Inventor · disambiguated record
Toyohiro Kamada
Also filed as: KAMADA TOYOHIRO
5 granted patents·6 pending applications·16 citations·filing 2009–2024
71Inventor score
Top patents by PatentIndex Score
11 records- 0192US9478410B2Method of forming nitride film with plasmaTOKYO ELECTRON LTD·Filed 2015·Granted Oct 25, 2016·13 cites·8 claims
- 0281US11201053B2Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Dec 14, 2021·1 cites·3 claims
- 0369US10714332B2Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Jul 14, 2020·1 cites·4 claims
- 0467US9922820B2Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Mar 20, 2018·1 cites·4 claims
- 0563US2025092514A1Substrate processing method and substrate processing systemTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0656US2011183069A1Deposition apparatus, deposition method, and storage medium having program stored thereinTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 0752US11417514B2Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Aug 16, 2022·0 cites·11 claims
- 0847US2013209666A1Evaporating apparatus and evaporating methodKAMADA TOMIKO·Filed 2011·Application pending·0 cites
- 0943US2017133204A1Member for Plasma Processing Apparatus and Plasma Processing ApparatusTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
- 1036US2018135170A1Film forming apparatusTOKYO ELECTRON LTD·Filed 2017·Application pending·0 cites
- 1133US2016322218A1Film Forming Method and Film Forming ApparatusTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →