Inventor · disambiguated record
Keita Ishizuka
Also filed as: ISHIZUKA KEITA
3 granted patents·79 citations·filing 2005–2005
72Inventor score
Files withTOKYO OHKA KOGYO CO LTD3
Top patents by PatentIndex Score
3 records- 0195US7879529B2Material for formation of resist protection film and method of forming resist pattern therewithTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Feb 1, 2011·37 cites·20 claims
- 0294US7846637B2Material for forming resist protective film for use in liquid immersion lithography process and method for forming resist pattern using the protective filmTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Dec 7, 2010·40 cites·10 claims
- 0366US7951523B2Material for forming resist protective film and method for forming resist pattern using sameTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted May 31, 2011·2 cites·26 claims
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →