Inventor · disambiguated record
Saburo Kamiya
Also filed as: KAMIYA SABURO · MAGOME NOBUTAKA
22 granted patents·2 pending applications·1,483 citations·filing 1988–2009
97Inventor score
Top patents by PatentIndex Score
24 records- 0199US6897963B1Stage device and exposure apparatusNIKON CORP·Filed 2000·Granted May 24, 2005·481 cites·20 claims
- 0297US5151749AMethod of and apparatus for measuring coordinate position and positioning an objectNIKON CORP·Filed 1991·Granted Sep 29, 1992·149 cites·6 claims
- 0396US5719704AProjection exposure apparatusNIKON CORP·Filed 1995·Granted Feb 17, 1998·111 cites·32 claims
- 0493US6710854B2Projection exposure apparatusNIPPON KOGAKU KK·Filed 2001·Granted Mar 23, 2004·32 cites·39 claims
- 0593US5790253AMethod and apparatus for correcting linearity errors of a moving mirror and stageNIKON CORP·Filed 1997·Granted Aug 4, 1998·109 cites·12 claims
- 0693US5272501AProjection exposure apparatusNIKON CORP·Filed 1992·Granted Dec 21, 1993·89 cites·23 claims
- 0789US6002987AMethods to control the environment and exposure apparatusNIKON CORP·Filed 1997·Granted Dec 14, 1999·76 cites·23 claims
- 0889US4820899ALaser beam working systemNIKON CORP·Filed 1988·Granted Apr 11, 1989·51 cites·9 claims
- 0988US5550633AOptical measuring apparatus having a partitioning wall for dividing gas flow in an environmental chamberNIKON CORP·Filed 1994·Granted Aug 27, 1996·58 cites·17 claims
- 1088US4989031AProjection exposure apparatusNIKON CORP·Filed 1990·Granted Jan 29, 1991·59 cites·4 claims
- 1188US4902900ADevice for detecting the levelling of the surface of an objectNIKON CORP·Filed 1988·Granted Feb 20, 1990·46 cites·7 claims
- 1286US6741358B1Exposure apparatus and device production method in which position of reference plate provided on substrate stage is measuredNIKON CORP·Filed 2000·Granted May 25, 2004·24 cites·26 claims
- 1386US6377336B1Projection exposure apparatusNIKON CORP·Filed 1999·Granted Apr 23, 2002·39 cites·43 claims
- 1486US4853745AExposure apparatusNIKON CORP·Filed 1988·Granted Aug 1, 1989·43 cites·16 claims
- 1584US5563683ASubstrate holderNIKON CORP·Filed 1995·Granted Oct 8, 1996·71 cites·26 claims
- 1681US6714278B2Exposure apparatusNIKON CORP·Filed 2001·Granted Mar 30, 2004·19 cites·4 claims
- 1765US6784972B2Exposure apparatus, device manufacturing method and environmental control method of exposure apparatusNIKON CORP·Filed 2001·Granted Aug 31, 2004·10 cites·20 claims
- 1849US2010033694A1Exposure method, exposure apparatus and device manufacturing methodNIKON CORP·Filed 2009·Application pending·0 cites
- 1943US7471372B2Exposure apparatus and production method of device using the sameNIKON CORP·Filed 2004·Granted Dec 30, 2008·0 cites·23 claims
- 2043US5392120ADual interferometer measuring system including a wavelength correction resulting from a variation in the refractive indexNIKON CORP·Filed 1993·Granted Feb 21, 1995·10 cites·4 claims
- 2143US5018848ALaser beam transmitting apparatusNIKON CORP·Filed 1988·Granted May 28, 1991·6 cites·9 claims
- 2242US7876452B2Interferometric position-measuring devices and methodsNIKON CORP·Filed 2008·Granted Jan 25, 2011·0 cites·39 claims
- 2338US7283200B2System and method for measuring displacement of a stageNIKON CORP·Filed 2003·Granted Oct 16, 2007·0 cites·60 claims
- 2438US2004156026A1Exposure apparatus and exposure methodNIKON CORP·Filed 2003·Application pending·0 cites
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