Inventor · disambiguated record
Mutsuo Nakashima
Also filed as: NAKASHIMA MUTSUO
70 granted patents·3 pending applications·1,117 citations·filing 1995–2009
99Inventor score
Top patents by PatentIndex Score
73 records- 0199US6448420B1Acid-decomposable ester compound suitable for use in resist materialSHINETSU CHEMICAL CO·Filed 2000·Granted Sep 10, 2002·160 cites·5 claims
- 0299US6312867B1Ester compounds, polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 1999·Granted Nov 6, 2001·209 cites·17 claims
- 0397US6147249AEster compounds, polymers, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 1999·Granted Nov 14, 2000·81 cites·20 claims
- 0496US6284429B1Ester compounds, polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2000·Granted Sep 4, 2001·50 cites·19 claims
- 0592US8026038B2Metal oxide-containing film-forming composition, metal oxide-containing film, metal oxide-containing film-bearing substrate, and patterning methodSHINETSU CHEMICAL CO·Filed 2008·Granted Sep 27, 2011·19 cites·20 claims
- 0692US6309796B1High molecular weight silicone compounds resist compositions, and patterning methodSHINETSU CHEMICAL CO·Filed 1998·Granted Oct 30, 2001·63 cites·23 claims
- 0791US8198016B2Patterning processHATAKEYAMA JUN·Filed 2009·Granted Jun 12, 2012·13 cites·17 claims
- 0891US6730453B2High molecular weight silicone compounds, resist compositions, and patterning methodSHINETSU CHEMICAL CO·Filed 2001·Granted May 4, 2004·42 cites·14 claims
- 0991US5972560AHigh molecular weight silicone compound, chemically amplified positive resist composition and patterning methodSHINETSU CHEMICAL CO·Filed 1998·Granted Oct 26, 1999·94 cites·15 claims
- 1087US6512067B2Polymer, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2001·Granted Jan 28, 2003·23 cites·18 claims
- 1187US6444396B1Ester compounds, polymers, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2000·Granted Sep 3, 2002·24 cites·19 claims
- 1287US6413695B1Resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2000·Granted Jul 2, 2002·18 cites·15 claims
- 1386US6492090B2Polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2001·Granted Dec 10, 2002·25 cites·5 claims
- 1482US6673515B2Polymer, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2001·Granted Jan 6, 2004·20 cites·20 claims
- 1582US6369279B1Styrene derivativesSHINETSU CHEMICAL CO·Filed 2000·Granted Apr 9, 2002·12 cites·25 claims
- 1681US6461791B1Polymers, chemical amplification resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2000·Granted Oct 8, 2002·20 cites·34 claims
- 1778US6586157B2Ester compounds, polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2001·Granted Jul 1, 2003·12 cites·16 claims
- 1878US6492089B2Polymer, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2000·Granted Dec 10, 2002·14 cites·19 claims
- 1978US6472543B2Lactone compounds having alicyclic structure and their manufacturing methodSHINETSU CHEMICAL CO·Filed 2001·Granted Oct 29, 2002·7 cites·4 claims
- 2076US7745094B2Resist composition and patterning process using the sameSHINETSU CHEMICAL CO·Filed 2007·Granted Jun 29, 2010·4 cites·8 claims
- 2176US7265234B2Silsesquioxane compound mixture, method of making, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2006·Granted Sep 4, 2007·4 cites·6 claims
- 2276US6962767B2Acetal compound, polymer, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2002·Granted Nov 8, 2005·10 cites·21 claims
- 2375US8129100B2Double patterning processTAKEMURA KATSUYA·Filed 2009·Granted Mar 6, 2012·4 cites·14 claims
- 2475US6500961B2Lactone compounds having alicyclic structure and their manufacturing methodSHINETSU CHEMICAL CO·Filed 2001·Granted Dec 31, 2002·6 cites·3 claims
- 2574US6566038B2Polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2001·Granted May 20, 2003·13 cites·21 claims
- 2673US6596463B2Ester compounds, polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2001·Granted Jul 22, 2003·8 cites·25 claims
- 2771US6403822B2Ester compounds having alicyclic structure and method for preparing sameSHINETSU CHEMICAL CO·Filed 2001·Granted Jun 11, 2002·5 cites·14 claims
- 2870US6531627B2Ester compounds, polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2001·Granted Mar 11, 2003·4 cites·3 claims
- 2968US6403823B2Ester compounds having alicyclic structure and method for preparing sameSHINETSU CHEMICAL CO·Filed 2001·Granted Jun 11, 2002·9 cites·15 claims
- 3061US5527490ASilacyclohexane carbaldehyde compounds and processes for preparing silacyclohexane-based liquid crystal compounds from the carbaldehyde compoundSHINETSU CHEMICAL CO·Filed 1995·Granted Jun 18, 1996·8 cites·14 claims
- 3160US6515149B2Acetal compound, polymer, resist composition and patterning responseSHINETSU CHEMICAL CO·Filed 2001·Granted Feb 4, 2003·3 cites·3 claims
- 3260US6461790B1Polymers, chemical amplification resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2000·Granted Oct 8, 2002·5 cites·28 claims
- 3359US6670094B2Polymer, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2001·Granted Dec 30, 2003·5 cites·7 claims
- 3459US6624335B2Ether, polymer, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2002·Granted Sep 23, 2003·4 cites·4 claims
- 3559US5582764ASilacyclohexane compound, a method of preparing it and a liquid crystal composition containing itSHINETSU CHEMICAL CO·Filed 1995·Granted Dec 10, 1996·17 cites·33 claims
- 3658US7651829B2Positive resist material and pattern formation method using the sameSHINETSU CHEMICAL CO·Filed 2004·Granted Jan 26, 2010·9 cites·8 claims
- 3758US6835525B2Polymer, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2002·Granted Dec 28, 2004·4 cites·14 claims
- 3857US5578244ASilacyclohexane compound, a method of preparing it and a liquid crystal composition containing itSHINETSU CHEMICAL CO·Filed 1995·Granted Nov 26, 1996·7 cites·12 claims
- 3957US5560866AProcess for preparing silacyclohexane compoundsSHINETSU CHEMICAL CO·Filed 1995·Granted Oct 1, 1996·7 cites·5 claims
- 4057US5523440ASilacyclohexane compound, a method of preparaing it and a liquid crystal composition containing itSHINETSU CHEMICAL CO·Filed 1995·Granted Jun 4, 1996·7 cites·7 claims
- 4155US5679746ASilacyclohexane compound, a method of preparing it and a liquid crystal composition containing itSHINETSU CHEMICAL CO·Filed 1995·Granted Oct 21, 1997·6 cites·11 claims
- 4255US5641431ASilacyclohexanone compound and a method of preparing a silacyclohexane-type liquid crystal composition containing itSHINETSU CHEMICAL CO·Filed 1995·Granted Jun 24, 1997·6 cites·4 claims
- 4354US6780563B2Polymer, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2001·Granted Aug 24, 2004·3 cites·20 claims
- 4454US6677101B2Polymers, resist materials, and pattern formation methodSHINETSU CHEMICAL CO·Filed 2002·Granted Jan 13, 2004·3 cites·20 claims
- 4553US6670498B2Ester compounds, polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2002·Granted Dec 30, 2003·2 cites·18 claims
- 4653US5582765ATriflate compounds and process for preparing silacyclohexane-based liquid crystal compounds from the triflate compoundsSHINETSU CHEMICAL CO·Filed 1995·Granted Dec 10, 1996·5 cites·7 claims
- 4753US2008038664A1Silsesquioxane compound mixture, method of making, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2007·Application pending·0 cites
- 4849US7638256B2Fluorinated cyclic structure-bearing silicon compounds and silicone resins, resist compositions using the same, and patterning processSHINETSU CHEMICAL CO·Filed 2006·Granted Dec 29, 2009·0 cites·11 claims
- 4949US6784268B2Ether, polymer, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2003·Granted Aug 31, 2004·0 cites·8 claims
- 5048US6743566B2Cyclic acetal compound, polymer, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2002·Granted Jun 1, 2004·1 cites·19 claims
Showing the top 50 of 73 patent records by PatentIndex Score.
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