Inventor · disambiguated record
Geun Su Lee
Also filed as: LEE GEUN S · LEE GEUN SU
96 granted patents·19 pending applications·4,860 citations·filing 1999–2024
99Inventor score
Files withHYNIX SEMICONDUCTOR INC59HYUNDAI ELECTRONICS IND34EGTM CO LTD4DONGJIN SEMICHEM CO LTD2EUGENE TECH MAT CO LTD2
Top patents by PatentIndex Score
115 records- 0199US7467632B2Method for forming a photoresist patternHYNIX SEMICONDUCTOR INC·Filed 2007·Granted Dec 23, 2008·480 cites·4 claims
- 0299US7399570B2Water-soluble negative photoresist polymer and composition containing the sameHYNIX SEMICONDUCTOR INC·Filed 2005·Granted Jul 15, 2008·463 cites·32 claims
- 0399US6811960B2Partially crosslinked polymer for bilayer photoresistHYUNDAI ELECTRONICS IND·Filed 2003·Granted Nov 2, 2004·467 cites·16 claims
- 0499US6589707B2Partially crosslinked polymer for bilayer photoresistHYUNDAI ELECTRONICS IND·Filed 2001·Granted Jul 8, 2003·485 cites·23 claims
- 0599US6455225B1Photoresist monomers having stability to post exposure delay, polymers thereof and photoresist compositions containing the sameHYUNDAI ELECTRONICS IND·Filed 2000·Granted Sep 24, 2002·465 cites·22 claims
- 0699US6225020B1Polymer and a forming method of a micro pattern using the sameHYUNDAI ELECTRONICS IND·Filed 1999·Granted May 1, 2001·508 cites·20 claims
- 0798US7238653B2Cleaning solution for photoresist and method for forming pattern using the sameHYNIX SEMICONDUCTOR INC·Filed 2003·Granted Jul 3, 2007·464 cites·23 claims
- 0898US6924078B2Photoresist monomers, polymers and photoresist compositions for preventing acid diffusionDONGJIN SEMICHEM CO LTD·Filed 2002·Granted Aug 2, 2005·463 cites·17 claims
- 0998US6316162B1Polymer and a forming method of a micro pattern using the sameHYUNDAI ELECTRONICS IND·Filed 1999·Granted Nov 13, 2001·482 cites·7 claims
- 1090US6235447B1Photoresist monomers, polymers thereof, and photoresist compositions containing the sameHYUNDAI ELECTRONICS IND·Filed 1999·Granted May 22, 2001·38 cites·35 claims
- 1187US6489432B2Organic anti-reflective coating polymer and preparation thereofHYUNDAI ELECTRONICS IND·Filed 2000·Granted Dec 3, 2002·25 cites·21 claims
- 1286US6692891B2Photoresist composition containing photo radical generator with photoacid generatorHYNIX SEMICONDUCTOR INC·Filed 2001·Granted Feb 17, 2004·60 cites·13 claims
- 1386US6426171B1Photoresist monomer, polymer thereof and photoresist composition containing itHYUNDAI ELECTRONICS IND·Filed 2000·Granted Jul 30, 2002·16 cites·26 claims
- 1484US6150069AOxabicyclo compound, a polymer-containing said compound, and a photoresist micro pattern forming method using the sameHYUNDAI ELECTRONICS IND·Filed 1999·Granted Nov 21, 2000·50 cites·18 claims
- 1582US7390611B2Photoresist coating composition and method for forming fine pattern using the sameHYNIX SEMICONDUCTOR INC·Filed 2005·Granted Jun 24, 2008·6 cites·17 claims
- 1680US6403281B1Cross-linker monomer comprising double bond and photoresist copolymer containing the sameHYUNDAI ELECTRONICS IND·Filed 2000·Granted Jun 11, 2002·17 cites·21 claims
- 1779US6569599B2Partially crosslinked polymer for bilayer photoresistHYNIX SEMICONDUCTOR INC·Filed 2001·Granted May 27, 2003·17 cites·33 claims
- 1879US6265130B1Photoresist polymers of carboxyl-containing alicyclic compoundsHYUNDAI ELECTRONICS IND·Filed 1999·Granted Jul 24, 2001·16 cites·15 claims
- 1975US6291131B1Monomers for photoresist, polymers thereof, and photoresist compositions using the sameHYUNDAI ELECTRONICS IND·Filed 1999·Granted Sep 18, 2001·18 cites·32 claims
- 2075US6235448B1Photoresist monomers, polymers thereof, and photoresist compositions containing the sameHYUNDAI ELECTRONICS IND·Filed 1999·Granted May 22, 2001·32 cites·23 claims
- 2174US7781145B2Method for forming a photoresist patternHYNIX SEMICONDUCTOR INC·Filed 2007·Granted Aug 24, 2010·2 cites·15 claims
- 2274US6368770B1Photoresist monomers, polymers thereof, and photoresist compositions containing the sameHYUNDAI ELECTRONICS IND·Filed 2000·Granted Apr 9, 2002·12 cites·31 claims
- 2373US6399272B1Phenylenediamine derivative-type additive useful for a chemically amplified photoresistHYUNDAI ELECTRONICS IND·Filed 2000·Granted Jun 4, 2002·11 cites·24 claims
- 2473US6387589B1Photoresist polymers and photoresist compositions containing the sameHYUNDAI ELECTRONICS IND·Filed 2000·Granted May 14, 2002·11 cites·24 claims
