Inventor · disambiguated record
Anna M. Minvielle
Also filed as: MINVIELLE ANNA · MINVIELLE ANNA M · MINVIELLE ANNA MARIA
14 granted patents·244 citations·filing 1997–2011
93Inventor score
Top patents by PatentIndex Score
14 records- 0190US6562639B1Utilizing electrical performance data to predict CD variations across stepper fieldADVANCED MICRO DEVICES INC·Filed 2001·Granted May 13, 2003·65 cites·27 claims
- 0285US7538026B1Multilayer low reflectivity hard mask and process thereforADVANCED MICRO DEVICES INC·Filed 2005·Granted May 26, 2009·8 cites·23 claims
- 0375US6255125B1Method and apparatus for compensating for critical dimension variations in the production of a semiconductor waferADVANCED MICRO DEVICES INC·Filed 1999·Granted Jul 3, 2001·47 cites·13 claims
- 0475US5963816AMethod for making shallow trench marksADVANCED MICRO DEVICES INC·Filed 1997·Granted Oct 5, 1999·47 cites·10 claims
- 0573US7427457B1Methods for designing grating structures for use in situ scatterometry to detect photoresist defectsADVANCED MICRO DEVICES INC·Filed 2004·Granted Sep 23, 2008·11 cites·27 claims
- 0671US7112489B1Negative resist or dry develop process for forming middle of line implant layerADVANCED MICRO DEVICES INC·Filed 2004·Granted Sep 26, 2006·13 cites·8 claims
- 0763US6900124B1Patterning for elliptical Vss contact on flash memoryADVANCED MICRO DEVICES INC·Filed 2003·Granted May 31, 2005·9 cites·10 claims
- 0859US8048797B2Multilayer low reflectivity hard mask and process thereforADVANCED MICRO DEVICES INC·Filed 2009·Granted Nov 1, 2011·0 cites·10 claims
- 0959US7507661B2Method of forming narrowly spaced flash memory contact openings and lithography masksSPANSION LLC·Filed 2004·Granted Mar 24, 2009·6 cites·8 claims
- 1056US6493063B1Critical dimension control improvement method for step and scan photolithographyADVANCED MICRO DEVICES INC·Filed 1999·Granted Dec 10, 2002·17 cites·12 claims
- 1155US7018922B1Patterning for elongated VSS contact flash memoryADVANCED MICRO DEVICES INC·Filed 2004·Granted Mar 28, 2006·5 cites·7 claims
- 1253US7384725B2System and method for fabricating contact holesADVANCED MICRO DEVICES INC·Filed 2004·Granted Jun 10, 2008·3 cites·14 claims
- 1352US5985498AMethod of characterizing linewidth errors in a scanning lithography systemADVANCED MICRO DEVICES INC·Filed 1999·Granted Nov 16, 1999·13 cites·20 claims
- 1447US8309457B2Multilayer low reflectivity hard mask and process thereforGHANDEHARI KOUROS·Filed 2011·Granted Nov 13, 2012·0 cites·10 claims
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