Inventor · disambiguated record
Tokuyuki Nakayama
Also filed as: NAKAYAMA TOKUYUKI
39 granted patents·10 pending applications·163 citations·filing 2004–2017
97Inventor score
Files withSUMITOMO METAL MINING CO32NAKAYAMA TOKUYUKI11ABE YOSHIYUKI2CHICHIBU SHIGEFUSA1OKAMI HIDEHARU1
Top patents by PatentIndex Score
49 records- 0192US7641818B2Ga-In-O amorphous oxide transparent conductive film, and transparent conductive base material comprising this conductive film formed thereonSUMITOMO METAL MINING CO·Filed 2008·Granted Jan 5, 2010·18 cites·10 claims
- 0292US7476343B2Sintered body target for transparent conductive film fabrication, transparent conductive film fabricated by using the same, and transparent conductive base material comprising this conductive film formed thereonSUMITOMO METAL MINING CO·Filed 2007·Granted Jan 13, 2009·19 cites·2 claims
- 0391US7153453B2Oxide sintered body, sputtering target, transparent conductive thin film and manufacturing method thereforSUMITOMO METAL MINING CO·Filed 2005·Granted Dec 26, 2006·17 cites·17 claims
- 0490US7611646B2Oxide sintered body and an oxide film obtained by using it, and a transparent base material containing itSUMITOMO METAL MINING CO·Filed 2006·Granted Nov 3, 2009·16 cites·3 claims
- 0583US7976738B2Oxide sintered body comprising zinc oxide phase and zinc stannate compound phaseSUMITOMO METAL MINING CO·Filed 2007·Granted Jul 12, 2011·6 cites·6 claims
- 0681US8551370B2Oxide sintered body, manufacturing method therefor, manufacturing method for transparent conductive film using the same, and resultant transparent conductive filmABE YOSHIYUKI·Filed 2012·Granted Oct 8, 2013·3 cites·1 claims
- 0781US8349220B2Oxide sintered body, manufacturing method therefor, manufacturing method for transparent conductive film using the same, and resultant transparent conductive filmSUMITOMO METAL MINING CO·Filed 2011·Granted Jan 8, 2013·3 cites·15 claims
- 0880US7239464B2Absorption type multi-layer film ND filterSUMITOMO METAL MINING CO·Filed 2005·Granted Jul 3, 2007·10 cites·11 claims
- 0979US9941415B2Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering targetSUMITOMO METAL MINING CO·Filed 2015·Granted Apr 10, 2018·3 cites·9 claims
- 1079US8440115B2Oxide sintered body and production method therefor, target, and transparent conductive film and transparent conductive substrate obtained by using the sameNAKAYAMA TOKUYUKI·Filed 2008·Granted May 14, 2013·4 cites·23 claims
- 1178US9299791B2Oxide semiconductor thin film and thin film transistorSUMITOMO METAL MINING CO·Filed 2013·Granted Mar 29, 2016·4 cites·11 claims
- 1278US8080182B2Oxide sintered body and an oxide film obtained by using it, and a transparent base material containing itNAKAYAMA TOKUYUKI·Filed 2009·Granted Dec 20, 2011·6 cites·7 claims
- 1378US7563514B2Transparent conductive film and transparent conductive base material utilizing the sameSUMITOMO METAL MINING CO·Filed 2004·Granted Jul 21, 2009·20 cites·10 claims
- 1475US9028721B2Oxide sintered body, production method therefor, target, and transparent conductive filmNAKAYAMA TOKUYUKI·Filed 2010·Granted May 12, 2015·2 cites·8 claims
- 1575US9005487B2Tablet for ion plating, production method therefor and transparent conductive filmNAKAYAMA TOKUYUKI·Filed 2010·Granted Apr 14, 2015·2 cites·11 claims
- 1674US8728615B2Transparent conductive film and method of fabricating the same, transparent conductive base material, and light-emitting deviceNAKAYAMA TOKUYUKI·Filed 2005·Granted May 20, 2014·4 cites·15 claims
- 1774US7666527B2Absorption type multi-layer film ND filterSUMITOMO METAL MINING CO·Filed 2005·Granted Feb 23, 2010·6 cites·5 claims
- 1873US10000842B2Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering targetSUMITOMO METAL MINING CO·Filed 2015·Granted Jun 19, 2018·2 cites·5 claims
- 1973US9670578B2Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering targetSUMITOMO METAL MINING CO·Filed 2015·Granted Jun 6, 2017·2 cites·10 claims
- 2072US7998603B2Transparent conductive film, sintered body target for transparent conductive film fabrication, and transparent conductive base material and display device using the sameSUMITOMO METAL MINING CO·Filed 2009·Granted Aug 16, 2011·3 cites·10 claims
- 2172US7960033B2Transparent conductive film, sintered body target for transparent conductive film fabrication, and transparent conductive base material and display device using the sameSUMITOMO METAL MINING CO·Filed 2009·Granted Jun 14, 2011·3 cites·2 claims
- 2265US10128108B2Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering targetSUMITOMO METAL MINING CO·Filed 2015·Granted Nov 13, 2018·1 cites·4 claims
- 2365US8222667B2Semiconductor light-emitting element, method for manufacturing the semiconductor light-emitting element and lamp that uses the semiconductor light-emitting elementNAKAYAMA TOKUYUKI·Filed 2009·Granted Jul 17, 2012·2 cites·10 claims
