Inventor · disambiguated record
So Wein Kuo
Also filed as: KUO SO-WEIN
10 granted patents·292 citations·filing 1995–2003
91Inventor score
Technology areasH10P
Files withTAIWAN SEMICONDUCTOR MFG10
Top patents by PatentIndex Score
10 records- 0190US5872061APlasma etch method for forming residue free fluorine containing plasma etched layersTAIWAN SEMICONDUCTOR MFG·Filed 1997·Granted Feb 16, 1999·121 cites·14 claims
- 0278US6063695ASimplified process for the fabrication of deep clear laser marks using a photoresist maskTAIWAN SEMICONDUCTOR MFG·Filed 1998·Granted May 16, 2000·57 cites·15 claims
- 0373US6287926B1Self aligned channel implant, elevated S/D process by gate electrode damasceneTAIWAN SEMICONDUCTOR MFG·Filed 1999·Granted Sep 11, 2001·36 cites·10 claims
- 0465US6583017B2Self aligned channel implant, elevated S/D process by gate electrode damasceneTAIWAN SEMICONDUCTOR MFG·Filed 2001·Granted Jun 24, 2003·8 cites·9 claims
- 0562US5709755AMethod for CMP cleaning improvementTAIWAN SEMICONDUCTOR MFG·Filed 1996·Granted Jan 20, 1998·27 cites·15 claims
- 0650US6790756B2Self aligned channel implant, elevated S/D process by gate electrode damasceneTAIWAN SEMICONDUCTOR MFG·Filed 2003·Granted Sep 14, 2004·2 cites·8 claims
- 0750US6228780B1Non-shrinkable passivation scheme for metal em improvementTAIWAN SEMICONDUCTOR MFG·Filed 1999·Granted May 8, 2001·16 cites·16 claims
- 0845US5854137AMethod for reduction of polycide residuesTAIWAN SEMICONDUCTOR MFG·Filed 1996·Granted Dec 29, 1998·12 cites·18 claims
- 0939US5661084AMethod for contact profile improvementTAIWAN SEMICONDUCTOR MFG·Filed 1996·Granted Aug 26, 1997·8 cites·21 claims
- 1034US6468918B1In situ photoresist hot bake in loading chamber of dry etchTAIWAN SEMICONDUCTOR MFG·Filed 1995·Granted Oct 22, 2002·5 cites·1 claims
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