Inventor · disambiguated record
Lambert Danner
Also filed as: DANNER LAMBERT · DANNER LAMBERT J
16 granted patents·3 pending applications·208 citations·filing 1981–2011
93Inventor score
Files withLEICA MICROSYSTEMS9VISTEC SEMICONDUCTOR SYS GMBH4REICHERT OPTISCHE WERKE AG2GRAF UWE1HAHN KURT1
Top patents by PatentIndex Score
19 records- 0187US7420670B2Measuring instrument and method for operating a measuring instrument for optical inspection of an objectVISTEC SEMICONDUCTOR SYS GMBH·Filed 2005·Granted Sep 2, 2008·10 cites·18 claims
- 0287US6600560B2Optical measurement arrangement having an ellipsometerLEICA MICROSYSTEMS·Filed 2001·Granted Jul 29, 2003·56 cites·13 claims
- 0384US8154718B2Apparatus and method for inspecting micro-structured devices on a semiconductor substrateGRAF UWE·Filed 2005·Granted Apr 10, 2012·16 cites·12 claims
- 0484US7271889B2Device and method for inspecting an objectLEICA MICROSYSTEMS·Filed 2003·Granted Sep 18, 2007·32 cites·17 claims
- 0581US6879440B2Autofocus module and method for a microscope-based systemLEICA MICROSYSTEMS·Filed 2003·Granted Apr 12, 2005·27 cites·26 claims
- 0678US6624930B1Illumination device for a DUV microscope and DUV microscopeLEICA MICROSYSTEMS·Filed 2000·Granted Sep 23, 2003·24 cites·29 claims
- 0777US9091525B2Method for focusing an object plane and optical assemblySULIK WOLFGANG·Filed 2011·Granted Jul 28, 2015·8 cites·9 claims
- 0874US8451440B2Apparatus for the optical inspection of wafersHAHN KURT·Filed 2010·Granted May 28, 2013·4 cites·35 claims
- 0961US6975409B2Illumination device; and coordinate measuring instrument having an illumination deviceLEICA MICROSYSTEMS·Filed 2001·Granted Dec 13, 2005·6 cites·3 claims
- 1056US7268940B2Illuminating deviceVISTEC SEMICONDUCTOR SYS GMBH·Filed 2002·Granted Sep 11, 2007·5 cites·15 claims
- 1153US7209243B2Illumination device, and coordinate measuring instrument having an illumination deviceLEICA MICROSYSTEMS·Filed 2004·Granted Apr 24, 2007·4 cites·6 claims
- 1253US6618154B2Optical measurement arrangement, in particular for layer thickness measurementLEICA MICROSYSTEMS·Filed 2001·Granted Sep 9, 2003·7 cites·10 claims
- 1346US2009279080A1Device and method for the inspection of defects on the edge region of a waferVISTEC SEMICONDUCTOR SYS GMBH·Filed 2009·Application pending·0 cites
- 1446US2007035850A1Method and device for reducing systematic measuring errors in the examination of objectsLEICA MICROSYSTEMS·Filed 2006·Application pending·0 cites
- 1542US7561263B2Apparatus for illuminating and inspecting a surfaceVISTEC SEMICONDUCTOR SYS GMBH·Filed 2006·Granted Jul 14, 2009·0 cites·15 claims
- 1642US4417787AFive-component microscope objectiveREICHERT OPTISCHE WERKE AG·Filed 1981·Granted Nov 29, 1983·8 cites·1 claims
- 1741US2002024669A1Spectral ellipsometer having a refractive illuminating optical systemFiled 2001·Application pending·0 cites
- 1836US6943901B2Critical dimension measuring instrumentLEICA MICROSYSTEMS·Filed 2003·Granted Sep 13, 2005·0 cites·13 claims
- 1929US4384765ASix-component microscope objectiveREICHERT OPTISCHE WERKE AG·Filed 1981·Granted May 24, 1983·1 cites·1 claims
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