Inventor · disambiguated record
Shigeru Hirukawa
Also filed as: HIRUKAWA SHIGERU
68 granted patents·23 pending applications·2,428 citations·filing 1989–2018
99Inventor score
Top patents by PatentIndex Score
91 records- 0199US7639343B2Exposure apparatus and device manufacturing methodNIKON CORP·Filed 2007·Granted Dec 29, 2009·111 cites·46 claims
- 0299US7589821B2Exposure apparatus and device manufacturing methodNIKON CORP·Filed 2007·Granted Sep 15, 2009·115 cites·11 claims
- 0399US7483119B2Exposure method, substrate stage, exposure apparatus, and device manufacturing methodNIKON CORP·Filed 2005·Granted Jan 27, 2009·76 cites·102 claims
- 0499US7446851B2Exposure apparatus and device manufacturing methodNIKON CORP·Filed 2006·Granted Nov 4, 2008·104 cites·29 claims
- 0599US7436486B2Exposure apparatus and device manufacturing methodNIKON CORP·Filed 2006·Granted Oct 14, 2008·123 cites·14 claims
- 0698US8004650B2Exposure apparatus and device manufacturing methodNIKON CORP·Filed 2005·Granted Aug 23, 2011·25 cites·25 claims
- 0798US7505111B2Exposure apparatus and device manufacturing methodNIKON CORP·Filed 2007·Granted Mar 17, 2009·140 cites·62 claims
- 0898US7483117B2Exposure method, exposure apparatus, and method for producing deviceNIKON CORP·Filed 2005·Granted Jan 27, 2009·57 cites·44 claims
- 0998US4908656AMethod of dimension measurement for a pattern formed by exposure apparatus, and method for setting exposure conditions and for inspecting exposure precisionNIKON CORP·Filed 1989·Granted Mar 13, 1990·152 cites·14 claims
- 1097US7446858B2Exposure method and apparatus, and method for fabricating deviceNIKON CORP·Filed 2005·Granted Nov 4, 2008·51 cites·43 claims
- 1197US7242455B2Exposure apparatus and method for producing deviceNIKON CORP·Filed 2005·Granted Jul 10, 2007·32 cites·61 claims
- 1297US5402224ADistortion inspecting method for projection optical systemNIKON CORP·Filed 1993·Granted Mar 28, 1995·150 cites·3 claims
- 1396US7911582B2Exposure apparatus and device manufacturing methodNIKON CORP·Filed 2008·Granted Mar 22, 2011·15 cites·40 claims
- 1496US4931830AProjection exposure apparatusNIKON CORP·Filed 1989·Granted Jun 5, 1990·108 cites·19 claims
- 1595US7102731B2Projection optical system adjustment method, prediction method, evaluation method, adjustment method, exposure method and exposure apparatus, program, and device manufacturing methodNIKON CORP·Filed 2006·Granted Sep 5, 2006·23 cites·29 claims
- 1695US6118516AProjection exposure apparatus having a filter arranged in its projection optical system and method for protecting circuit patternsNIKON CORP·Filed 1997·Granted Sep 12, 2000·134 cites·35 claims
- 1794US7230682B2Image forming state adjusting system, exposure method and exposure apparatus, and program and information storage mediumNIKON CORP·Filed 2004·Granted Jun 12, 2007·49 cites·16 claims
- 1894US6249335B1Photo-mask and method of exposing and projection-exposing apparatusNIKON CORP·Filed 1995·Granted Jun 19, 2001·98 cites·38 claims
- 1994US5615006AImaging characteristic and asymetric abrerration measurement of projection optical systemNIKON CORP·Filed 1995·Granted Mar 25, 1997·89 cites·11 claims
- 2094US5525808AAlignment method and alignment apparatus with a statistic calculation using a plurality of weighted coordinate positionsNIKON CORPORATON·Filed 1994·Granted Jun 11, 1996·205 cites·57 claims
- 2192US7088426B2Projection optical system adjustment method, prediction method, evaluation method, adjustment method, exposure method and exposure apparatus, program, and device manufacturing methodNIKON CORP·Filed 2004·Granted Aug 8, 2006·40 cites·35 claims
- 2291US7405803B2Image forming state adjusting system, exposure method and exposure apparatus, and program and information storage mediumNIKON CORP·Filed 2007·Granted Jul 29, 2008·10 cites·28 claims
- 2389US9146474B2Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger and different linear polarization states in an on-axis area and a plurality of off-axis areasKUDO TAKEHITO·Filed 2009·Granted Sep 29, 2015·8 cites·42 claims
- 2489US8233133B2Exposure method, exposure apparatus, and method for producing deviceHIRUKAWA SHIGERU·Filed 2005·Granted Jul 31, 2012·7 cites·26 claims
- 2589US7713889B2Substrate processing method, photomask manufacturing method, photomask, and device manufacturing methodNIKON CORP·Filed 2006·Granted May 11, 2010·10 cites·29 claims
- 2689US5808910AAlignment methodNIKON CORP·Filed 1996·Granted Sep 15, 1998·78 cites·17 claims
- 2788US5703675AProjection-exposing apparatus with deflecting grating memberNIKON CORP·Filed 1995·Granted Dec 30, 1997·61 cites·26 claims
- 2886US8605252B2Exposure apparatus, exposure method, and method for producing deviceKOBAYASHI NAOYUKI·Filed 2012·Granted Dec 10, 2013·3 cites·17 claims
- 2985US9019467B2Exposure method, substrate stage, exposure apparatus, and device manufacturing methodNIKON CORP·Filed 2013·Granted Apr 28, 2015·2 cites·35 claims
- 3085US8675177B2Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger in first and second pairs of areasKUDO TAKEHITO·Filed 2007·Granted Mar 18, 2014·5 cites·19 claims
- 3185US8040491B2Exposure method, substrate stage, exposure apparatus, and device manufacturing methodNIKON CORP·Filed 2008·Granted Oct 18, 2011·4 cites·16 claims
- 3285US5596204AMethod for aligning processing areas on a substrate with a predetermined position in a static coordinate systemNIKON CORP·Filed 1994·Granted Jan 21, 1997·47 cites·24 claims
- 3383US9316921B2Exposure apparatus, exposure method, and method for producing deviceNIKON CORP·Filed 2013·Granted Apr 19, 2016·2 cites·46 claims
- 3483US5434026AExposure condition measurement methodNIKON CORP·Filed 1992·Granted Jul 18, 1995·47 cites·12 claims
- 3582US6661498B1Projection exposure apparatus and method employing rectilinear aperture stops for use with periodic mask patternsNIKON CORP·Filed 2000·Granted Dec 9, 2003·21 cites·30 claims
- 3681US8421992B2Exposure method, exposure apparatus, and method for producing deviceHIRUKAWA SHIGERU·Filed 2008·Granted Apr 16, 2013·3 cites·19 claims
- 3781US8343693B2Focus test mask, focus measurement method, exposure method and exposure apparatusNIKON CORP·Filed 2010·Granted Jan 1, 2013·4 cites·25 claims
- 3881US5835227AMethod and apparatus for determining performance characteristics in lithographic toolsNIKON PRECISION INC·Filed 1997·Granted Nov 10, 1998·48 cites·54 claims
- 3980US8698998B2Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing deviceNAGASAKA HIROYUKI·Filed 2007·Granted Apr 15, 2014·4 cites·29 claims
- 4079US8208119B2Exposure apparatus, exposure method, and method for producing deviceKOBAYASHI NAOYUKI·Filed 2005·Granted Jun 26, 2012·3 cites·40 claims
- 4179US8054447B2Exposure apparatus, exposure method, method for producing device, and optical partNIKON CORP·Filed 2004·Granted Nov 8, 2011·11 cites·37 claims
- 4277US5408083AMethod of measuring the best focus position having a plurality of measuring mark images and a plurality of focus positionsNIKON CORP·Filed 1994·Granted Apr 18, 1995·36 cites·10 claims
- 4373US8405816B2Pattern formation method, pattern formation apparatus, exposure method, exposure apparatus, and device manufacturing methodHIRUKAWA SHIGERU·Filed 2008·Granted Mar 26, 2013·4 cites·45 claims
- 4473US7817244B2Exposure apparatus and method for producing deviceNIKON CORP·Filed 2006·Granted Oct 19, 2010·2 cites·17 claims
- 4571US8711324B2Exposure method, exposure apparatus, and method for producing deviceHIRUKAWA SHIGERU·Filed 2008·Granted Apr 29, 2014·1 cites·45 claims
- 4671US5493402AEGA alignment method using a plurality of weighting coefficientsNIKON CORP·Filed 1995·Granted Feb 20, 1996·30 cites·18 claims
- 4769US5552856AProjection exposure apparatusNIKON CORP·Filed 1995·Granted Sep 3, 1996·29 cites·22 claims
- 4868US2019137886A1Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger in four areasNIKON CORP·Filed 2018·Application pending·0 cites
- 4968US2019011840A1Exposure method, exposure apparatus, and method for producing deviceNIKON CORP·Filed 2018·Application pending·0 cites
- 5067US6284416B1Photo mask and exposure method using sameNIKON CORP·Filed 2000·Granted Sep 4, 2001·7 cites·12 claims
Showing the top 50 of 91 patent records by PatentIndex Score.
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