Inventor · disambiguated record
Qiaolin Zhang
Also filed as: ZHANG QIAOLIN
7 granted patents·2 pending applications·56 citations·filing 2005–2015
83Inventor score
Top patents by PatentIndex Score
9 records- 0188US8196068B2Modeling critical-dimension (CD) scanning-electron-microscopy (CD-SEM) CD extractionZHANG QIAOLIN·Filed 2009·Granted Jun 5, 2012·16 cites·26 claims
- 0284US7334202B1Optimizing critical dimension uniformity utilizing a resist bake plate simulatorADVANCED MICRO DEVICES INC·Filed 2005·Granted Feb 19, 2008·18 cites·25 claims
- 0380US8423917B2Modeling thin-film stack topography effect on a photolithography processSONG HUA·Filed 2009·Granted Apr 16, 2013·6 cites·23 claims
- 0476US8527253B2Modeling an arbitrarily polarized illumination source in an optical lithography systemZHANG QIAOLIN·Filed 2007·Granted Sep 3, 2013·5 cites·20 claims
- 0576US8006203B2Bulk image modeling for optical proximity correctionSYNOPSYS INC·Filed 2008·Granted Aug 23, 2011·6 cites·54 claims
- 0672US7681172B2Method and apparatus for modeling an apodization effect in an optical lithography systemSYNOPSYS INC·Filed 2007·Granted Mar 16, 2010·5 cites·23 claims
- 0745US2009265148A1Modeling a sector-polarized-illumination source in an optical lithography systemSYNOPSYS INC·Filed 2008·Application pending·0 cites
- 0844US2009070730A1Method and apparatus for modeling a vectorial polarization effect in an optical lithography systemSYNOPSYS INC·Filed 2007·Application pending·0 cites
- 0943US10386718B2Method for modeling a photoresist profileSYNOPSYS INC·Filed 2015·Granted Aug 20, 2019·0 cites·24 claims
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