Inventor · disambiguated record
Everhardus Cornelis Mos
Also filed as: MOS EVERHARDUS C · MOS EVERHARDUS CORNELIS
76 granted patents·8 pending applications·557 citations·filing 2001–2024
99Inventor score
Files withASML NETHERLANDS BV68MOS EVERHARDUS CORNELIS7VAN DER SCHAAR MAURITS4ASML NETHERLAND BV1ASML NETHERLANDS N V1
Top patents by PatentIndex Score
84 records- 0198US7486408B2Lithographic apparatus and device manufacturing method with reduced scribe lane usage for substrate measurementASML NETHERLANDS BV·Filed 2006·Granted Feb 3, 2009·53 cites·11 claims
- 0297US11067902B2Computational metrologyASML NETHERLANDS BV·Filed 2018·Granted Jul 20, 2021·9 cites·20 claims
- 0397US8706442B2Alignment system, lithographic system and methodMOS EVERHARDUS CORNELIS·Filed 2009·Granted Apr 22, 2014·89 cites·20 claims
- 0496US7112813B2Device inspection method and apparatus using an asymmetric markerASML NETHERLANDS BV·Filed 2003·Granted Sep 26, 2006·61 cites·64 claims
- 0595US8111398B2Method of measurement, an inspection apparatus and a lithographic apparatusVAN DER SCHAAR MAURITS·Filed 2010·Granted Feb 7, 2012·21 cites·21 claims
- 0694US10990018B2Computational metrologyASML NETHERLANDS BV·Filed 2018·Granted Apr 27, 2021·10 cites·20 claims
- 0794US7683351B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Mar 23, 2010·20 cites·21 claims
- 0894US7564555B2Method and apparatus for angular-resolved spectroscopic lithography characterizationASML NETHERLANDS BV·Filed 2006·Granted Jul 21, 2009·21 cites·19 claims
- 0993US9811006B2Method of determining a measurement subset of metrology points on a substrate, associated apparatus and computer programASML NETHERLANDS BV·Filed 2014·Granted Nov 7, 2017·9 cites·20 claims
- 1092US7898662B2Method and apparatus for angular-resolved spectroscopic lithography characterizationASML NETHERLANDS BV·Filed 2006·Granted Mar 1, 2011·13 cites·15 claims
- 1192US7532305B2Lithographic apparatus and device manufacturing method using overlay measurementASML NETHERLANDS BV·Filed 2006·Granted May 12, 2009·13 cites·11 claims
- 1292US7415319B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Aug 19, 2008·17 cites·14 claims
- 1391US11347150B2Computational metrologyASML NETHERLANDS BV·Filed 2021·Granted May 31, 2022·2 cites·22 claims
- 1490US10996176B2Methods and apparatus for measuring a property of a substrateASML NETHERLANDS BV·Filed 2020·Granted May 4, 2021·2 cites·19 claims
- 1590US8064056B2Substrate used in a method and apparatus for angular-resolved spectroscopic lithography characterizationVAN DER SCHAAR MAURITS·Filed 2011·Granted Nov 22, 2011·6 cites·9 claims
- 1690US7599064B2Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method, substrate for use in the methodsASML NETHERLANDS BV·Filed 2007·Granted Oct 6, 2009·11 cites·20 claims
- 1790US6879868B2Alignment system for lithographic apparatus for measuring a position of an alignment markASML NETHERLANDS BV·Filed 2004·Granted Apr 12, 2005·30 cites·22 claims
- 1889US10317191B2Methods and apparatus for measuring a property of a substrateASML NETHERLANDS BV·Filed 2017·Granted Jun 11, 2019·4 cites·21 claims
- 1989US7573584B2Method and apparatus for angular-resolved spectroscopic lithography characterizationASML NETHERLANDS BV·Filed 2006·Granted Aug 11, 2009·13 cites·9 claims
- 2088US10802408B2Method for optimization of a lithographic processASML NETHERLANDS BV·Filed 2017·Granted Oct 13, 2020·3 cites·23 claims
- 2187US10061212B2Metrology target, method and apparatus, target design method, computer program and lithographic systemASML NETHERLANDS BV·Filed 2017·Granted Aug 28, 2018·4 cites·15 claims
- 2287US7619737B2Method of measurement, an inspection apparatus and a lithographic apparatusASML NETHERLANDS BV·Filed 2007·Granted Nov 17, 2009·14 cites·16 claims
- 2386US7710572B2Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted May 4, 2010·9 cites·32 claims
- 2485US12044981B2Method and apparatus for optimization of lithographic processASML NETHERLANDS BV·Filed 2021·Granted Jul 23, 2024·1 cites·20 claims
- 2585US10746668B2Methods and apparatus for measuring a property of a substrateASML NETHERLANDS BV·Filed 2019·Granted Aug 18, 2020·2 cites·27 claims
- 2684US7468795B2Method of selecting a grid model for correcting a process recipe for grid deformations in a lithographic apparatus and lithographic assembly using the sameASML NETHERLANDS BV·Filed 2006·Granted Dec 23, 2008·9 cites·34 claims
- 2784US6704089B2Lithographic projection apparatus, a method for determining a position of a substrate alignment mark, a device manufacturing method and device manufactured therebyASML NETHERLANDS BV·Filed 2001·Granted Mar 9, 2004·20 cites·17 claims
- 2883US9594029B2Methods and apparatus for measuring a property of a substrateASML NETHERLANDS BV·Filed 2012·Granted Mar 14, 2017·4 cites·16 claims
- 2982US11378891B2Method for determining contribution to a fingerprintASML NETHERLANDS BV·Filed 2020·Granted Jul 5, 2022·1 cites·20 claims
- 3081US8612045B2Optimization method and a lithographic cellMOS EVERHARDUS CORNELIS·Filed 2009·Granted Dec 17, 2013·7 cites·12 claims
- 3180US10859930B2Methods and apparatus for calculating substrate model parameters and controlling lithographic processingASML NETHERLANDS BV·Filed 2019·Granted Dec 8, 2020·1 cites·20 claims
- 3280US8887107B2Inspection method and apparatus and lithographic processing cellASML NETHERLANDS BV·Filed 2013·Granted Nov 11, 2014·2 cites·18 claims
- 3379US10816904B2Method for determining contribution to a fingerprintASML NETHERLANDS BV·Filed 2018·Granted Oct 27, 2020·2 cites·26 claims
- 3479US8982347B2Alignment mark deformation estimating method, substrate position predicting method, alignment system and lithographic apparatusASML NETHERLANDS N V·Filed 2012·Granted Mar 17, 2015·8 cites·17 claims
- 3579US7969577B2Inspection apparatus, an apparatus for projecting an image and a method of measuring a property of a substrateASML NETHERLANDS BV·Filed 2006·Granted Jun 28, 2011·5 cites·11 claims
- 3679US7391513B2Lithographic apparatus and device manufacturing method using overlay measurement quality indicationASML NETHERLANDS BV·Filed 2006·Granted Jun 24, 2008·5 cites·15 claims
- 3778US9971478B2Method and apparatus for inspection and metrologyASML NETHERLANDS BV·Filed 2016·Granted May 15, 2018·3 cites·20 claims
- 3877US7547495B2Device manufacturing method and computer program productASML NETHERLANDS BV·Filed 2005·Granted Jun 16, 2009·4 cites·14 claims
- 3977US6732004B2Computer program for determining a corrected position of a measured alignment mark, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2002·Granted May 4, 2004·12 cites·14 claims
- 4076US11170072B2Method and apparatus for inspection and metrologyASML NETHERLANDS BV·Filed 2016·Granted Nov 9, 2021·2 cites·21 claims
- 4176US8248579B2Lithographic apparatus, device manufacturing method and device for correcting overlay errors between overlapping patternsMOS EVERHARDUS CORNELIS·Filed 2007·Granted Aug 21, 2012·4 cites·21 claims
- 4275US9235141B2Inspection apparatus and method for measuring a property of a substrateVAN DER SCHAAR MAURITS·Filed 2011·Granted Jan 12, 2016·2 cites·15 claims
- 4375US7821650B2Lithographic apparatus and device manufacturing method with reduced scribe lane usage for substrate measurementASML NETHERLANDS BV·Filed 2008·Granted Oct 26, 2010·3 cites·20 claims
- 4474US12461451B2Computational metrologyASML NETHERLANDS BV·Filed 2021·Granted Nov 4, 2025·0 cites·20 claims
- 4574US11977034B2Methods and apparatus for measuring a property of a substrateASML NETHERLANDS BV·Filed 2021·Granted May 7, 2024·0 cites·18 claims
- 4674US7724370B2Method of inspection, a method of manufacturing, an inspection apparatus, a substrate, a mask, a lithography apparatus and a lithographic cellASML NETHERLANDS BV·Filed 2007·Granted May 25, 2010·3 cites·10 claims
- 4772US8237914B2Process, apparatus, and device for determining intra-field correction to correct overlay errors between overlapping patternsMOS EVERHARDUS CORNELIS·Filed 2007·Granted Aug 7, 2012·3 cites·21 claims
- 4871US12189302B2Computational metrologyASML NETHERLANDS BV·Filed 2022·Granted Jan 7, 2025·0 cites·22 claims
- 4971US11300891B2Methods and apparatus for calculating substrate model parameters and controlling lithographic processingASML NETHERLANDS BV·Filed 2020·Granted Apr 12, 2022·0 cites·20 claims
- 5071US11061336B2Device manufacturing methodASML NETHERLANDS BV·Filed 2018·Granted Jul 13, 2021·1 cites·20 claims
Showing the top 50 of 84 patent records by PatentIndex Score.
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