP·Filed 1998·Granted Feb 29, 2000·29 cites·4 claims
- 2865US2015183912A1(meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using itNEC CORP·Filed 2014·Application pending·0 cites
- 2964US6352813B2Photosensitive resin composition and patterning method using the sameNEC CORP·Filed 1998·Granted Mar 5, 2002·22 cites·9 claims
- 3064US5756850ASulfonium salts having bridged cyclic alkyl group useful as resist for deep UV lithographyNEC CORP·Filed 1997·Granted May 26, 1998·18 cites·2 claims
- 3163US7333683B2Structure and method for mounting LSI package onto photoelectric wiring board, information processing apparatus, optical interface, and photoelectric wiring boardNEC CORPROATION·Filed 2005·Granted Feb 19, 2008·3 cites·33 claims
- 3261US5985522APhotoresist and compounds for composing the photoresistNEC CORP·Filed 1997·Granted Nov 16, 1999·14 cites·15 claims
- 3361US5747622APolymer having silicon atoms and sulfonium salt units and photoresist compositions containing the sameNEC CORP·Filed 1997·Granted May 5, 1998·21 cites·23 claims
- 3460US8802798B2(Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using itMAEDA KATSUMI·Filed 2008·Granted Aug 12, 2014·0 cites·5 claims
- 3560US6710188B2Chemically amplified resist, polymer for the chemically amplified resist, monomer for the polymer and method for transferring pattern to chemically amplified resist layerNEC CORP·Filed 2003·Granted Mar 23, 2004·4 cites·25 claims
- 3659US6559337B2(Meth)acrylate, polymer, photoresist composition, and pattern forming process making use of the compositionNEC CORP·Filed 2001·Granted May 6, 2003·10 cites·1 claims
- 3757US2011196122A1(meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using itNEC CORP·Filed 2011·Application pending·0 cites
- 3856US2012178023A1(meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using itMAEDA KATSUMI·Filed 2011·Application pending·0 cites
- 3955US8297855B2Optical connectorKOREEDA YUICHI·Filed 2008·Granted Oct 30, 2012·1 cites·12 claims
- 4055US2011159379A1Secondary batteryNEC CORP·Filed 2009·Application pending·0 cites
- 4154US6746722B2Fluorine-containing phenylmaleimide derivative, polymer, chemically amplified resist composition, and method for pattern formation using the compositionNEC CORP·Filed 2002·Granted Jun 8, 2004·2 cites·10 claims
- 4253US5439990APhotolytic polymer and photoresist compositionNEC CORP·Filed 1993·Granted Aug 8, 1995·8 cites·4 claims
- 4353US2010150506A1Polymer optical waveguide forming material, polymer optical waveguide and manufacturing method of polymer optical waveguideNEC CORP·Filed 2008·Application pending·0 cites
- 4452US8414733B2Photosensitive resin composition for optical waveguide formation, optical waveguide and method for producing optical waveguideMAEDA KATSUMI·Filed 2010·Granted Apr 9, 2013·0 cites·8 claims
- 4551US6287746B1Chemically amplified resist large in transparency and sensitivity to exposure light less than 248 nanometer wavelength and process of forming maskNEC CORP·Filed 1998·Granted Sep 11, 2001·12 cites·3 claims
- 4646US7192682B2Unsaturated monomers, polymers, chemically-amplified resist composition, and process of pattern formationNEC CORP·Filed 2003·Granted Mar 20, 2007·0 cites·9 claims
- 4746US2010329616A1Photosensitive resin composition, method for control of refractive index, and optical waveguide and optical component using the sameCHEN NING-JUAN·Filed 2007·Application pending·0 cites
- 4845US7439005B2Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming patternNEC CORP·Filed 2005·Granted Oct 21, 2008·0 cites·14 claims
- 4943US2012171542A1Secondary batteryMATSUMOTO KAZUAKI·Filed 2010·Application pending·0 cites
- 5042US7470499B2Alicyclic unsaturated compound, polymer, chemically amplified resist composition and method for forming pattern using said compositionNEC CORP·Filed 2004·Granted Dec 30, 2008·0 cites·20 claims
Showing the top 50 of 57 patent records by PatentIndex Score.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →