Inventor · disambiguated record
Haruo Yoda
Also filed as: YODA HARUO
72 granted patents·9 pending applications·1,693 citations·filing 1974–2018
99Inventor score
Top patents by PatentIndex Score
81 records- 0199US6538249B1Image-formation apparatus using charged particle beams under various focus conditionsHITACHI LTD·Filed 2000·Granted Mar 25, 2003·118 cites·36 claims
- 0299US6172363B1Method and apparatus for inspecting integrated circuit patternHITACHI LTD·Filed 1997·Granted Jan 9, 2001·185 cites·20 claims
- 0398US7692166B2Charged particle beam exposure apparatusCANON KK·Filed 2007·Granted Apr 6, 2010·47 cites·8 claims
- 0497US7026615B2Semiconductor inspection systemHITACHI LTD·Filed 2003·Granted Apr 11, 2006·65 cites·7 claims
- 0597US6329826B1Method and apparatus for inspecting integrated circuit patternHITACHI LTD·Filed 2000·Granted Dec 11, 2001·95 cites·4 claims
- 0697US3936800APattern recognition systemHITACHI LTD·Filed 1974·Granted Feb 3, 1976·111 cites·7 claims
- 0796US7417444B2Method and apparatus for inspecting integrated circuit patternHITACHI LTD·Filed 2005·Granted Aug 26, 2008·25 cites·7 claims
- 0894US7235782B2Semiconductor inspection systemHITACHI LTD·Filed 2002·Granted Jun 26, 2007·43 cites·24 claims
- 0994US6661507B2Pattern inspecting system and pattern inspecting methodHITACHI LTD·Filed 2002·Granted Dec 9, 2003·47 cites·8 claims
- 1094US4254400AImage data processorHITACHI LTD·Filed 1979·Granted Mar 3, 1981·67 cites·3 claims
- 1193US7109485B2Charged particle beam apparatusHITACHI LTD·Filed 2005·Granted Sep 19, 2006·19 cites·5 claims
- 1291US6919574B2Electron beam exposure apparatus, deflection apparatus, and electron beam exposure methodCANON KK·Filed 2003·Granted Jul 19, 2005·35 cites·10 claims
- 1390US7952074B2Method and apparatus for inspecting integrated circuit patternHITACHI LTD·Filed 2008·Granted May 31, 2011·8 cites·18 claims
- 1490US7642514B2Charged particle beam apparatusHITACHI LTD·Filed 2007·Granted Jan 5, 2010·14 cites·8 claims
- 1590US6870171B2Exposure apparatusCANON KK·Filed 2004·Granted Mar 22, 2005·32 cites·8 claims
- 1690US6667486B2Electron beam exposure method, electron beam exposure apparatus and device manufacturing method using the sameHITACHI LTD·Filed 2002·Granted Dec 23, 2003·34 cites·8 claims
- 1790US6653633B2Charged particle beam apparatusHITACHI LTD·Filed 2003·Granted Nov 25, 2003·22 cites·7 claims
- 1889US7329868B2Charged particle beam apparatusHITACHI LTD·Filed 2006·Granted Feb 12, 2008·7 cites·3 claims
- 1988US6917045B2Electron beam exposure apparatus, electron beam exposure apparatus calibration method, and semiconductor element manufacturing methodCANON KK·Filed 2003·Granted Jul 12, 2005·28 cites·12 claims
- 2086US9063220B2Object information acquiring apparatusCANON KK·Filed 2012·Granted Jun 23, 2015·12 cites·13 claims
- 2186US6087673AMethod of inspecting pattern and apparatus thereofHITACHI LTD·Filed 1998·Granted Jul 11, 2000·58 cites·29 claims
- 2285US6559663B2Method and apparatus for inspecting integrated circuit patternHITACHI LTD·Filed 2001·Granted May 6, 2003·20 cites·10 claims
- 2384US7126140B2Multi-electron beam exposure method and apparatusADVANTEST CORP·Filed 2005·Granted Oct 24, 2006·7 cites·9 claims
- 2484US7026830B2Method and apparatus for inspecting integrated circuit patternHITACHI LTD·Filed 2003·Granted Apr 11, 2006·19 cites·6 claims
- 2584US6936818B2Charged particle beam apparatusHITACHI LTD·Filed 2003·Granted Aug 30, 2005·12 cites·6 claims
- 2684US6541784B1Electron beam exposure system and exposing method using an electron beamHITACHI LTD·Filed 2000·Granted Apr 1, 2003·20 cites·13 claims
- 2781US7915582B2Method for estimation of probe shape in charged particle beam instrumentsHITACHI HIGH TECH CORP·Filed 2007·Granted Mar 29, 2011·5 cites·12 claims
- 2881US6236057B1Method of inspecting pattern and apparatus thereof with a differential brightness image detectionHITACHI LTD·Filed 2000·Granted May 22, 2001·15 cites·23 claims
- 2979US7067830B2Multi-electron beam exposure method and apparatusADVANTEST CORP·Filed 2003·Granted Jun 27, 2006·13 cites·9 claims
- 3079US5283440AElectron beam writing system used in a cell projection methodHITACHI LTD·Filed 1991·Granted Feb 1, 1994·34 cites·10 claims
- 3176US6407808B2Pattern inspecting system and pattern inspecting methodHITACHI LTD·Filed 2001·Granted Jun 18, 2002·10 cites·1 claims
- 3276US5278421APattern fabrication method using a charged particle beam and apparatus for realizing sameHITACHI LTD·Filed 1992·Granted Jan 11, 1994·24 cites·24 claims
- 3374US8692218B2Charged particle beam exposure apparatusMURAKI MASATO·Filed 2007·Granted Apr 8, 2014·3 cites·10 claims
- 3474US7608844B2Charged particle beam drawing apparatusHITACHI HIGH TECH CORP·Filed 2005·Granted Oct 27, 2009·3 cites·21 claims
- 3574US7105842B2Method of charged particle beam lithography and equipment for charged particle beam lithographyCANON KK·Filed 2004·Granted Sep 12, 2006·10 cites·14 claims
- 3674US6946665B2Charged particle beam exposure method and apparatus and device manufacturing method using the apparatusHITACHI HIGH TECH CORP·Filed 2004·Granted Sep 20, 2005·18 cites·9 claims
- 3773US8920321B2Photoacoustic imaging apparatusYODA HARUO·Filed 2009·Granted Dec 30, 2014·8 cites·15 claims
- 3873US6376854B2Method of inspecting a pattern on a substrateHITACHI LTD·Filed 2001·Granted Apr 23, 2002·8 cites·10 claims
- 3973US4532598AElectron beam exposure systemHITACHI LTD·Filed 1982·Granted Jul 30, 1985·43 cites·13 claims
- 4072US7635851B2Electron beam apparatus and method of generating an electron beam irradiation patternHITACHI HIGH TECH CORP·Filed 2006·Granted Dec 22, 2009·3 cites·6 claims
- 4172US7082224B2Statistic calculating method using a template and corresponding sub-image to determine similarity based on sum of squares thresholdingHITACHI LTD·Filed 2005·Granted Jul 25, 2006·8 cites·14 claims
- 4272US6674086B2Electron beam lithography system, electron beam lithography apparatus, and method of lithographyHITACHI LTD·Filed 1999·Granted Jan 6, 2004·28 cites·10 claims
- 4371US5250812AElectron beam lithography using an aperture having an array of repeated unit patternsHITACHI LTD·Filed 1992·Granted Oct 5, 1993·25 cites·19 claims
- 4470US6759666B2Method and apparatus for charged particle beam exposureHITACHI LTD·Filed 2001·Granted Jul 6, 2004·8 cites·7 claims
- 4569US6831283B2Charged particle beam drawing apparatus and pattern forming methodHITACHI LTD·Filed 2003·Granted Dec 14, 2004·7 cites·12 claims
- 4669US6828573B1Electron beam lithography systemHITACHI LTD·Filed 1999·Granted Dec 7, 2004·24 cites·10 claims
- 4769US6246472B1Pattern inspecting system and pattern inspecting methodHITACHI LTD·Filed 1998·Granted Jun 12, 2001·26 cites·37 claims
- 4869US5063492AMotion control apparatus with function to self-form a series of motionsHITACHI LTD·Filed 1989·Granted Nov 5, 1991·23 cites·16 claims
- 4968US9390068B2Signal processing circuit and ultrasonic diagnostic apparatusYODA HARUO·Filed 2012·Granted Jul 12, 2016·2 cites·9 claims
- 5068US2019069874A1Subject information acquisition apparatusCANON KK·Filed 2018·Application pending·0 cites
Showing the top 50 of 81 patent records by PatentIndex Score.
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