- 2572US9029273B2Method for forming silicon oxide film of semiconductor deviceSK HYNIX INC·Filed 2013·Granted May 12, 2015·2 cites·14 claims
- 2672US6486283B2Organic anti-reflective coating polymer, anti-reflective coating composition methods of preparation thereofHYNIX SEMICONDUCTOR INC·Filed 2001·Granted Nov 26, 2002·11 cites·11 claims
- 2771US6455226B1Photoresist polymers and photoresist composition containing the sameHYUNDAI ELECTRONICS IND·Filed 2000·Granted Sep 24, 2002·9 cites·20 claims
- 2871US6200731B1Photoresist cross-linking monomers, photoresist polymers and photoresist compositions comprising the sameHYUNDAI ELECTRONICS IND·Filed 1999·Granted Mar 13, 2001·11 cites·19 claims
- 2969US6548613B2Organic anti-reflective coating polymer and preparation thereofHYUNDAI ELECTRONICS IND·Filed 2000·Granted Apr 15, 2003·8 cites·30 claims
- 3068US6368771B1Photoresist polymers and photoresist compositions containing the sameHYUNDAI ELECTRONICS IND·Filed 2000·Granted Apr 9, 2002·9 cites·27 claims
- 3167US7615338B2Photoresist coating composition and method for forming fine pattern using the sameHYNIX SEMICONDUCTOR INC·Filed 2005·Granted Nov 10, 2009·2 cites·21 claims
- 3267US6537724B1Photoresist composition for resist flow process, and process for forming contact hole using the sameHYUNDAI ELECTRONICS IND·Filed 2000·Granted Mar 25, 2003·9 cites·18 claims
- 3367US6448352B1Photoresist monomer, polymer thereof and photoresist composition containing itHYUNDAI ELECTRONICS IND·Filed 2000·Granted Sep 10, 2002·6 cites·20 claims
- 3467US6416926B1Thiabicyclo compound, a polymer-containing said compound, and a photoresist micro pattern forming method using the sameHYUNDAI ELECTRONICS IND·Filed 2000·Granted Jul 9, 2002·8 cites·20 claims
- 3566US9892964B1Gap-fill polymer for filling fine pattern gaps and method for fabricating semiconductor device using the sameSK HYNIX INC·Filed 2017·Granted Feb 13, 2018·1 cites·20 claims
- 3666US6984482B2Top-coating composition for photoresist and process for forming fine pattern using the sameHYNIX SEMICONDUCTOR INC·Filed 2002·Granted Jan 10, 2006·6 cites·8 claims
- 3766US6770414B2Additive for photoresist composition for resist flow processHYNIX SEMICONDUCTOR INC·Filed 2001·Granted Aug 3, 2004·3 cites·2 claims
- 3865US6818376B2Cross-linker monomer comprising double bond and photoresist copolymer containing the sameHYNIX SEMICONDUCTOR INC·Filed 2002·Granted Nov 16, 2004·7 cites·23 claims
- 3965US6391518B1Polymers and photoresist compositions using the sameHYUNDAI ELECTRONICS IND·Filed 1999·Granted May 21, 2002·17 cites·29 claims
- 4064US7449538B2Hard mask composition and method for manufacturing semiconductor deviceHYNIX SEMICONDUCTOR INC·Filed 2006·Granted Nov 11, 2008·1 cites·21 claims
- 4164US6824951B2Photoresist composition for resist flow processHYNIX SEMICONDUCTOR INC·Filed 2001·Granted Nov 30, 2004·7 cites·9 claims
- 4262US7314853B2Cleaning solution for photoresist and method for forming pattern using the sameHYNIX SEMICONDUCTOR INC·Filed 2004·Granted Jan 1, 2008·3 cites·13 claims
- 4361US6593446B1Organic polymer for organic anti-reflective coating layer and preparation thereofHYUNDAI ELECTRONICS IND·Filed 2000·Granted Jul 15, 2003·4 cites·18 claims
- 4461US6410670B1Photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the sameHYUNDAI ELECTRONICS IND·Filed 1999·Granted Jun 25, 2002·16 cites·9 claims
- 4560US6627383B2Photoresist monomer comprising bisphenol derivatives and polymers thereofHYNIX SEMICONDUCTOR INC·Filed 2001·Granted Sep 30, 2003·3 cites·20 claims
- 4659US7150961B2Additive for photoresist composition for resist flow processHYNIX SEMICONDUCTOR INC·Filed 2004·Granted Dec 19, 2006·4 cites·18 claims
- 4759US6806025B2Photoresist monomers, polymers thereof and photoresist compositons containing the sameHYNIX SEMICONDUCTOR INC·Filed 2002·Granted Oct 19, 2004·3 cites·23 claims
- 4859US6610616B2Method for forming micro-pattern of semiconductor deviceHYNIX SEMICONDUCTOR INC·Filed 2001·Granted Aug 26, 2003·5 cites·7 claims
- 4959US6531562B2Photoresist monomer, polymer thereof and photoresist composition containing itHYUNDAI ELECTRONICS IND·Filed 2002·Granted Mar 11, 2003·3 cites·7 claims
- 5059US2025214120A1Substrate treatment apparatus and substrate treatment methodSEMES CO LTD·Filed 2024·Application pending·0 cites
Showing the top 50 of 115 patent records by PatentIndex Score.
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