Inventor

KOH CHA WON

KR55 patents

⚠️ This page may combine multiple inventors who share the name “KOH CHA WON”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KOH CHA WON

SAMSUNG ELECTRONICS CO LTD

Methods of forming a pattern of a semiconductor device

Methods of forming patterns using photoresists

Method of forming a hard mask and method of forming a fine pattern of semiconductor device using the same

Method of forming a hard mask and method of forming a fine pattern of semiconductor device using the same

Methods of fabricating a semiconductor device

Method for forming fine patterns of a semiconductor device using a double patterning process

Nonvolatile memory device and method of manufacturing the same

Semiconductor device and method of manufacturing the same

Method of forming fine metal patterns for a semiconductor device using a damascene process

Semiconductor device and method of manufacturing the same

Lithography apparatus having effective thermal electron enhancement unit and method of forming pattern using the same

Method for forming hard mask patterns having a fine pitch and method for forming a semiconductor device using the same

Method for forming patterns of semiconductor device

Substrate processing apparatus and method of fabricating semiconductor device using the same

Substrate processing apparatus and method of fabricating semiconductor device using the same

Flash memory device using double patterning technology and method of manufacturing the same

Nonvolatile memory device and method of manufacturing the same

Semiconductor device having overlay measurement mark and method of fabricating the same

Method of forming a mask structure and method of forming a minute pattern using the same

Method of forming pattern for semiconductor device

Methods of manufacturing semiconductor device

Method of forming pattern

Method of forming pattern

HYUNDAI ELECTRONICS IND

Method and forming fine patterns of semiconductor devices using passivation layers

Photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the same

Photoresist monomers, polymers thereof, and photoresist compositions containing the same

Over-coating composition for photoresist, and processes for forming photoresist patterns using the same

Photoresist composition for top-surface imaging process by silylation

Phenylenediamine derivative-type additive useful for a chemically amplified photoresist

Photoresist polymers and photoresist compositions containing the same

Photoresist polymers and photoresist compositions containing the same

Copolymer resin, preparation thereof, and photoresist using the same

Photoresist cross-linking monomers, photoresist polymers and photoresist compositions comprising the same

Photoresist film for deep ultra violet and method for forming photoresist film pattern using the same

Process for forming a photoresist pattern comprising alkaline treatment

Photoresist composition comprising a copolymer resin

Photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the same

Photoresist film for deep ultra violet and method for forming photoresist film pattern using the same

HYNIX SEMICONDUCTOR INC

Top-coating composition for photoresist and process for forming fine pattern using the same

Process for forming photoresist pattern by using gas phase amine treatment

Maleimide-photoresist monomers containing halogen, polymers thereof and photoresist compositions comprising the same

Method for forming micro-pattern of semiconductor device

Method for forming fine patterns in semiconductor device

Process for forming a fine pattern using a top-coating composition for a photoresist and product formed by same

Photoresist polymer for top-surface imaging process by silylation and photoresist composition containing the same

KOH CHA-WON

Method of forming a hard mask and method of forming a fine pattern of semiconductor device using the same

Methods of fabricating semiconductor devices

Methods of forming fine patterns and methods of fabricating semiconductor devices

PARK JIN

Photoresist polymers, photoresist compositions, methods of forming patterns and methods of manufacturing semiconductor devices

Methods of forming patterns using photoresist polymers and methods of manufacturing semiconductor devices