Inventor · disambiguated record
Hiroshi Nozue
Also filed as: NOZUE HIROSHI
22 granted patents·1 pending application·591 citations·filing 1986–2015
96Inventor score
Top patents by PatentIndex Score
23 records- 0195US5890189AMemory management and protection system for virtual memory in computer systemTOSHIBA KK·Filed 1996·Granted Mar 30, 1999·283 cites·41 claims
- 0282US10776007B2Memory management device predicting an erase countTOSHIBA MEMORY CORP·Filed 2015·Granted Sep 15, 2020·4 cites·25 claims
- 0382US5808310AElectron beam cell projection lithography method for correcting coulomb interaction effectsNEC CORP·Filed 1996·Granted Sep 15, 1998·39 cites·15 claims
- 0481US9280466B2Information processing device including memory management device managing access from processor to memory and memory management methodKUNIMATSU ATSUSHI·Filed 2009·Granted Mar 8, 2016·12 cites·9 claims
- 0581US5627987AMemory management and protection system for virtual memory in computer systemTOSHIBA KK·Filed 1993·Granted May 6, 1997·78 cites·13 claims
- 0675US8153996B2Pattern forming apparatus and pattern forming methodABE TAKAYUKI·Filed 2009·Granted Apr 10, 2012·5 cites·3 claims
- 0773US5452053AWafer stepperNEC CORP·Filed 1994·Granted Sep 19, 1995·25 cites·7 claims
- 0870US5968686ACharged-beam exposure mask and charged-beam exposure methodNEC CORP·Filed 1997·Granted Oct 19, 1999·22 cites·14 claims
- 0955US5432587AExposing device capable of making clear pattern image on photo resist layer having different level surfacesNEC CORP·Filed 1994·Granted Jul 11, 1995·12 cites·4 claims
- 1054US7439844B2Cord type thermal fuse and sheet type thermal fuseKURABE IND CO LTD·Filed 2003·Granted Oct 21, 2008·8 cites·19 claims
- 1152US5745730AApparatus and methods for implementing dedicated cache flushingTOSHIBA KK·Filed 1996·Granted Apr 28, 1998·26 cites·20 claims
- 1252US5532497AOptical aligner equipped with luminance sensor on movable stageNEC CORP·Filed 1994·Granted Jul 2, 1996·12 cites·8 claims
- 1349US5607801ADirect patterning method of resist film using electron beamNEC CORP·Filed 1994·Granted Mar 4, 1997·12 cites·9 claims
- 1446US4791302ASemiconductor wafer for providing a plurality of semiconductor chips through electron-beam lithographyNEC CORP·Filed 1986·Granted Dec 13, 1988·14 cites·15 claims
- 1546US2012191900A1Memory management deviceKUNIMATSU ATSUSHI·Filed 2012·Application pending·0 cites
- 1645US7582393B2Transfer mask blank, transfer mask, and transfer method using the transfer maskDAINIPPON PRINTING CO LTD·Filed 2003·Granted Sep 1, 2009·1 cites·15 claims
- 1744US5439765APhotomask for semiconductor integrated circuit deviceNEC CORP·Filed 1994·Granted Aug 8, 1995·13 cites·5 claims
- 1842US5552250AMethod of manufacturing reticleNEC CORP·Filed 1994·Granted Sep 3, 1996·6 cites·6 claims
- 1940US5759722AElectron beam aperture structure and method for fabricating the sameNEC CORP·Filed 1996·Granted Jun 2, 1998·4 cites·13 claims
- 2038US5677109AMethod for E-beam writingNEC CORP·Filed 1996·Granted Oct 14, 1997·7 cites·8 claims
- 2137US6034375AMethod of aligning a semiconductor substrate with a base stage and apparatus for doing the sameNEC CORP·Filed 1998·Granted Mar 7, 2000·3 cites·25 claims
- 2235US6042971AMethod of manufacturing an EB mask for electron beam image drawing and device for manufacturing an EB maskNEC CORP·Filed 1998·Granted Mar 28, 2000·3 cites·17 claims
- 2334US5677756AApparatus for exposing a semiconductor wafer to light including an illumination optical system comprising a glass substrate having light-permeable patternsNEC CORP·Filed 1994·Granted Oct 14, 1997·2 cites·17 claims
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