Inventor · disambiguated record
Leonard Mahoney
Also filed as: MAHONEY LEONARD J · MAHONEY LEONARD JOSEPH
13 granted patents·7 pending applications·1,300 citations·filing 1992–2012
95Inventor score
Top patents by PatentIndex Score
20 records- 0198US6432260B1Inductively coupled ring-plasma source apparatus for processing gases and materials and method thereofADVANCED ENERGY IND INC·Filed 2000·Granted Aug 13, 2002·160 cites·58 claims
- 0297US5521351AMethod and apparatus for plasma surface treatment of the interior of hollow formsWISCONSIN ALUMNI RES FOUND·Filed 1994·Granted May 28, 1996·162 cites·22 claims
- 0396US6902646B2Sensor array for measuring plasma characteristics in plasma processing environmentsADVANCED ENERGY IND INC·Filed 2003·Granted Jun 7, 2005·170 cites·18 claims
- 0495US5888593AIon beam process for deposition of highly wear-resistant optical coatingsMONSANTO CO·Filed 1996·Granted Mar 30, 1999·282 cites·15 claims
- 0594US6830650B2Wafer probe for measuring plasma and surface characteristics in plasma processing environmentsADVANCED ENERGY IND INC·Filed 2002·Granted Dec 14, 2004·107 cites·15 claims
- 0693US5973447AGridless ion source for the vacuum processing of materialsMONSANTO CO·Filed 1997·Granted Oct 26, 1999·124 cites·64 claims
- 0789US8545669B2Sensor array for measuring plasma characteristics in plasma processing environmentsMAHONEY LEONARD J·Filed 2005·Granted Oct 1, 2013·24 cites·26 claims
- 0889US6086962AMethod for deposition of diamond-like carbon and silicon-doped diamond-like carbon coatings from a hall-current ion sourceDIAMONEX INC·Filed 1999·Granted Jul 11, 2000·103 cites·58 claims
- 0988US7192505B2Wafer probe for measuring plasma and surface characteristics in plasma processing environmentsADVANCED PLASMA INC·Filed 2004·Granted Mar 20, 2007·51 cites·24 claims
- 1086US6504294B1Method and apparatus for deposition of diamond-like carbon and silicon-doped diamond-like carbon coatings from a hall-current ion sourceMORGAN CHEMICAL PRODUCTS INC·Filed 2000·Granted Jan 7, 2003·28 cites·10 claims
- 1184US7853364B2Adaptive controller for ion sourceVEECO INSTR INC·Filed 2007·Granted Dec 14, 2010·12 cites·40 claims
- 1277US6086796ADiamond-like carbon over-coats for optical recording media devices and method thereofDIAMONEX INC·Filed 1997·Granted Jul 11, 2000·46 cites·33 claims
- 1359US5411914AIII-V based integrated circuits having low temperature growth buffer or passivation layersMASSACHUSETTS INST TECHNOLOGY·Filed 1992·Granted May 2, 1995·31 cites·22 claims
- 1443US2006180570A1Application of in-situ plasma measurements to performance and control of a plasma processing systemMAHONEY LEONARD J·Filed 2006·Application pending·0 cites
- 1538US2006171848A1Diagnostic plasma sensors for endpoint and end-of-life detectionADVANCED ENERGY IND INC·Filed 2005·Application pending·0 cites
- 1638US2005011611A1Wafer probe for measuring plasma and surface characteristics in plasma processing environmentsFiled 2004·Application pending·0 cites
- 1738US2005217796A1Techniques for packaging and encapsulating components of diagnostic plasma measurement devicesCARTER DANIEL C·Filed 2004·Application pending·0 cites
- 1837US2005284570A1Diagnostic plasma measurement device having patterned sensors and featuresDORAN DANIEL B·Filed 2004·Application pending·0 cites
- 1935US2006043063A1Electrically floating diagnostic plasma probe with ion property sensorsMAHONEY LEONARD J·Filed 2004·Application pending·0 cites
- 2035US2013122252A1Ion beam deposition of fluorine-based optical filmsVEECO INSTR INC·Filed 2012·Application pending·0 cites
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