Inventor · disambiguated record
Yasuhisa Sano
Also filed as: SANO YASUHISA
11 granted patents·4 pending applications·70 citations·filing 1984–2019
89Inventor score
Top patents by PatentIndex Score
15 records- 0190US8679286B2Catalyst-aided chemical processing methodYAMAUCHI KAZUTO·Filed 2012·Granted Mar 25, 2014·7 cites·4 claims
- 0288US7651625B2Catalyst-aided chemical processing method and apparatusUNIV OSAKA·Filed 2007·Granted Jan 26, 2010·12 cites·20 claims
- 0388US4607006ASilver halide photographic light-sensitive material containing non-spectral sensitizing electron donative silver halide adsorptive compoundFUJI PHOTO FILM CO LTD·Filed 1984·Granted Aug 19, 1986·24 cites·28 claims
- 0487US10297475B2Flattening method and flattening apparatusEBARA CORP·Filed 2014·Granted May 21, 2019·6 cites·8 claims
- 0584US8912095B2Polishing method, polishing apparatus and polishing toolSANO YASUHISA·Filed 2010·Granted Dec 16, 2014·7 cites·19 claims
- 0679US8734661B2Flattening method and flattening apparatusYAMAUCHI KAZUTO·Filed 2008·Granted May 27, 2014·5 cites·12 claims
- 0776US9233449B2Polishing method, polishing apparatus and GaN waferSANO YASUHISA·Filed 2010·Granted Jan 12, 2016·4 cites·6 claims
- 0872US7776228B2Catalyst-aided chemical processing methodEBARA CORP·Filed 2006·Granted Aug 17, 2010·5 cites·6 claims
- 0963US10916455B2Flattening method and flattening apparatusEBARA CORP·Filed 2019·Granted Feb 9, 2021·0 cites·5 claims
- 1056US8119320B2Heat-sensitive transfer image-receiving sheetSHINOHARA RYUJI·Filed 2008·Granted Feb 21, 2012·0 cites·17 claims
- 1155US2010147463A1Catalyst-aided chemical processing method and apparatusYAMAUCHI KAZUTO·Filed 2009·Application pending·0 cites
- 1253US2015068680A1Polishing method, polishing apparatus and polishing toolUNIV OSAKA·Filed 2014·Application pending·0 cites
- 1353US2008241439A1Heat-sensitive transfer recording material and method of producing the sameFUJIFILM CORP·Filed 2008·Application pending·0 cites
- 1446US2010273381A1Catalyst-aided chemical processing methodYAMAUCHI KAZUTO·Filed 2010·Application pending·0 cites
- 1529US10163645B2Method for processing wide-bandgap semiconductor substrate and apparatus thereforUNIV OSAKA·Filed 2015·Granted Dec 25, 2018·0 cites·4 claims
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