- 2464US8801973B2Oxide sintered body and production method therefor, target, and transparent conductive film and transparent conductive substrate obtained by using the sameSUMITOMO METAL MINING CO·Filed 2013·Granted Aug 12, 2014·0 cites·24 claims
- 2563US8728635B2Oxide sintered body, target, transparent conductive film obtained by using the same, and transparent conductive substrateSUMITOMO METAL MINING CO·Filed 2013·Granted May 20, 2014·1 cites·16 claims
- 2663US8389135B2Oxide sintered body, target, transparent conductive film obtained by using the same, and transparent conductive substrateNAKAYAMA TOKUYUKI·Filed 2007·Granted Mar 5, 2013·2 cites·21 claims
- 2762US9045821B2Laminate, method for producing same, and functional element using sameCHICHIBU SHIGEFUSA·Filed 2011·Granted Jun 2, 2015·1 cites·28 claims
- 2861US8067102B2Absorption type multi-layer film ND filterOKAMI HIDEHARU·Filed 2009·Granted Nov 29, 2011·3 cites·7 claims
- 2960US9340867B2Oxide sintered body and tablets obtained by processing sameNAKAYAMA TOKUYUKI·Filed 2012·Granted May 17, 2016·0 cites·8 claims
- 3057US9721770B2Oxide sintered body, production method therefor, target, and transparent conductive filmSUMITOMO METAL MINING CO·Filed 2015·Granted Aug 1, 2017·0 cites·6 claims
- 3156US2010164896A1Capacitive touch panel, manufacturing method therefor and liquid crystal display apparatus provided with the touch panelSUMITOMO METAL MINING CO·Filed 2009·Application pending·0 cites
- 3255US2015206615A1Oxide sintered body and tablet obtained by processing sameSUMITOMO MINING CO LTD·Filed 2013·Application pending·0 cites
- 3353US9368639B2Oxide semiconductor thin film, production method thereof, and thin film transistorSUMITOMO METAL MINING CO·Filed 2013·Granted Jun 14, 2016·0 cites·9 claims
- 3453US2014020810A1Capacitive touch panel, manufacturing method therefor and liquid crystal display apparatus provided with the touch panelSUMITOMO METAL MINING CO·Filed 2013·Application pending·0 cites
- 3552US9493869B2Transparent conductive filmNAKAYAMA TOKUYUKI·Filed 2011·Granted Nov 15, 2016·0 cites·7 claims
- 3652US8633046B2Manufacturing method for semiconductor light-emitting elementNAKAYAMA TOKUYUKI·Filed 2012·Granted Jan 21, 2014·0 cites·12 claims
- 3750US9732004B2Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering targetSUMITOMO METAL MINING CO·Filed 2015·Granted Aug 15, 2017·0 cites·9 claims
- 3850US9688580B2Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering targetSUMITOMO METAL MINING CO·Filed 2015·Granted Jun 27, 2017·0 cites·9 claims
- 3949US9768316B2Oxide semiconductor thin film and thin film transistorSUMITOMO METAL MINING CO·Filed 2014·Granted Sep 19, 2017·0 cites·7 claims
- 4049US2008032106A1Transparent Conductive Film, Sintered Body Target for Transparent Conductive Film Fabrication, and Transparent Conductive Base Material and Display Device Using the SameNAKAYAMA TOKUYUKI·Filed 2005·Application pending·0 cites
- 4147US9543447B2Oxynitride semiconductor thin filmSUMITOMO METAL MINING CO·Filed 2014·Granted Jan 10, 2017·0 cites·7 claims
- 4244US2017077243A1Sintered oxide, sputtering target, and oxide semiconductor thin film obtained using sputtering targetSUMITOMO METAL MINING CO·Filed 2015·Application pending·0 cites
- 4344US2017076943A1Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering targetSUMITOMO METAL MINING CO·Filed 2015·Application pending·0 cites
- 4441US8757902B2Black heat resistant light shading film and production method thereof, and, diaphragm, light intensity adjusting module and heat resistant light shading tape using the sameONO KATSUSHI·Filed 2010·Granted Jun 24, 2014·0 cites·18 claims
- 4539US2012024381A1Transparent conductive film and transparent conductive film laminated body and production method of same, and silicon-based thin film solar cellABE YOSHIYUKI·Filed 2010·Application pending·0 cites
- 4637US9670577B2Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering targetSUMITOMO METAL MINING CO·Filed 2015·Granted Jun 6, 2017·0 cites·10 claims
- 4736US2011084280A1Thin film transistor substrate, thin film transistor type liquid crystal display device, and method for manufacturing thin film transistor substrateSUMITOMO METAL MINING CO·Filed 2010·Application pending·0 cites
- 4836US2019062900A1Oxide sintered body and sputtering targetSUMITOMO METAL MINING CO·Filed 2017·Application pending·0 cites
- 4936US2019081182A1Oxide semiconductor thin film, manufacturing method for oxide semiconductor thin film, and thin film transistor using oxide semiconductor thin filmSUMITOMO METAL MINING CO·Filed 2017·Application pending·0 cites
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