Inventor · disambiguated record
Wen-Kung Cheng
Also filed as: CHENG WEN-KUNG
13 granted patents·266 citations·filing 1999–2014
92Inventor score
Top patents by PatentIndex Score
13 records- 0196US6136680AMethods to improve copper-fluorinated silica glass interconnectsTAIWAN SEMICONDUCTOR MFG·Filed 2000·Granted Oct 24, 2000·133 cites·35 claims
- 0282US6713407B1Method of forming a metal nitride layer over exposed copperTAIWAN SEMICONDUCTOR MFG·Filed 2002·Granted Mar 30, 2004·37 cites·20 claims
- 0373US6660638B1CMP process leaving no residual oxide layer or slurry particlesTAIWAN SEMICONDUCTOR MFG·Filed 2002·Granted Dec 9, 2003·13 cites·3 claims
- 0472US6584987B1Method for improved cleaning in HDP-CVD process with reduced NF3 usageTAIWAN SEMICONDUCTOR MFG·Filed 2001·Granted Jul 1, 2003·31 cites·9 claims
- 0564US9287151B2Systems and method for transferring a semiconductor substrateTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Mar 15, 2016·1 cites·20 claims
- 0663US7772625B2Image sensor having an RPO layer containing nitrogenTAIWAN SEMICONDUCTOR MFG·Filed 2006·Granted Aug 10, 2010·1 cites·7 claims
- 0758US6235653B1Ar-based si-rich oxynitride film for dual damascene and/or contact etch stop layerTAIWAN SEMICONDUCTOR MFG·Filed 1999·Granted May 22, 2001·24 cites·20 claims
- 0853US7125802B2CMP process leaving no residual oxide layer or slurry particlesTAIWAN SEMICONDUCTOR MFG·Filed 2003·Granted Oct 24, 2006·3 cites·4 claims
- 0951US6602560B2Method for removing residual fluorine in HDP-CVD chamberTAIWAN SEMICONDUCTOR MFG·Filed 2002·Granted Aug 5, 2003·2 cites·16 claims
- 1051US6323141B1Method for forming anti-reflective coating layer with enhanced film thickness uniformityTAIWAN SEMICONDUCTOR MFG·Filed 2000·Granted Nov 27, 2001·5 cites·10 claims
- 1142US6903019B2CMP process leaving no residual oxide layer or slurry particlesTAIWAN SEMICONDUCTOR MFG·Filed 2003·Granted Jun 7, 2005·0 cites·4 claims
- 1242US6558228B1Method of unloading substrates in chemical-mechanical polishing apparatusTAIWAN SEMICONDUCTOR MFG·Filed 1999·Granted May 6, 2003·11 cites·21 claims
- 1333US6499222B1Template for measuring edge width and method of usingTAIWAN SEMICONDUCTOR MFG·Filed 1999·Granted Dec 31, 2002·5 cites·16 claims
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