P

Inventor

HO BYRON

US29 patents

Patents

29 patents
US10121882B1Nov 6, 2018

Gate line plug structures for advanced integrated circuit structure fabrication

INTEL CORP56 citations99
US10121875B1Nov 6, 2018

Replacement gate structures for advanced integrated circuit structure fabrication

INTEL CORP61 citations98
US10304940B1May 28, 2019

Gate cut and fin trim isolation for advanced integrated circuit structure fabrication

INTEL CORP13 citations96
US10615265B2Apr 7, 2020

Gate cut and fin trim isolation for advanced integrated circuit structure fabrication

INTEL CORP8 citations93
US10886383B2Jan 5, 2021

Replacement gate structures for advanced integrated circuit structure fabrication

INTEL CORP4 citations92
US10460993B2Oct 29, 2019

Fin cut and fin trim isolation for advanced integrated circuit structure fabrication

INTEL CORP6 citations92
US11063133B2Jul 13, 2021

Fin cut and fin trim isolation for advanced integrated circuit structure fabrication

INTEL CORP1 citations84
US11011616B2May 18, 2021

Gate line plug structures for advanced integrated circuit structure fabrication

INTEL CORP1 citations84
US10777656B2Sep 15, 2020

Fin cut and fin trim isolation for advanced integrated circuit structure fabrication

INTEL CORP3 citations84
US10756204B2Aug 25, 2020

Fin trim isolation with single gate spacing for advanced integrated circuit structure fabrication

INTEL CORP6 citations84
US10790378B2Sep 29, 2020

Replacement gate structures for advanced integrated circuit structure fabrication

INTEL CORP3 citations83
US10734379B2Aug 4, 2020

Fin end plug structures for advanced integrated circuit structure fabrication

INTEL CORP9 citations82
US12199167B2Jan 14, 2025

Gate line plug structures for advanced integrated circuit structure fabrication

INTEL CORP0 citations73
US11646359B2May 9, 2023

Fin cut and fin trim isolation for advanced integrated circuit structure fabrication

INTEL CORP0 citations73
US11322601B2May 3, 2022

Gate cut and fin trim isolation for advanced integrated circuit structure fabrication

INTEL CORP1 citations73
US11482611B2Oct 25, 2022

Replacement gate structures for advanced integrated circuit structure fabrication

INTEL CORP0 citations72
US11380683B2Jul 5, 2022

Fin end plug structures for advanced integrated circuit structure fabrication

INTEL CORP3 citations71
US10861850B2Dec 8, 2020

Fin end plug structures for advanced integrated circuit structure fabrication

INTEL CORP2 citations71
US12057492B2Aug 6, 2024

Gate cut and fin trim isolation for advanced integrated circuit structure fabrication

INTEL CORP0 citations63
US11799015B2Oct 24, 2023

Gate cut and fin trim isolation for advanced integrated circuit structure fabrication

INTEL CORP0 citations63
US10985267B2Apr 20, 2021

Fin trim isolation with single gate spacing for advanced integrated circuit structure fabrication

INTEL CORP1 citations63
US12426230B2Sep 23, 2025

Fin cut and fin trim isolation for advanced integrated circuit structure fabrication

INTEL CORP0 citations62
US12016170B2Jun 18, 2024

Fin cut and fin trim isolation for advanced integrated circuit structure fabrication

INTEL CORP0 citations62
US12284826B2Apr 22, 2025

Fin end plug structures for advanced integrated circuit structure fabrication

INTEL CORP0 citations60
US11961838B2Apr 16, 2024

Fin end plug structures for advanced integrated circuit structure fabrication

INTEL CORP0 citations60
US12557617B2Feb 17, 2026

Continuous gate and fin spacer for advanced integrated circuit structure fabrication

INTEL CORP0 citations59
US11837456B2Dec 5, 2023

Continuous gate and fin spacer for advanced integrated circuit structure fabrication

INTEL CORP0 citations59
US11462436B2Oct 4, 2022

Continuous gate and fin spacer for advanced integrated circuit structure fabrication

INTEL CORP0 citations59
US10964800B2Mar 30, 2021

Semiconductor device having fin-end stress-inducing features

INTEL CORP0 citations50