Inventor · disambiguated record
Yuushi Matsumura
Also filed as: MATSUMURA YUUSHI
9 granted patents·6 pending applications·4 citations·filing 2012–2024
76Inventor score
Files withJSR CORP15
Top patents by PatentIndex Score
15 records- 0171US9958781B2Method for film formation, and pattern-forming methodJSR CORP·Filed 2016·Granted May 1, 2018·2 cites·12 claims
- 0269US2025116922A1Radiation-sensitive resin composition and method of forming resist patternJSR CORP·Filed 2024·Application pending·0 cites
- 0367US11003079B2Composition for film formation, film, resist underlayer film-forming method, production method of patterned substrate, and compoundJSR CORP·Filed 2018·Granted May 11, 2021·1 cites·19 claims
- 0464US2023384676A1Radiation-sensitive resin composition, method of forming pattern, polymer, and compoundJSR CORP·Filed 2023·Application pending·0 cites
- 0560US9091922B2Resin composition, resist underlayer film, resist underlayer film-forming method and pattern-forming methodJSR CORP·Filed 2012·Granted Jul 28, 2015·1 cites·24 claims
- 0652US2022260908A9Radiation-sensitive resin composition and resist pattern-forming methodJSR CORP·Filed 2021·Application pending·0 cites
- 0749US11667620B2Composition, film, film-forming method and patterned substrate-producing methodJSR CORP·Filed 2020·Granted Jun 6, 2023·0 cites·18 claims
- 0846US11454890B2Composition for resist underlayer film formation, resist underlayer film and forming method thereof, patterned substrate-producing method, and compoundJSR CORP·Filed 2020·Granted Sep 27, 2022·0 cites·20 claims
- 0946US11320739B2Composition for resist underlayer film formation, resist underlayer film and method for producing patterned substrateJSR CORP·Filed 2018·Granted May 3, 2022·0 cites·20 claims
- 1044US11126084B2Composition for resist underlayer film formation, resist underlayer film and forming method thereof, production method of patterned substrate, and compoundJSR CORP·Filed 2019·Granted Sep 21, 2021·0 cites·19 claims
- 1143US9250526B2Composition for forming resist underlayer film, and pattern-forming methodJSR CORP·Filed 2013·Granted Feb 2, 2016·0 cites·12 claims
- 1239US11053457B2Cleaning composition for semiconductor substrateJSR CORP·Filed 2019·Granted Jul 6, 2021·0 cites·20 claims
- 1336US2019264035A1Semiconductor substrate treatment agent and substrate-treating methodJSR CORP·Filed 2019·Application pending·0 cites
- 1436US2018211828A1Composition for forming film for use in cleaning semiconductor substrate, and cleaning method for semiconductor substrateJSR CORP·Filed 2018·Application pending·0 cites
- 1534US2017137663A9Composition for resist underlayer film formation, resist underlayer film, and production method of patterned substrateJSR CORP·Filed 2016·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →